Atomic Layer Processing
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Atomic Layer Processing
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Author : Thorsten Lill
language : en
Publisher: John Wiley & Sons
Release Date : 2021-06-28
Atomic Layer Processing written by Thorsten Lill and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2021-06-28 with Technology & Engineering categories.
Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Surface Chemistry In Electrochemical Atomic Layer Processing
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Author :
language : en
Publisher:
Release Date : 1997
Surface Chemistry In Electrochemical Atomic Layer Processing written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with categories.
Atomic layer processing involves the formation and/or etching of materials an atomic layer at a time. Atomic layer epitaxy is the most obvious example, where a thin film of a material is formed an atomic layer at a time. That is, surface limited reactions are used to deposit individual atomic layers of the elements making up a compound. These reactions are used in a cycle, where each cycle results in the formation of a monolayer of the compound. The present studies were designed to investigate these surface limited reactions. To determine what the structures of the deposits were, and how that structure influenced subsequent deposition.
Atomic Layer Processing For Carbon Nanoelectronics
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Author : N.F.W. Thissen
language : en
Publisher:
Release Date : 2017
Atomic Layer Processing For Carbon Nanoelectronics written by N.F.W. Thissen and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017 with categories.
Atomic Layer Deposition For Nanotechnology
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Author : Arthur Sherman
language : en
Publisher:
Release Date : 2008
Atomic Layer Deposition For Nanotechnology written by Arthur Sherman and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008 with Atomic layer deposition categories.
Atomic Layer Deposition For Semiconductors
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Author : Cheol Seong Hwang
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-10-18
Atomic Layer Deposition For Semiconductors written by Cheol Seong Hwang and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-10-18 with Science categories.
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Atomic Layer Deposition
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Author : David Cameron
language : en
Publisher: MDPI
Release Date : 2020-12-28
Atomic Layer Deposition written by David Cameron and has been published by MDPI this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-12-28 with Science categories.
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing – known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics.
Atomic Layer Deposition
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Author : Tommi Kääriäinen
language : en
Publisher: John Wiley & Sons
Release Date : 2013-05-17
Atomic Layer Deposition written by Tommi Kääriäinen and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-05-17 with Technology & Engineering categories.
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Atomic Layer Deposition Applications 7
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Author : J. W. Elam
language : en
Publisher: The Electrochemical Society
Release Date : 2011
Atomic Layer Deposition Applications 7 written by J. W. Elam and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011 with categories.
Atomic Layer Deposition
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Author : David Cameron
language : en
Publisher:
Release Date : 2020
Atomic Layer Deposition written by David Cameron and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020 with categories.
Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing - known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics.
Atomic Layer Deposition Applications 5
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Author : S. de Gendt
language : en
Publisher: The Electrochemical Society
Release Date : 2009-09
Atomic Layer Deposition Applications 5 written by S. de Gendt and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009-09 with categories.
Atomic Layer Deposition can enable precise deposition of ultra-thin, highly conformal coatings over complex 3D topography, with controlled composition and properties for a wide range of applications.