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Defects In High K Gate Dielectric Stacks


Defects In High K Gate Dielectric Stacks
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Defects In High K Gate Dielectric Stacks


Defects In High K Gate Dielectric Stacks
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Author : Evgeni Gusev
language : en
Publisher: Springer Science & Business Media
Release Date : 2006-01-27

Defects In High K Gate Dielectric Stacks written by Evgeni Gusev and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006-01-27 with Computers categories.


The main goal of this book is to review at the nano and atomic scale the very complex scientific issues that pertain to the use of advanced high dielectric constant (high-k) materials in next generation semiconductor devices. One of the key obstacles to integrate this novel class of materials into Si nano-technology are the electronic defects in high-k dielectrics. It has been established that defects do exist in high-k dielectrics and they play an important role in device operation. The unique feature of this book is a special focus on the important issue of defects. The subject is covered from various angles, including silicon technology, processing aspects, materials properties, electrical defects, microstructural studies, and theory. The authors who have contributed to the book represents a diverse group of leading scientists from academic, industrial and governmental labs worldwide who bring a broad array of backgrounds (basic and applied physics, chemistry, electrical engineering, surface science, and materials science). The contributions to this book are accessible to both expert scientists and engineers who need to keep up with leading edge research, and newcomers to the field who wish to learn more about the exciting basic and applied research issues relevant to next generation device technology.



Defects In High K Gate Dielectric Stacks


Defects In High K Gate Dielectric Stacks
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Author : Evgeni Gusev
language : en
Publisher: Springer Science & Business Media
Release Date : 2006-02-15

Defects In High K Gate Dielectric Stacks written by Evgeni Gusev and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006-02-15 with Technology & Engineering categories.


The goal of this NATO Advanced Research Workshop (ARW) entitled “Defects in Advanced High-k Dielectric Nano-electronic Semiconductor Devices”, which was held in St. Petersburg, Russia, from July 11 to 14, 2005, was to examine the very complex scientific issues that pertain to the use of advanced high dielectric constant (high-k) materials in next generation semiconductor devices. The special feature of this workshop was focus on an important issue of defects in this novel class of materials. One of the key obstacles to high-k integration into Si nano-technology are the electronic defects in high-k materials. It has been established that defects do exist in high-k dielectrics and they play an important role in device operation. However, very little is known about the nature of the defects or about possible techniques to eliminate, or at least minimize them. Given the absence of a feasible alternative in the near future, well-focused scientific research and aggressive development programs on high-k gate dielectrics and related devices must continue for semiconductor electronics to remain a competitive income producing force in the global market.



Physics And Technology Of High K Gate Dielectrics 6


Physics And Technology Of High K Gate Dielectrics 6
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Author : S. Kar
language : en
Publisher: The Electrochemical Society
Release Date : 2008-10

Physics And Technology Of High K Gate Dielectrics 6 written by S. Kar and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-10 with Science categories.


The issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, novel and still higher permittivity dielectric materials, CMOS processing with high-K layers, metals for gate electrodes, interface issues, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.



Physics And Technology Of High K Gate Dielectrics I


Physics And Technology Of High K Gate Dielectrics I
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Author : Samares Kar
language : en
Publisher:
Release Date : 2003

Physics And Technology Of High K Gate Dielectrics I written by Samares Kar and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with Science categories.




Handbook Of Flexible And Stretchable Electronics


Handbook Of Flexible And Stretchable Electronics
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Author : Muhammad M. Hussain
language : en
Publisher: CRC Press
Release Date : 2019-11-11

Handbook Of Flexible And Stretchable Electronics written by Muhammad M. Hussain and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019-11-11 with Science categories.


Flexibility and stretchability of electronics are crucial for next generation electronic devices that involve skin contact sensing and therapeutic actuation. This handbook provides a complete entrée to the field, from solid-state physics to materials chemistry, processing, devices, performance, and reliability testing, and integrated systems development. This work shows how microelectronics, signal processing, and wireless communications in the same circuitry are impacting electronics, healthcare, and energy applications. Key Features: • Covers the fundamentals to device applications, including solid-state and mechanics, chemistry, materials science, characterization techniques, and fabrication; • Offers a comprehensive base of knowledge for moving forward in this field, from foundational research to technology development; • Focuses on processing, characterization, and circuits and systems integration for device applications; • Addresses the basic physical properties and mechanics, as well as the nuts and bolts of reliability and performance analysis; • Discusses various technology applications, from printed electronics to logic and memory devices, sensors, actuators, displays, and energy storage and harvesting. This handbook will serve as the one-stop knowledge base for readership who are interested in flexible and stretchable electronics.



Defects In Microelectronic Materials And Devices


Defects In Microelectronic Materials And Devices
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Author : Daniel M. Fleetwood
language : en
Publisher: CRC Press
Release Date : 2008-11-19

Defects In Microelectronic Materials And Devices written by Daniel M. Fleetwood and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-11-19 with Science categories.


Uncover the Defects that Compromise Performance and ReliabilityAs microelectronics features and devices become smaller and more complex, it is critical that engineers and technologists completely understand how components can be damaged during the increasingly complicated fabrication processes required to produce them.A comprehensive survey of defe



Physics And Technology Of High K Gate Dielectrics 4


Physics And Technology Of High K Gate Dielectrics 4
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Author : Samares Kar
language : en
Publisher: The Electrochemical Society
Release Date : 2006

Physics And Technology Of High K Gate Dielectrics 4 written by Samares Kar and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with Science categories.


This issue covers, in detail, all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.



Frontiers In Electronics


Frontiers In Electronics
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Author : Sorin Cristoloveanu
language : en
Publisher: World Scientific
Release Date : 2013

Frontiers In Electronics written by Sorin Cristoloveanu and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013 with Technology & Engineering categories.


Frontiers in Electronics is divided into four sections: advanced terahertz and photonics devices; silicon and germanium on insulator and advanced CMOS and MOSHFETs; nanomaterials and nanodevices; and wide band gap technology for high power and UV photonics. This book will be useful for nano-microelectronics scientists, engineers, and visionary research leaders. It is also recommended to graduate students working at the frontiers of the nanoelectronics and microscience.



Dielectrics For Nanosystems 4 Materials Science Processing Reliability And Manufacturing


Dielectrics For Nanosystems 4 Materials Science Processing Reliability And Manufacturing
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Author : Electrochemical society. Meeting
language : en
Publisher: The Electrochemical Society
Release Date : 2010

Dielectrics For Nanosystems 4 Materials Science Processing Reliability And Manufacturing written by Electrochemical society. Meeting and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010 with Dielectrics categories.




Silicon Nitride Silicon Dioxide And Emerging Dielectrics 9


Silicon Nitride Silicon Dioxide And Emerging Dielectrics 9
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Author : R. Ekwal Sah
language : en
Publisher: The Electrochemical Society
Release Date : 2007

Silicon Nitride Silicon Dioxide And Emerging Dielectrics 9 written by R. Ekwal Sah and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with Nature categories.


This issue of ECS Transactions contains the papers presented in the symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectics held May 6-11, 2007 in Chicago. Papers were presented on deposition, characterization and applications of the dielectrics including high- and low-k dielectrics, as well as interface states, device characterization, reliabiliy and modeling.