High Precision Euv And X Ray Optics For Advanced Photon Source Facilities
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High Precision Euv And X Ray Optics For Advanced Photon Source Facilities
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Author : Qiushi Huang
language : en
Publisher: Frontiers Media SA
Release Date : 2023-02-02
High Precision Euv And X Ray Optics For Advanced Photon Source Facilities written by Qiushi Huang and has been published by Frontiers Media SA this book supported file pdf, txt, epub, kindle and other format this book has been release on 2023-02-02 with Science categories.
User Facilities Of The Office Of Basic Energy Sciences
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Author :
language : en
Publisher:
Release Date : 2009
User Facilities Of The Office Of Basic Energy Sciences written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with Government publications categories.
"This brochure overviews the scientific infrastructure that is constructed, maintained, and operated at Department of Energy laboratories for the pursuit of energy-related research." -- cf p. 4
Euv Sources For Lithography
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Author : Vivek Bakshi
language : en
Publisher: SPIE Press
Release Date : 2006
Euv Sources For Lithography written by Vivek Bakshi and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with Art categories.
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Scientific And Technical Aerospace Reports
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Author :
language : en
Publisher:
Release Date : 1995
Scientific And Technical Aerospace Reports written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995 with Aeronautics categories.
Advances In Mirror Technology For X Ray Euv Lithography Laser And Other Applications
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Author :
language : en
Publisher:
Release Date : 2004
Advances In Mirror Technology For X Ray Euv Lithography Laser And Other Applications written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Lasers categories.
Logos
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Author :
language : en
Publisher:
Release Date : 1992
Logos written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992 with Nuclear energy categories.
Grazing Incidence And Multilayer X Ray Optical Systems
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Author : Richard B. Hoover
language : en
Publisher: SPIE-International Society for Optical Engineering
Release Date : 1997
Grazing Incidence And Multilayer X Ray Optical Systems written by Richard B. Hoover and has been published by SPIE-International Society for Optical Engineering this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with Nature categories.
Fundamentals And Applications In Aerosol Spectroscopy
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Author : Ruth Signorell
language : en
Publisher: CRC Press
Release Date : 2010-12-20
Fundamentals And Applications In Aerosol Spectroscopy written by Ruth Signorell and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-12-20 with Nature categories.
Helping you better understand the processes, instruments, and methods of aerosol spectroscopy, Fundamentals and Applications in Aerosol Spectroscopy provides an overview of the state of the art in this rapidly developing field. It covers fundamental aspects of aerosol spectroscopy, applications to atmospherically and astronomically relevant problem
International Tables For Crystallography Volume I
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Author : Christopher Chantler
language : en
Publisher: John Wiley & Sons
Release Date : 2024-08-19
International Tables For Crystallography Volume I written by Christopher Chantler and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2024-08-19 with Science categories.
X-ray absorption spectroscopy and X-ray emission spectroscopy are complementary to crystallographic methods, particularly for materials science and the study of nanostructure and systems with partial disorder and partial local order, including solutions, gases, liquids, glasses and powders. This new volume of International Tables for Crystallography has nine parts and over 150 chapters contributed by a wide range of international experts. Part 1 provides a brief overview and introduction to the background of X-ray absorption spectroscopy (XAS) and experimental facilities. Part 2 discusses the quantum theory of XAS and related approaches. Part 3 describes both standard and advanced experimental methods used in XAS, X-ray emission spectroscopy (XES) and related techniques. Part 4 covers both standard and more advanced pre-processing of data. Part 5 gives an extensive overview of the analysis of experimental data. Part 6 provides details of the major software packages for data collection, reduction and analysis. Part 7 outlines the importance in science, reporting and hypothesis testing of the exchange of input and processed output data, and data deposition. It also presents excerpts of tables of data and supplementary material for XAS, pre-edge studies, X-ray absorption near-edge spectroscopy (XANES) and X-ray absorption fine structure (XAFS) studies. These tables are also available in full as online supporting information. Part 8 explores a wide range of applications of XAS in fields including materials science, physics, chemistry, biology, earth sciences, catalysis and cultural heritage. Part 9 presents definitions of the terms and quantities used, as developed by the International Union of Crystallography's Commission on XAFS. The volume has been written for the worldwide XAS community of thousands of practitioners, beamline scientists, experts and academics, and for the novice user who wishes to know what XAS and XES can do for them and how they may use these techniques for their particular purposes. The volume is therefore intended to be a self-contained, authoritative reference work that can also be used for training, learning or teaching, providing practical guidance for readers of all levels of experience. More information on the volumes in the series International Tables for Crystallography can be found at https://it.iucr.org.
Soft X Rays And Extreme Ultraviolet Radiation
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Author : David Attwood
language : en
Publisher: Cambridge University Press
Release Date : 2007-02-22
Soft X Rays And Extreme Ultraviolet Radiation written by David Attwood and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007-02-22 with Technology & Engineering categories.
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.