Modeling Of Chemical Vapor Deposition Reactors For Silicon Carbide And Diamond Growth
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Modeling Of Chemical Vapor Deposition Reactors For Silicon Carbide And Diamond Growth
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Author : Maria Ann Kuczmarski
language : en
Publisher:
Release Date : 1992
Modeling Of Chemical Vapor Deposition Reactors For Silicon Carbide And Diamond Growth written by Maria Ann Kuczmarski and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992 with categories.
Numerical Modeling Of Growth Conditions For Thin Film Silicon Carbide In An Experimental Vertical Chemical Vapor Deposition Reactor
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Author : Willie A. Givens
language : en
Publisher:
Release Date : 1991
Numerical Modeling Of Growth Conditions For Thin Film Silicon Carbide In An Experimental Vertical Chemical Vapor Deposition Reactor written by Willie A. Givens and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1991 with categories.
Computational Fluid Dynamics Modeling Of Sic Chemical Vapor Deposition
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Author : Yingquan Song
language : en
Publisher:
Release Date : 2002
Computational Fluid Dynamics Modeling Of Sic Chemical Vapor Deposition written by Yingquan Song and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Chemical vapor deposition categories.
Computational fluid dynamics (CFD) modeling is used to simulate chemical vapor deposition (CVD) of silicon carbide (SiC), a wide-band gap semiconductor with a high breakdown field. The effects on SiC CVD of precursor concentration, flow rate, temperature, pressure, heat transfer and reactor geometry are investigated. Also demonstrates the possibilty of doping SiC with solid source vanadium during CVD growth of SiC epitaxial layers.
Design And Development Of A Silicon Carbide Chemical Vapor Deposition Reactor
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Author : Matthew T. Smith
language : en
Publisher:
Release Date : 2003
Design And Development Of A Silicon Carbide Chemical Vapor Deposition Reactor written by Matthew T. Smith and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with categories.
ABSTRACT: The design and development of a reactor to make this process controlled and repeatable can be accomplished using theoretical and empirical tools. Fluid flow modeling, reactor sizing, low-pressure pumping and control are engineering concepts that were explored. Work on the design and development of an atmospheric pressure cold-wall CVD (APCVD) reactor will be presented. A detailed discussion of modifications to this reactor to permit hot-wall, low-pressure CVD (LPCVD) operation will then be presented. The consequences of this process variable change will be discussed as well as the necessary design parameters. Computational fluid dynamic (CFD) calculations, which predict the flow patterns of gases in the reaction tube, will be presented. Feasible CVD reactor design that results in laminar fluid flow control is a function of the prior mentioned techniques and will be presented.
Modeling Of Chemical Vapor Deposition Of Tungsten Films
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Author : Chris R. Kleijn
language : en
Publisher: Birkhäuser
Release Date : 2013-11-11
Modeling Of Chemical Vapor Deposition Of Tungsten Films written by Chris R. Kleijn and has been published by Birkhäuser this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-11 with Science categories.
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Diamond Films
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Author : Koji Kobashi
language : en
Publisher: Elsevier
Release Date : 2005-12-12
Diamond Films written by Koji Kobashi and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-12-12 with Science categories.
Discusses the most advanced techniques for diamond growth Assists diamond researchers in deciding on the most suitable process conditions Inspires readers to devise new CVD (chemical vapor deposition Ever since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films.
Diamond Chemical Vapor Deposition
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Author : Huimin Liu
language : en
Publisher: Elsevier
Release Date : 1996-12-31
Diamond Chemical Vapor Deposition written by Huimin Liu and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-12-31 with Technology & Engineering categories.
This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experiences researchers, scientists, and engineers in academia and industry with the latest developments in this growing field.
Cvd Xii
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Author : Klavs F. Jensen
language : en
Publisher:
Release Date : 1993
Cvd Xii written by Klavs F. Jensen and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1993 with Technology & Engineering categories.
Modeling Of Thermal Plasma Chemical Vapor Deposition Of Diamond With Liquid Feedstock Injection
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Author : David Kolman
language : en
Publisher:
Release Date : 1997
Modeling Of Thermal Plasma Chemical Vapor Deposition Of Diamond With Liquid Feedstock Injection written by David Kolman and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with categories.
Simulation Based Design Optimization And Control Of Silicon Carbide And Gallium Nitride Thin Film Chemical Vapor Deposition Reactor Systems
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Author : Rinku Pankaj Parikh
language : en
Publisher:
Release Date : 2006
Simulation Based Design Optimization And Control Of Silicon Carbide And Gallium Nitride Thin Film Chemical Vapor Deposition Reactor Systems written by Rinku Pankaj Parikh and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with categories.