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Design And Development Of A Silicon Carbide Chemical Vapor Deposition Reactor


Design And Development Of A Silicon Carbide Chemical Vapor Deposition Reactor
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Design And Development Of A Silicon Carbide Chemical Vapor Deposition Reactor


Design And Development Of A Silicon Carbide Chemical Vapor Deposition Reactor
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Author : Matthew T. Smith
language : en
Publisher:
Release Date : 2003

Design And Development Of A Silicon Carbide Chemical Vapor Deposition Reactor written by Matthew T. Smith and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with categories.


ABSTRACT: The design and development of a reactor to make this process controlled and repeatable can be accomplished using theoretical and empirical tools. Fluid flow modeling, reactor sizing, low-pressure pumping and control are engineering concepts that were explored. Work on the design and development of an atmospheric pressure cold-wall CVD (APCVD) reactor will be presented. A detailed discussion of modifications to this reactor to permit hot-wall, low-pressure CVD (LPCVD) operation will then be presented. The consequences of this process variable change will be discussed as well as the necessary design parameters. Computational fluid dynamic (CFD) calculations, which predict the flow patterns of gases in the reaction tube, will be presented. Feasible CVD reactor design that results in laminar fluid flow control is a function of the prior mentioned techniques and will be presented.



Design And Development Of A Low Pressure Chemical Vapor Deposition Reactor For Growth Of Cubic 3c Silicon Carbide


Design And Development Of A Low Pressure Chemical Vapor Deposition Reactor For Growth Of Cubic 3c Silicon Carbide
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Author : Michael Peter Orthner
language : en
Publisher:
Release Date : 2006

Design And Development Of A Low Pressure Chemical Vapor Deposition Reactor For Growth Of Cubic 3c Silicon Carbide written by Michael Peter Orthner and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with Chemical reactors categories.




Design And Development Of A Sic Chemical Vapor Deposition Reactor


Design And Development Of A Sic Chemical Vapor Deposition Reactor
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Author : Matthew T. Smith
language : en
Publisher:
Release Date : 2002

Design And Development Of A Sic Chemical Vapor Deposition Reactor written by Matthew T. Smith and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Chemical engineering categories.




Development Of A Polysilicon Process Based On Chemical Vapor Deposition Phase 1


Development Of A Polysilicon Process Based On Chemical Vapor Deposition Phase 1
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Author : Hemlock Semiconductor Corporation
language : en
Publisher:
Release Date : 1980

Development Of A Polysilicon Process Based On Chemical Vapor Deposition Phase 1 written by Hemlock Semiconductor Corporation and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1980 with Chemical processes categories.




Surface Engineering Series Volume 2 Chemical Vapor Deposition


Surface Engineering Series Volume 2 Chemical Vapor Deposition
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Author : Edited by Jong-Hee Park and T.S. Sudarshan
language : en
Publisher: ASM International
Release Date : 2000-05-01

Surface Engineering Series Volume 2 Chemical Vapor Deposition written by Edited by Jong-Hee Park and T.S. Sudarshan and has been published by ASM International this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000-05-01 with Technology & Engineering categories.


This handbook provides guidelines and practical information on the chemical vapor deposition (CVD) process for surface engineering design, product development, and manufacturing. The first of the 14 chapters discuss the basic principles of CVD thermodynamics and kinetics, stresses and mechanical sta



Re Determination Of The Reaction Path Parameters Of Silicon Deposition For Aerospace Silicon Carbide Composites Via Chemical Vapor Deposition


Re Determination Of The Reaction Path Parameters Of Silicon Deposition For Aerospace Silicon Carbide Composites Via Chemical Vapor Deposition
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Author : Sandeep D. Chandrasekaram
language : en
Publisher:
Release Date : 2016

Re Determination Of The Reaction Path Parameters Of Silicon Deposition For Aerospace Silicon Carbide Composites Via Chemical Vapor Deposition written by Sandeep D. Chandrasekaram and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016 with Airplanes categories.


Development of air travel technology is always increasing and fuel efficiency is one of the most important factors that’s being looked into. For a 25% increase in fuel efficiency in the future aeroplanes, reduction in the weight of the engine is one of the factors that should be addressed while increasing the strength and power generated. For this purpose, General Electric Aviation has chosen Silicon Carbide as the material to build the turbine blades of its engines. Silicon carbide works best as it is strong, can withstand high temperature and lightweight. The downside of this material is that it reacts with water vapor at temperatures greater than 2700°F to form volatile Silicon hydroxide from Silicon dioxide, its protective layer; and furthermore it reduces to Silicon monoxide that vaporizes. To counter this problem, scientists at the National Aeronautics & Space Administration (NASA) have found that a rare earth silicate could be used as an environmental barrier coating (EBC) to prevent the exposure of Silicon Carbide to water vapor. The EBC can’t be directly coated on the Silicon Carbide surface as it isn’t chemically adhesive enough, therefore Silicon was chosen to act as the bond coat between the Silicon Carbide and EBC. The goal of this research is to design a reactor for the composites to be coated with Silicon using the reaction and diffusion kinetics determined at higher temperatures and different partial pressures compared to the standard electronics industry. Chemical Vapor Deposition is the technique that will be used in determining the necessary parameters. The findings from this research can be further used in optimizing the utilization of the reagents and optimizing the process economically.



Simulation Based Design Optimization And Control Of Silicon Carbide And Gallium Nitride Thin Film Chemical Vapor Deposition Reactor Systems


Simulation Based Design Optimization And Control Of Silicon Carbide And Gallium Nitride Thin Film Chemical Vapor Deposition Reactor Systems
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Author : Rinku Pankaj Parikh
language : en
Publisher:
Release Date : 2006

Simulation Based Design Optimization And Control Of Silicon Carbide And Gallium Nitride Thin Film Chemical Vapor Deposition Reactor Systems written by Rinku Pankaj Parikh and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with categories.




Modeling Of Chemical Vapor Deposition Reactors For Silicon Carbide And Diamond Growth


Modeling Of Chemical Vapor Deposition Reactors For Silicon Carbide And Diamond Growth
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Author : Maria Ann Kuczmarski
language : en
Publisher:
Release Date : 1992

Modeling Of Chemical Vapor Deposition Reactors For Silicon Carbide And Diamond Growth written by Maria Ann Kuczmarski and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992 with categories.




Design Development And Applications Of Engineering Ceramics And Composites


Design Development And Applications Of Engineering Ceramics And Composites
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Author : Dileep Singh
language : en
Publisher: John Wiley & Sons
Release Date : 2010-07-23

Design Development And Applications Of Engineering Ceramics And Composites written by Dileep Singh and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-07-23 with Technology & Engineering categories.


This compilation of proceedings covering the latest scientific and technological developments in design, development, and applications of engineering ceramics and composites provides a useful one-stop resource for understanding the most important issues in design, development, and applications of engineering ceramics and composites. Logically organized and carefully selected articles give insight into design, development, and applications of engineering ceramics and composites and incorporates the latest developments related to design, development, and applications of engineering ceramics and composites including developments in engineering ceramics, advanced ceramic coatings, and geopolymers.



Chemical Vapor Deposition Of Silicon Carbide On Graphite And Titanium Using A Combined Hot Wall And Heated Substrate Reactor


Chemical Vapor Deposition Of Silicon Carbide On Graphite And Titanium Using A Combined Hot Wall And Heated Substrate Reactor
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Author : Robert M. Galasso
language : en
Publisher:
Release Date : 1994

Chemical Vapor Deposition Of Silicon Carbide On Graphite And Titanium Using A Combined Hot Wall And Heated Substrate Reactor written by Robert M. Galasso and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994 with Chemical vapor deposition categories.