Handbook Of Contamination Control In Microelectronics
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Handbook Of Contamination Control In Microelectronics
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Author : Donald L. Tolliver
language : en
Publisher: William Andrew
Release Date : 1988
Handbook Of Contamination Control In Microelectronics written by Donald L. Tolliver and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 1988 with Computers categories.
Covers the basics of contamination control for the beginner, while also focusing in depth on critical issues of process engineering and circuit manufacturing for the more advanced reader. Stresses to readers that what makes the area of contamination control unique is its ubiquitous nature, across all facets of semiconductor manufacturing. Clean room technology, well-recognized as a fundamental requirement in modern day circuit manufacturing, barely scratches the surface in total contamination control.
Microelectronics Manufacturing Diagnostics Handbook
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Author : Abraham Landzberg
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Microelectronics Manufacturing Diagnostics Handbook written by Abraham Landzberg and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
The world of microelectronics is filled with cusses measurement systems, manufacturing many success stories. From the use of semi control techniques, test, diagnostics, and fail ure analysis. It discusses methods for modeling conductors for powerful desktop computers to their use in maintaining optimum engine per and reducing defects, and for preventing de formance in modem automobiles, they have fects in the first place. The approach described, clearly improved our daily lives. The broad while geared to the microelectronics world, has useability of the technology is enabled, how applicability to any manufacturing process of similar complexity. The authors comprise some ever, only by the progress made in reducing their cost and improving their reliability. De of the best scientific minds in the world, and fect reduction receives a significant focus in our are practitioners of the art. The information modem manufacturing world, and high-quality captured here is world class. I know you will diagnostics is the key step in that process. find the material to be an excellent reference in of product failures enables step func Analysis your application. tion improvements in yield and reliability. which works to reduce cost and open up new Dr. Paul R. Low applications and technologies. IBM Vice President and This book describes the process ofdefect re of Technology Products General Manager duction in the microelectronics world.
Handbook Of Thin Film Deposition Processes And Techniques
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Author : Krishna Seshan
language : en
Publisher: William Andrew
Release Date : 2001-02-01
Handbook Of Thin Film Deposition Processes And Techniques written by Krishna Seshan and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-02-01 with Technology & Engineering categories.
New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Handbook Of Thin Film Deposition Processes And Techniques
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Author : Krishna Seshan
language : en
Publisher:
Release Date : 2002
Handbook Of Thin Film Deposition Processes And Techniques written by Krishna Seshan and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Chemical vapor deposition categories.
The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Handbook Of Physical Vapor Deposition Pvd Processing
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Author : D. M. Mattox
language : en
Publisher: Cambridge University Press
Release Date : 2014-09-19
Handbook Of Physical Vapor Deposition Pvd Processing written by D. M. Mattox and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-09-19 with Technology & Engineering categories.
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
Contamination Control In Practice
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Author : Matts Ramstorp
language : en
Publisher: John Wiley & Sons
Release Date : 2008-06-25
Contamination Control In Practice written by Matts Ramstorp and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-06-25 with Science categories.
Contamination control has received great interest and found increasing use within several industrial branches including microelectronics, pharmaceuticals, food and beverages using various concepts of contamination control in their production, purification or packaging process. The book supplies a holistic view of contamination control, presenting the different types of contaminants in a summarized form. The focus is on how to protect products and processes from external contamination and also on different ways to take care of and control contaminants generated in the process. The aim is to eliminate them from a product or a process flow (e.g. through filtration), or to render them harmless (e.g. through sterilisation by moist heat). Product purity or the cleanliness of process flows are often complex matters and hard to define in easily understood terms. This book covers a variety of different techniques used in order to achieve and maintain certain overall cleanliness levels for both microbiological or inanimate particle contaminants. It supplies basic knowledge including validation aspects for industrial branches working with increased demands of cleanliness, for instance water purification, steam, pressurized gases and different flows in a process together with finished products.
Electronics Reliability And Measurement Technology
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Author : Joseph S. Heyman
language : en
Publisher: Elsevier
Release Date : 1998-12-31
Electronics Reliability And Measurement Technology written by Joseph S. Heyman and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998-12-31 with Technology & Engineering categories.
This book examines electronics reliability and measurement technology. It identifies advances in measurement science and technology for nondestructive evaluation, and it details common measurement trouble spots.
Fundamentals Of Contamination Control
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Author : Alan C. Tribble
language : en
Publisher: SPIE Press
Release Date : 2000
Fundamentals Of Contamination Control written by Alan C. Tribble and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Technology & Engineering categories.
This Tutorial Text provides a comprehensive introduction to the subject of contamination control, with specific applications to the aerospace industry. The author draws upon his many years as a practicing contamination control engineer, researcher, and teacher. The book examines methods to quantify the cleanliness level required by various contamination-sensitive surfaces and to predict the end-of-life contamination level for those surfaces, and it identifies contamination control techniques required to ensure mission success.
Proceedings Of The Symposium On Contamination Control And Defect Reduction In Semiconductor Manufacturing Iii
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Author : Dennis N. Schmidt
language : en
Publisher: The Electrochemical Society
Release Date : 1994
Proceedings Of The Symposium On Contamination Control And Defect Reduction In Semiconductor Manufacturing Iii written by Dennis N. Schmidt and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994 with Technology & Engineering categories.
Toxic Waste Minimization In The Printed Circuit Board Industry
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Author : T. Nunno
language : en
Publisher: William Andrew
Release Date : 2012-12-02
Toxic Waste Minimization In The Printed Circuit Board Industry written by T. Nunno and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Technology & Engineering categories.
Toxic Waste Minimization in Print.Circ.