Atomic Layer Deposition Applications 3
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Atomic Layer Deposition Ald
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Author : Jeannie Valdez
language : en
Publisher:
Release Date : 2015
Atomic Layer Deposition Ald written by Jeannie Valdez and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015 with TECHNOLOGY & ENGINEERING categories.
Atomic layer deposition (ALD) is a thin film deposition technique used in the mass production of microelectronics. In this book, novel nonvolatile memory devices are discussed. The chapters examine the low-temperature fabrication process of single-crystal platinum non-thin films using plasma-enhanced atomic layer deposition (PEALD). A comprehensive review of ALD surface coatings for battery systems is provided, as well as a theoretical calculation on the mechanism of thermal and plasma-enhanced atomic layer deposition of SiO2; and fluorine doping behavior in Zn-based conducting oxide film grown by ALD.
Atomic Layer Deposition Applications 3
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Author : Ana Londergan
language : en
Publisher: The Electrochemical Society
Release Date : 2007
Atomic Layer Deposition Applications 3 written by Ana Londergan and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with Technology & Engineering categories.
The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the symposium focus. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties. Following two successful years, this symposium is well on its way to becoming a forum for the sharing of cutting edge research in the various areas where ALD is used.
Atomic Layer Deposition For Semiconductors
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Author : Cheol Seong Hwang
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-10-18
Atomic Layer Deposition For Semiconductors written by Cheol Seong Hwang and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-10-18 with Science categories.
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Atomic Layer Deposition
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Author : Tommi Kääriäinen
language : en
Publisher: John Wiley & Sons
Release Date : 2013-05-28
Atomic Layer Deposition written by Tommi Kääriäinen and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-05-28 with Technology & Engineering categories.
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Chemical Vapor Deposition For Nanotechnology
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Author : Pietro Mandracci
language : en
Publisher: BoD – Books on Demand
Release Date : 2019-01-10
Chemical Vapor Deposition For Nanotechnology written by Pietro Mandracci and has been published by BoD – Books on Demand this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019-01-10 with Technology & Engineering categories.
Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
Handbook Of Manufacturing Engineering And Technology
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Author : Andrew Y. C. Nee
language : en
Publisher: Springer
Release Date : 2014-10-31
Handbook Of Manufacturing Engineering And Technology written by Andrew Y. C. Nee and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-10-31 with Technology & Engineering categories.
The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.
Chemical Vapour Deposition
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Author : Anthony C. Jones
language : en
Publisher: Royal Society of Chemistry
Release Date : 2009
Chemical Vapour Deposition written by Anthony C. Jones and has been published by Royal Society of Chemistry this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with Science categories.
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
Atomic Layer Deposition Applications 4
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Author : Ana Londergan
language : en
Publisher: The Electrochemical Society
Release Date : 2008
Atomic Layer Deposition Applications 4 written by Ana Londergan and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008 with Science categories.
The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the symposium focus. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties. This issue of the ECS Transactions contains peer reviewed papers presented at the symposium. Breadths of ALD Applications are featured: novel nano-composites and nanostructures, dielectrics for state-of-the-art transistors and capacitors, optoelectronics and a variety of other emerging applications.
Organometallic Chemistry
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Author : Nathan J Patmore
language : en
Publisher: Royal Society of Chemistry
Release Date : 2018-11-16
Organometallic Chemistry written by Nathan J Patmore and has been published by Royal Society of Chemistry this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-11-16 with Science categories.
With the increase in volume, velocity and variety of information, researchers can find it difficult to keep up to date with the literature in their field. Providing an invaluable resource, this volume contains analysed, evaluated and distilled information on the latest in organometallic chemistry research and emerging fields. The reviews range in scope and include π-coordinated arene metal complexes and catalysis by arene exchange, rylenes as chromophores in catalysts for CO2 photoreduction, metal nodes and metal sites in metal–organic frameworks, developments in molecular precursors for CVD and ALD, and multiphoton luminescence processes in f-element containing compounds.
Atomic Layer Deposition Applications 7
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Author : J. W. Elam
language : en
Publisher: The Electrochemical Society
Release Date : 2011
Atomic Layer Deposition Applications 7 written by J. W. Elam and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011 with categories.