Advances In Metrology For X Ray And Euv Optics

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Advances In Metrology For X Ray And Euv Optics
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Author :
language : en
Publisher:
Release Date : 2005
Advances In Metrology For X Ray And Euv Optics written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Laser interferometers categories.
Modern Developments In X Ray And Neutron Optics
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Author : Alexei Erko
language : en
Publisher: Springer Science & Business Media
Release Date : 2008-04-14
Modern Developments In X Ray And Neutron Optics written by Alexei Erko and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-04-14 with Technology & Engineering categories.
This volume describes modern developments in reflective, refractive and diffractive optics for short wavelength radiation. It also covers recent theoretical approaches to modelling and ray-tracing the x-ray and neutron optical systems. It is based on the joint research activities of specialists in x-ray and neutron optics, working together under the framework of the European Programme for Cooperation in Science and Technology (COST, Action P7) in the period 2002-2006.
High Precision Euv And X Ray Optics For Advanced Photon Source Facilities
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Author : Qiushi Huang
language : en
Publisher: Frontiers Media SA
Release Date : 2023-02-02
High Precision Euv And X Ray Optics For Advanced Photon Source Facilities written by Qiushi Huang and has been published by Frontiers Media SA this book supported file pdf, txt, epub, kindle and other format this book has been release on 2023-02-02 with Science categories.
Advances In X Ray Euv Optics Components And Applications
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Author :
language : en
Publisher:
Release Date : 2006
Advances In X Ray Euv Optics Components And Applications written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with X-ray optics categories.
Optical Technologies For Extreme Ultraviolet And Soft X Ray Coherent Sources
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Author : Federico Canova
language : en
Publisher: Springer
Release Date : 2015-08-17
Optical Technologies For Extreme Ultraviolet And Soft X Ray Coherent Sources written by Federico Canova and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015-08-17 with Science categories.
The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.
Advances In Metrology For X Ray And Euv Optics Iii
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Author :
language : en
Publisher:
Release Date : 2010
Advances In Metrology For X Ray And Euv Optics Iii written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010 with categories.
Advances In Metrology For X Ray And Euv Optics Vii
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Author : Lahsen Assoufid
language : en
Publisher:
Release Date : 2017-10-30
Advances In Metrology For X Ray And Euv Optics Vii written by Lahsen Assoufid and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-10-30 with categories.
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Handbook Of X Ray And Gamma Ray Astrophysics
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Author : Cosimo Bambi
language : en
Publisher: Springer Nature
Release Date : 2024-02-29
Handbook Of X Ray And Gamma Ray Astrophysics written by Cosimo Bambi and has been published by Springer Nature this book supported file pdf, txt, epub, kindle and other format this book has been release on 2024-02-29 with Science categories.
This book highlights a comprehensive coverage of X‐ray and Gamma‐ray astrophysics. The first and the second parts discuss, respectively, X-ray and Gamma-ray experimental techniques and observatories. The third part is devoted to science, including galactic and extragalactic sources. The fourth and last parts are dedicated to analysis techniques in X-ray and Gamma-ray astronomy: spectral analysis, imagining analysis, timing analysis, and polarimetric analysis. Presenting the state of the art in X-ray and gamma-ray astronomy, this is both a valuable book for students and an important reference resource for researchers in the field.
Advances In Mirror Technology For X Ray Euv Lithography Laser And Other Applications
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Author :
language : en
Publisher:
Release Date : 2004
Advances In Mirror Technology For X Ray Euv Lithography Laser And Other Applications written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Lasers categories.
Microlithography
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Author : Bruce W. Smith
language : en
Publisher: CRC Press
Release Date : 2020-05-01
Microlithography written by Bruce W. Smith and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-05-01 with Technology & Engineering categories.
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.