Advances In Rapid Thermal Processing
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Advances In Rapid Thermal And Integrated Processing
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Author : F. Roozeboom
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-03-09
Advances In Rapid Thermal And Integrated Processing written by F. Roozeboom and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-03-09 with Science categories.
Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.
Advances In Rapid Thermal Processing
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Author : Fred Roozeboom
language : en
Publisher: The Electrochemical Society
Release Date : 1999
Advances In Rapid Thermal Processing written by Fred Roozeboom and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Technology & Engineering categories.
Advances In Rapid Thermal And Integrated Processing
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Author : F. Roozeboom
language : en
Publisher:
Release Date : 2014-01-15
Advances In Rapid Thermal And Integrated Processing written by F. Roozeboom and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-01-15 with categories.
Rapid Thermal And Integrated Processing V Volume 429
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Author : J. C. Gelpey
language : en
Publisher:
Release Date : 1996-10-14
Rapid Thermal And Integrated Processing V Volume 429 written by J. C. Gelpey and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-10-14 with Technology & Engineering categories.
This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.
Rapid Thermal Processing
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Author : Richard B. Fair
language : en
Publisher: Academic Press
Release Date : 2012-12-02
Rapid Thermal Processing written by Richard B. Fair and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Technology & Engineering categories.
This is the first definitive book on rapid thermal processing (RTP), an essential namufacturing technology for single-wafer processing in highly controlled environments. Written and edited by nine experts in the field, this book covers a range of topics for academics and engineers alike, moving from basic theory to advanced technology for wafer manufacturing. The book also provides new information on the suitability or RTP for thin film deposition, junction formation, silicides, epitaxy, and in situ processing. Complete discussions on equipment designs and comparisons between RTP and other processing approaches also make this book useful for supplemental information on silicon processing, VLSI processing, and integrated circuit engineering.
Advanced Short Time Thermal Processing For Si Based Cmos Devices
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Author : Fred Roozeboom
language : en
Publisher: The Electrochemical Society
Release Date : 2003
Advanced Short Time Thermal Processing For Si Based Cmos Devices written by Fred Roozeboom and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with Computers categories.
Rapid Thermal And Other Short Time Processing Technologies
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Author : Fred Roozeboom
language : en
Publisher: The Electrochemical Society
Release Date : 2000
Rapid Thermal And Other Short Time Processing Technologies written by Fred Roozeboom and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Technology & Engineering categories.
The proceedings from this May 2000 symposium illustrate the range of applications in Rapid Thermal Processing (RTP). The refereed papers cover a variety of issues, such as ultra-shallow junctions; contacts for nanoscale CMOS; gate stacks; new applications of RTP, such as for the enhanced crystalization of amorphous silicon thin films; and advances on RTP systems and process monitoring, including optimizing and controlling gas flows in an RTCVD reactor. Most presentations are supported by charts and other graphical data. c. Book News Inc.
Advanced Short Time Thermal Processing For Si Based Cmos Devices 2
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Author : Mehmet C. Öztürk
language : en
Publisher: The Electrochemical Society
Release Date : 2004
Advanced Short Time Thermal Processing For Si Based Cmos Devices 2 written by Mehmet C. Öztürk and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Technology & Engineering categories.
Rapid Thermal Processing Of Semiconductors
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Author : Victor E. Borisenko
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-11-22
Rapid Thermal Processing Of Semiconductors written by Victor E. Borisenko and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-22 with Technology & Engineering categories.
Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.
Rapid Thermal Processing For Future Semiconductor Devices
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Author : H. Fukuda
language : en
Publisher: Elsevier
Release Date : 2003-04-02
Rapid Thermal Processing For Future Semiconductor Devices written by H. Fukuda and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-04-02 with Science categories.
This volume is a collection of papers which were presented at the 2001 International Conference on Rapid Thermal Processing (RTP 2001) held at Ise Shima, Mie, on November 14-16, 2001. This symposium is second conference followed the previous successful first International RTP conference held at Hokkaido in 1997. The RTP 2001 covered the latest developments in RTP and other short-time processing continuously aiming to point out the future direction in the Silicon ULSI devices and II-VI, III-V compound semiconductor devices.This book covers the following areas: advanced MOS gate stack, integration technologies, advancd channel engineering including shallow junction, SiGe, hetero-structure, novel metallization, inter-connect, silicidation, low-k materials, thin dielectrics including gate dielectrics and high-k materials, thin film deposition including SiGe, SOI and SiC, process and device modelling, Laser-assisted crystallization and TFT device fabrication technologies, temperature monitoring and slip-free technologies.