Design For Manufacturability With Advanced Lithography
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Design For Manufacturability With Advanced Lithography
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Author : Bei Yu
language : en
Publisher: Springer
Release Date : 2015-10-28
Design For Manufacturability With Advanced Lithography written by Bei Yu and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015-10-28 with Technology & Engineering categories.
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
Design For Manufacturability
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Author : Artur Balasinski
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-10-05
Design For Manufacturability written by Artur Balasinski and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-10-05 with Technology & Engineering categories.
This book explains integrated circuit design for manufacturability (DfM) at the product level (packaging, applications) and applies engineering DfM principles to the latest standards of product development at 22 nm technology nodes. It is a valuable guide for layout designers, packaging engineers and quality engineers, covering DfM development from 1D to 4D, involving IC design flow setup, best practices, links to manufacturing and product definition, for process technologies down to 22 nm node, and product families including memories, logic, system-on-chip and system-in-package.
Design For Manufacturability And Statistical Design
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Author : Michael Orshansky
language : en
Publisher: Springer Science & Business Media
Release Date : 2007-10-28
Design For Manufacturability And Statistical Design written by Michael Orshansky and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007-10-28 with Technology & Engineering categories.
Design for Manufacturability and Statistical Design: A Comprehensive Approach presents a comprehensive overview of methods that need to be mastered in understanding state-of-the-art design for manufacturability and statistical design methodologies. Broadly, design for manufacturability is a set of techniques that attempt to fix the systematic sources of variability, such as those due to photolithography and CMP. Statistical design, on the other hand, deals with the random sources of variability. Both paradigms operate within a common framework, and their joint comprehensive treatment is one of the objectives of this book and an important differentation.
Physical Design And Mask Synthesis For Directed Self Assembly Lithography
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Author : Seongbo Shim
language : en
Publisher: Springer
Release Date : 2018-03-21
Physical Design And Mask Synthesis For Directed Self Assembly Lithography written by Seongbo Shim and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-03-21 with Technology & Engineering categories.
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
Soc Based Solutions In Emerging Application Domains
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Author : Veena S. Chakravarthi
language : en
Publisher: Springer Nature
Release Date : 2025-04-09
Soc Based Solutions In Emerging Application Domains written by Veena S. Chakravarthi and has been published by Springer Nature this book supported file pdf, txt, epub, kindle and other format this book has been release on 2025-04-09 with Technology & Engineering categories.
Working in the ever-evolving field of smart chip design within an AI-powered design environment, the authors of this book draw on their experiences in successfully developing system-on-chip (SoC) solutions, having grappled with the emerging design environment, innovative tools, domain-specific challenges, and major design decisions for SOC-based solutions. They present the first comprehensive guide to navigating the technical challenges of SOC-based solutions in emerging application domains, covering various design and development methodologies for system-on-chip solutions for emerging target applications. When diligently applied, the strategies and tactics presented can significantly shorten development timelines, help avoid common pitfalls, and improve the odds of success, especially in AI-powered smart EDA environments. The book provides a detailed insight into SoC-based solutions for various applications, including artificial intelligence (AI), post-quantum security feature enhancements, 3D SOCs, quantum SOCs, photonic SOCs, and SOC solutions for IoT, high-performance computing SOCs, and processor-based systems. The coverage includes architecture exploration methods for targeted applications, compute-intensive SoCs, lightweight SoCs for IOT applications, advanced technology node solutions, and solutions including hardware software co-designs and software-defined SoCs. The strategies best applied in these highly advanced technology developments are discussed in a guest chapter by a practicing high technology strategist so innovators, designers, entrepreneurs, product managers, investors, and executives may properly prepare their companies to succeed.
Design For Manufacturability And Yield For Nano Scale Cmos
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Author : Charles Chiang
language : en
Publisher: Springer Science & Business Media
Release Date : 2007-06-15
Design For Manufacturability And Yield For Nano Scale Cmos written by Charles Chiang and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007-06-15 with Technology & Engineering categories.
This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.
Nano Cmos Design For Manufacturability
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Author : Ban P. Wong
language : en
Publisher: John Wiley & Sons
Release Date : 2008-12-29
Nano Cmos Design For Manufacturability written by Ban P. Wong and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-12-29 with Technology & Engineering categories.
Discover innovative tools that pave the way from circuit and physical design to fabrication processing Nano-CMOS Design for Manufacturability examines the challenges that design engineers face in the nano-scaled era, such as exacerbated effects and the proven design for manufacturability (DFM) methodology in the midst of increasing variability and design process interactions. In addition to discussing the difficulties brought on by the continued dimensional scaling in conformance with Moore's law, the authors also tackle complex issues in the design process to overcome the difficulties, including the use of a functional first silicon to support a predictable product ramp. Moreover, they introduce several emerging concepts, including stress proximity effects, contour-based extraction, and design process interactions. This book is the sequel to Nano-CMOS Circuit and Physical Design, taking design to technology nodes beyond 65nm geometries. It is divided into three parts: Part One, Newly Exacerbated Effects, introduces the newly exacerbated effects that require designers' attention, beginning with a discussion of the lithography aspects of DFM, followed by the impact of layout on transistor performance Part Two, Design Solutions, examines how to mitigate the impact of process effects, discussing the methodology needed to make sub-wavelength patterning technology work in manufacturing, as well as design solutions to deal with signal, power integrity, WELL, stress proximity effects, and process variability Part Three, The Road to DFM, describes new tools needed to support DFM efforts, including an auto-correction tool capable of fixing the layout of cells with multiple optimization goals, followed by a look ahead into the future of DFM Throughout the book, real-world examples simplify complex concepts, helping readers see how they can successfully handle projects on Nano-CMOS nodes. It provides a bridge that allows engineers to go from physical and circuit design to fabrication processing and, in short, make designs that are not only functional, but that also meet power and performance goals within the design schedule.
Vlsi And Chip Design
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Author : Dr. M. Maheswaran
language : en
Publisher: RK Publication
Release Date : 2024-05-23
Vlsi And Chip Design written by Dr. M. Maheswaran and has been published by RK Publication this book supported file pdf, txt, epub, kindle and other format this book has been release on 2024-05-23 with Technology & Engineering categories.
VLSI and Chip Design exploration of Very Large-Scale Integration (VLSI) technology and the intricacies of modern chip design. It fundamental principles, advanced methodologies, and the latest innovations in circuit design, fabrication, and testing. With a focus on digital and analog systems, this integrates theoretical concepts with practical applications, catering to both beginners and professionals. It emphasizes design optimization, power efficiency, and scalability, making it an essential resource for engineers, researchers, and students aspiring to excel in semiconductor technology and integrated circuit design.
Directed Self Assembly Of Block Co Polymers For Nano Manufacturing
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Author : Roel Gronheid
language : en
Publisher: Woodhead Publishing
Release Date : 2015-07-17
Directed Self Assembly Of Block Co Polymers For Nano Manufacturing written by Roel Gronheid and has been published by Woodhead Publishing this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015-07-17 with Technology & Engineering categories.
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. - Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic - Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing - Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields
Handbook Of Emerging Materials For Semiconductor Industry
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Author : Young Suh Song
language : en
Publisher: Springer Nature
Release Date : 2024-05-31
Handbook Of Emerging Materials For Semiconductor Industry written by Young Suh Song and has been published by Springer Nature this book supported file pdf, txt, epub, kindle and other format this book has been release on 2024-05-31 with Technology & Engineering categories.
The proposed book will be a “one-stop” place for all the young material researchers to understand the recent and reliable material making process, characterization, and reliability test tools. The proposed book is designed to provide basic knowledge to understand and analyse structure-property relationship for reliable emerging material systems for next generation of semiconductor technologies. The book is suggested to engineers and scientists across the world working on various new and novel materials for reliable semiconductor device applications. The book is expected to serve as a reference guide for young scientists and engineers in the field of material science and electronic engineers to acquire latest state-of-art experimental and computational tools to encourage their research activities. Since the scope of the book is generic, the book can be referred by all the students of science and engineering students to create a common awareness about the latest material systems and state-of-art characterization tools that have been broadly utilized to study the physical and chemical properties of different material systems. It introduces the readers to a wide variety of new emerging materials systems including their synthesis, fabrication, measurement, reliability test, modelling and simulations with in-depth analysis of selective applications. This book contains the state-of-art research updates in the various fields of semiconductor, artificial intelligence (AI), bio-sensor, biotechnology, with respect to reliable material research. Therefore, various students who are eager to get a job in semiconductor/AI/Autonomous car/biotechnology are strongly recommended to read this book and learn about related state-of-art knowledge.