Handbook Of Contamination Control In Microelectronics

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Handbook Of Contamination Control In Microelectronics

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Author : Donald L. Tolliver
language : en
Publisher: William Andrew
Release Date : 1988

Handbook Of Contamination Control In Microelectronics written by Donald L. Tolliver and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 1988 with Computers categories.

Covers the basics of contamination control for the beginner, while also focusing in depth on critical issues of process engineering and circuit manufacturing for the more advanced reader. Stresses to readers that what makes the area of contamination control unique is its ubiquitous nature, across all facets of semiconductor manufacturing. Clean room technology, well-recognized as a fundamental requirement in modern day circuit manufacturing, barely scratches the surface in total contamination control.

Handbook Of Contamination Control In Microelectronics

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Author : Donald L. Tolliver
language : en
Publisher: William Andrew
Release Date : 1988-12-31

Handbook Of Contamination Control In Microelectronics written by Donald L. Tolliver and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 1988-12-31 with Computers categories.

Covers the basics of contamination control for the beginner, while also focusing in depth on critical issues of process engineering and circuit manufacturing for the more advanced reader. Stresses to readers that what makes the area of contamination control unique is its ubiquitous nature, across all facets of semiconductor manufacturing. Clean room technology, well-recognized as a fundamental requirement in modern day circuit manufacturing, barely scratches the surface in total contamination control.

Fundamentals Of Contamination Control

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Author : Alan C. Tribble
language : en
Publisher: SPIE Press
Release Date : 2000

Fundamentals Of Contamination Control written by Alan C. Tribble and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Technology & Engineering categories.

This Tutorial Text provides a comprehensive introduction to the subject of contamination control, with specific applications to the aerospace industry. The author draws upon his many years as a practicing contamination control engineer, researcher, and teacher. The book examines methods to quantify the cleanliness level required by various contamination-sensitive surfaces and to predict the end-of-life contamination level for those surfaces, and it identifies contamination control techniques required to ensure mission success.

Proceedings Of The Symposium On Contamination Control And Defect Reduction In Semiconductor Manufacturing Iii

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Author : Dennis N. Schmidt
language : en
Publisher: The Electrochemical Society
Release Date : 1994

Proceedings Of The Symposium On Contamination Control And Defect Reduction In Semiconductor Manufacturing Iii written by Dennis N. Schmidt and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994 with Technology & Engineering categories.

Handbook Of Physical Vapor Deposition Pvd Processing

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Author : D. M. Mattox
language : en
Publisher: Cambridge University Press
Release Date : 2014-09-19

Handbook Of Physical Vapor Deposition Pvd Processing written by D. M. Mattox and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-09-19 with Technology & Engineering categories.

This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Handbook Of Silicon Wafer Cleaning Technology

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Author : Karen Reinhardt
language : en
Publisher: William Andrew
Release Date : 2018-03-16

Handbook Of Silicon Wafer Cleaning Technology written by Karen Reinhardt and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-03-16 with Technology & Engineering categories.

Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others. - Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits - Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries - Covers processes and equipment, as well as new materials and changes required for the surface conditioning process

Electronics Reliability And Measurement Technology

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Author : Joseph S. Heyman
language : en
Publisher: Elsevier
Release Date : 1998-12-31

Electronics Reliability And Measurement Technology written by Joseph S. Heyman and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998-12-31 with Technology & Engineering categories.

This book examines electronics reliability and measurement technology. It identifies advances in measurement science and technology for nondestructive evaluation, and it details common measurement trouble spots.

Particle Control For Semiconductor Manufacturing

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Author : Donovan
language : en
Publisher: Routledge
Release Date : 2018-05-04

Particle Control For Semiconductor Manufacturing written by Donovan and has been published by Routledge this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-05-04 with Science categories.

There is something Alice-in-Wonderlandish about powerful and vital computer systems being shut down by a microscopic mote that a hay-feverist wouldn't sneeze at, but as computer chips get smaller, smaller and smaller particles on their surface have a larger and larger effect on their performance. In

Contamination Free Manufacturing For Semiconductors And Other Precision Products

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Author : Robert P. Donovan
language : en
Publisher: CRC Press
Release Date : 2018-10-08

Contamination Free Manufacturing For Semiconductors And Other Precision Products written by Robert P. Donovan and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-10-08 with Technology & Engineering categories.

Recognizing the need for improved control measures in the manufacturing process of highly sensitized semiconductor technology, this practical reference provides in-depth and advanced treatment on the origins, procedures, and disposal of a variety of contaminants. It uses contemporary examples based on the latest hardware and processing apparatus to illustrate previously unavailable results and insights along with experimental and theoretical developments. Ensures the proper methods necessary to meet the standards established in the 1997 National Technology Roadmap for Semiconductors (NTRS)! Summarizing up-to-date control practices in the industry, Contamination-Free Manufacturing for Semiconductors and Other Precision Products: Details the physics and chemistry behind the mechanisms leading to contamination-induced failures Considers particles and molecular contaminants, including the entire spectrum of mass-based contaminants Outlines primary contamination problems and target control levels Reveals and offers solutions to inadequate areas of measurement capability and control technology Clarifies significant problems and decisions facing the industry by analyzing NTRS standards and contamination mechanisms Containing over 700 literature references, drawings, photographs, equations, and tables, Contamination-Free Manufacturing for Semiconductors and Other Precision Products is an essential reference for electrical and electronics, instrumentation, process, manufacturing, development, contamination control and quality engineers; physicists; and upper-level undergraduate and graduate students in these disciplines.

Toxic Waste Minimization In The Printed Circuit Board Industry

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Author : T. Nunno
language : en
Publisher: William Andrew
Release Date : 2012-12-02

Toxic Waste Minimization In The Printed Circuit Board Industry written by T. Nunno and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Technology & Engineering categories.

Toxic Waste Minimization in Print.Circ.