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Crucial Issues In Semiconductor Materials And Processing Technologies


Crucial Issues In Semiconductor Materials And Processing Technologies
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Crucial Issues In Semiconductor Materials And Processing Technologies


Crucial Issues In Semiconductor Materials And Processing Technologies
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Author : S. Coffa
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06

Crucial Issues In Semiconductor Materials And Processing Technologies written by S. Coffa and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.


Semiconductors lie at the heart of some of the most important industries and technologies of the twentieth century. The complexity of silicon integrated circuits is increasing considerably because of the continuous dimensional shrinkage to improve efficiency and functionality. This evolution in design rules poses real challenges for the materials scientists and processing engineers. Materials, defects and processing now have to be understood in their totality. World experts discuss, in this volume, the crucial issues facing lithography, ion implication and plasma processing, metallization and insulating layer quality, and crystal growth. Particular emphasis is placed upon silicon, but compound semiconductors and photonic materials are also highlighted. The fundamental concepts of phase stability, interfaces and defects play a key role in understanding these crucial issues. These concepts are reviewed in a crucial fashion.



Crucial Issues In Semiconductor Materials And Processing Technologies


Crucial Issues In Semiconductor Materials And Processing Technologies
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Author : S.. Coffa
language : en
Publisher:
Release Date : 1992

Crucial Issues In Semiconductor Materials And Processing Technologies written by S.. Coffa and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992 with Electrical engineering categories.


Semiconductors lie at the heart of some of the most important industries and technologies of the twentieth century. The complexity of silicon integrated circuits is increasing considerably because of the continuous dimensional shrinkage to improve efficiency and functionality. This evolution in design rules poses real challenges for the materials scientists and processing engineers. Materials, defects and processing now have to be understood in their totality. World experts discuss, in this volume, the crucial issues facing lithography, ion implication and plasma processing, metallization and insulating layer quality, and crystal growth. Particular emphasis is placed upon silicon, but compound semiconductors and photonic materials are also highlighted. The fundamental concepts of phase stability, interfaces and defects play a key role in understanding these crucial issues. These concepts are reviewed in a crucial fashion.



Thin Film Transistors Polycrystalline Silicon Thin Film Transistors


Thin Film Transistors Polycrystalline Silicon Thin Film Transistors
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Author : Yue Kuo
language : en
Publisher: Springer Science & Business Media
Release Date : 2004

Thin Film Transistors Polycrystalline Silicon Thin Film Transistors written by Yue Kuo and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Technology & Engineering categories.


This is the first reference on amorphous silicon and polycrystalline silicon thin film transistors that gives a systematic global review of all major topics in the field. These volumes include sections on basic materials and substrates properties, fundamental device physics, critical fabrication processes (structures, a-Si: H, dielectric, metallization, catalytic CVD), and existing and new applications. The chapters are written by leading researchers who have extensive experience with reputed track records. Thin Film Transistors provides practical information on preparing individual functional a-Si: H TFTs and poly-Si TFTs as well as large-area TFT arrays. Also covered are basic theories on the a-Si: H TFT operations and unique material characteristics. Readers are also exposed to a wide range of existing and new applications in industries.



Ion Implantation Basics To Device Fabrication


Ion Implantation Basics To Device Fabrication
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Author : Emanuele Rimini
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-11-27

Ion Implantation Basics To Device Fabrication written by Emanuele Rimini and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-27 with Technology & Engineering categories.


Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics of devices together with a brief description of the main trends in the field. The second chapter is devoted to ion im planters, including also high energy apparatus and a description of wafer charging and contaminants. Yield is a quite relevant is sue in the industrial surrounding and must be also discussed in the academic ambient. The slowing down of ions is treated in the third chapter both analytically and by numerical simulation meth ods. Channeling implants are described in some details in view of their relevance at the zero degree implants and of the available industrial parallel beam systems. Damage and its annealing are the key processes in ion implantation. Chapter four and five are dedicated to this extremely important subject.



Radiation Effects In Solids


Radiation Effects In Solids
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Author : Kurt E. Sickafus
language : en
Publisher: Springer Science & Business Media
Release Date : 2007-05-22

Radiation Effects In Solids written by Kurt E. Sickafus and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007-05-22 with Science categories.


This book contains proceedings of the NATO Advanced Study nd Institute (ASI): The 32 Course of the International School of Solid State Physics entitled Radiation Effects in Solids, held in Erice, Sicily, Italy, July 17-29, 2004, at the Ettore Majorana Centre for Scientific Culture (EMCSC). The Course had 83 participants (68 students and 15 instructors) representing 23 countries. The purpose of this Course was to provide ASI students with a comprehensive overview of fundamental principles and relevant technical issues associated with the behavior of solids exposed to high-energy radiation. These issues are important to the development of materials for existing fission reactors or future fusion and advanced reactors for energy production; to the development of electronic devices such as high-energy detectors; and to the development of novel materials for electronic and photonic applications (particularly on the nanoscale). The Course covered a broad range of topics, falling into three general categories: Radiation Damage Fundamentals Energetic particles and energy dissipation Atomic displacements and cascades Damage evolution Defect aggregation Microstructural evolution Material Dependent Radiation Damage Phenomena (metals, alloys, semiconductors, intermetallics, ceramics, polymers, biomaterials) Atomic and microstructural effects (e.g., point defects, color centers, extended defects, dislocations, voids, bubbles, colloids, phase transformations, amorphization) Macroscopic phenomena (e.g., swelling, embrittlement, cracking, thermal conductivity degradation) vii viii Preface Special Topics Swift ion irradiation effects Ion beam modification of materials Nanostructure design via irradiation Nuclear fuels and waste forms Radiation detectors, dosimeters, phosphors, luminescent materials, etc.



Process Analytical Chemistry


Process Analytical Chemistry
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Author : Karl H. Koch
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-04-17

Process Analytical Chemistry written by Karl H. Koch and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-04-17 with Science categories.


In important branches of manufacturing industries, especially those producing chemicals, polymers, semiconductors, ceramics, metals and alloys, analytical process control is already an integral part of the company. Far reaching decisions with respect to quality, ecology and economy are based on the respective analytical data. The goal of this practice-oriented book is to introduce chemists, engineers and technicians to the strategies, techniques and efficiency of modern process analytical chemistry. The author is especially aiming at those professionals in small and medium enterprises who have to carry out process control tasks in a "solo-run".



Ion Implantation Technology 94


Ion Implantation Technology 94
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Author : S. Coffa
language : en
Publisher: Newnes
Release Date : 1995-05-16

Ion Implantation Technology 94 written by S. Coffa and has been published by Newnes this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995-05-16 with Science categories.


The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters.The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.



Fundamentals Of Semiconductor Processing Technology


Fundamentals Of Semiconductor Processing Technology
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Author : Badih El-Kareh
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06

Fundamentals Of Semiconductor Processing Technology written by Badih El-Kareh and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Science categories.


The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.



Materials For High Temperature Semiconductor Devices


Materials For High Temperature Semiconductor Devices
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Author : Committee on Materials for High-Temperature Semiconductor Devices
language : en
Publisher: National Academies Press
Release Date : 1995-09-28

Materials For High Temperature Semiconductor Devices written by Committee on Materials for High-Temperature Semiconductor Devices and has been published by National Academies Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995-09-28 with Technology & Engineering categories.


Major benefits to system architecture would result if cooling systems for components could be eliminated without compromising performance. This book surveys the state-of-the-art for the three major wide bandgap materials (silicon carbide, nitrides, and diamond), assesses the national and international efforts to develop these materials, identifies the technical barriers to their development and manufacture, determines the criteria for successfully packaging and integrating these devices into existing systems, and recommends future research priorities.



Directory Of Published Proceedings


Directory Of Published Proceedings
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Author :
language : en
Publisher:
Release Date : 1996

Directory Of Published Proceedings written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996 with Engineering categories.