Handbook Of Sputter Deposition Technology
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Handbook Of Sputter Deposition Technology
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Author : Kiyotaka Wasa
language : en
Publisher: William Andrew
Release Date : 2012-12-31
Handbook Of Sputter Deposition Technology written by Kiyotaka Wasa and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-31 with Technology & Engineering categories.
This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. - A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available - All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique - 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
Handbook Of Sputter Deposition Technology
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Author : Shigeru Hayakawa
language : en
Publisher: William Andrew Publishing
Release Date : 1992-01-01
Handbook Of Sputter Deposition Technology written by Shigeru Hayakawa and has been published by William Andrew Publishing this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992-01-01 with Reference categories.
A concise, comprehensive overview of sputter deposition technologyùa key technology for materials research in the next decade. Cathode sputtering is widely used in the microelectronics industry for silicon integrated circuit production and for metallurgical coatings. High temperature superconductors can be synthesized with sputtering under non-equilibrium conditions. Diamond films and ferroelectric materials are other applications.
Handbook Of Deposition Technologies For Films And Coatings
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Author : Peter M. Martin
language : en
Publisher: William Andrew Pub
Release Date : 2009
Handbook Of Deposition Technologies For Films And Coatings written by Peter M. Martin and has been published by William Andrew Pub this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with Technology & Engineering categories.
Recent years have seen a rapid expansion in the applications of advanced thin film coatings in areas including photovoltaics, energy conversion, energy efficiency, biomedical engineering, telecommunications, pharmaceuticals and flat panel displays. In a tough economic climate, surface engineering remains a growth industry, because surface engineered products improve performance, increase energy efficiency, add functionality and reduce costs. This fully updated edition of Handbook of Deposition Technologies for Films and Coatings explores these new applications, and the major advances in deposition processes and technologies that have made them possible. The aim of this handbook is to provide scientists and engineers with detailed and practical information on: Deposition processes for thin film coatings Surface engineering Advanced thin film applications and structures Relationships between deposition process parameters and thin film microstructure Nucleation and thin film growth processes Sculpted thin films Characterization of composition, bonding, and microstructure The role of plasmas in thin film growth In this third edition, extensive new material has been added throughout the book, especially in the areas concerned with plasma assisted vapor deposition processes and metallurgical coating applications. Peter M. Martin gained his PhD in Solid State Physics from Ohio State University and was a Post Doctoral Fellow at Carnegie-Mellon University. Dr Martin has been instrumental in developing patterned optical coatings for optical filtering, microwave shielding, and non-linear optical applications. - Explains in depth the many recent improvements in deposition technologies and applications - Thoroughly explains deposition technologies and their current applications - Discusses the numerous 'frontier areas' for the applications of the products of deposition technology
Handbook Of Physical Vapor Deposition Pvd Processing
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Author : Donald M. Mattox
language : en
Publisher: William Andrew
Release Date : 2010-04-29
Handbook Of Physical Vapor Deposition Pvd Processing written by Donald M. Mattox and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-04-29 with Technology & Engineering categories.
This updated version of the popular handbook further explains all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the new edition remains on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications, with additional information to support the original material. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called "war stories", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language. - Fully revised and updated to include the latest developments in PVD process technology - 'War stories' drawn from the author's extensive experience emphasize important points in development and manufacturing - Appendices include listings of periodicals and professional societies, terms and acronyms, and material on transferring technology between R&D and manufacturing
Handbook Of Thin Film Deposition Processes And Techniques
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Author : Krishna Seshan
language : en
Publisher:
Release Date : 2002
Handbook Of Thin Film Deposition Processes And Techniques written by Krishna Seshan and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Chemical vapor deposition categories.
The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
High Power Impulse Magnetron Sputtering
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Author : Daniel Lundin
language : en
Publisher: Elsevier
Release Date : 2019-08-30
High Power Impulse Magnetron Sputtering written by Daniel Lundin and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019-08-30 with Technology & Engineering categories.
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
Handbook Of Sputter Deposition Technology
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Author : K. Wasa
language : it
Publisher:
Release Date :
Handbook Of Sputter Deposition Technology written by K. Wasa and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on with categories.
The Foundations Of Vacuum Coating Technology
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Author : D. M. Mattox
language : en
Publisher: Springer Science & Business Media
Release Date : 2003
The Foundations Of Vacuum Coating Technology written by D. M. Mattox and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with Science categories.
Annotation applications of this technology. With its many references, this book provides a starting point for more in-depth surveys on what has been done as well as more recent work. The author draws comparisons and places the information in the proper context, which is particularly helpful for the patent literature where the terminology used is often not that used by the technical community. A "must" for materials scientists and engineers working with vacuum coating in the invention of new applications and researching patents, plus of special interest to those in the semiconductors field.
Handbook Of Thin Film Deposition Techniques Principles Methods Equipment And Applications Second Editon
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Author : Krishna Seshan
language : en
Publisher: CRC Press
Release Date : 2002-02-01
Handbook Of Thin Film Deposition Techniques Principles Methods Equipment And Applications Second Editon written by Krishna Seshan and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002-02-01 with Science categories.
The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec