Atomic Layer Processing
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Atomic Layer Processing
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Author : Thorsten Lill
language : en
Publisher: John Wiley & Sons
Release Date : 2021-06-28
Atomic Layer Processing written by Thorsten Lill and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2021-06-28 with Technology & Engineering categories.
Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Atomic Layer Processing
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Author : Thorsten Lill
language : en
Publisher: John Wiley & Sons
Release Date : 2021-04-21
Atomic Layer Processing written by Thorsten Lill and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2021-04-21 with Technology & Engineering categories.
Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Atomic Layer Deposition For Semiconductors
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Author : Cheol Seong Hwang
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-10-18
Atomic Layer Deposition For Semiconductors written by Cheol Seong Hwang and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-10-18 with Science categories.
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Chemical Vapor Deposition For Nanotechnology
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Author : Pietro Mandracci
language : en
Publisher: BoD – Books on Demand
Release Date : 2019-01-10
Chemical Vapor Deposition For Nanotechnology written by Pietro Mandracci and has been published by BoD – Books on Demand this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019-01-10 with Technology & Engineering categories.
Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
Surface Modification Of Polymers
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Author : Jean Pinson
language : en
Publisher: John Wiley & Sons
Release Date : 2020-02-18
Surface Modification Of Polymers written by Jean Pinson and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-02-18 with Technology & Engineering categories.
A guide to modifying and functionalizing the surfaces of polymers Surface Modification of Polymers is an essential guide to the myriad methods that can be employed to modify and functionalize the surfaces of polymers. The functionalization of polymer surfaces is often required for applications in sensors, membranes, medicinal devices, and others. The contributors?noted experts on the topic?describe the polymer surface in detail and discuss the internal and external factors that influence surface properties. This comprehensive guide to the most important methods for the introduction of new functionalities is an authoritative resource for everyone working in the field. This book explores many applications, including the plasma polymerization technique, organic surface functionalization by initiated chemical vapor deposition, photoinduced functionalization on polymer surfaces, functionalization of polymers by hydrolysis, aminolysis, reduction, oxidation, surface modification of nanoparticles, and many more. Inside, readers will find information on various applications in the biomedical field, food science, and membrane science. This important book: -Offers a range of polymer functionalization methods for biomedical applications, water filtration membranes, and food science -Contains discussions of the key surface modification methods, including plasma and chemical techniques, as well as applications for nanotechnology, environmental filtration, food science, and biomedicine -Includes contributions from a team of international renowned experts Written for polymer chemists, materials scientists, plasma physicists, analytical chemists, surface physicists, and surface chemists, Surface Modification of Polymers offers a comprehensive and application-oriented review of the important functionalization methods with a special focus on biomedical applications, membrane science, and food science.
Handbook Of Manufacturing Engineering And Technology
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Author : Andrew Y. C. Nee
language : en
Publisher: Springer
Release Date : 2014-10-31
Handbook Of Manufacturing Engineering And Technology written by Andrew Y. C. Nee and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-10-31 with Technology & Engineering categories.
The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.
Atomic Layer Deposition Ald
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Author : Jeannie Valdez
language : en
Publisher:
Release Date : 2015
Atomic Layer Deposition Ald written by Jeannie Valdez and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015 with TECHNOLOGY & ENGINEERING categories.
Atomic layer deposition (ALD) is a thin film deposition technique used in the mass production of microelectronics. In this book, novel nonvolatile memory devices are discussed. The chapters examine the low-temperature fabrication process of single-crystal platinum non-thin films using plasma-enhanced atomic layer deposition (PEALD). A comprehensive review of ALD surface coatings for battery systems is provided, as well as a theoretical calculation on the mechanism of thermal and plasma-enhanced atomic layer deposition of SiO2; and fluorine doping behavior in Zn-based conducting oxide film grown by ALD.
Chemistry Of Atomic Layer Deposition
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Author : Seán Thomas Barry
language : en
Publisher: Walter de Gruyter GmbH & Co KG
Release Date : 2021-11-08
Chemistry Of Atomic Layer Deposition written by Seán Thomas Barry and has been published by Walter de Gruyter GmbH & Co KG this book supported file pdf, txt, epub, kindle and other format this book has been release on 2021-11-08 with Technology & Engineering categories.
This book will help chemists and non-chemists alike understand the fundamentals of surface chemistry and precursor design, and how these precursors drive the processes of atomic layer deposition, and how the surface-precursor interaction governs atomic layer deposition processes. The underlying principles in atomic layer deposition rely on the chemistry of a precursor with a surface.
Atomic Layer Deposition
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Author : Tommi Kääriäinen
language : en
Publisher: John Wiley & Sons
Release Date : 2013-05-28
Atomic Layer Deposition written by Tommi Kääriäinen and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-05-28 with Technology & Engineering categories.
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Organometallic Chemistry
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Author : Nathan J Patmore
language : en
Publisher: Royal Society of Chemistry
Release Date : 2018-11-16
Organometallic Chemistry written by Nathan J Patmore and has been published by Royal Society of Chemistry this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-11-16 with Science categories.
With the increase in volume, velocity and variety of information, researchers can find it difficult to keep up to date with the literature in their field. Providing an invaluable resource, this volume contains analysed, evaluated and distilled information on the latest in organometallic chemistry research and emerging fields. The reviews range in scope and include π-coordinated arene metal complexes and catalysis by arene exchange, rylenes as chromophores in catalysts for CO2 photoreduction, metal nodes and metal sites in metal–organic frameworks, developments in molecular precursors for CVD and ALD, and multiphoton luminescence processes in f-element containing compounds.