Hybrid P Channel Poly Si Junctionless Field Effect Transistors With Trench And Gate All Around Structure
DOWNLOAD
Download Hybrid P Channel Poly Si Junctionless Field Effect Transistors With Trench And Gate All Around Structure PDF/ePub or read online books in Mobi eBooks. Click Download or Read Online button to get Hybrid P Channel Poly Si Junctionless Field Effect Transistors With Trench And Gate All Around Structure book now. This website allows unlimited access to, at the time of writing, more than 1.5 million titles, including hundreds of thousands of titles in various foreign languages. If the content not found or just blank you must refresh this page
Hybrid P Channel Poly Si Junctionless Field Effect Transistors With Trench And Gate All Around Structure
DOWNLOAD
Author : Che Hsiang Cheng
language : en
Publisher:
Release Date : 2016
Hybrid P Channel Poly Si Junctionless Field Effect Transistors With Trench And Gate All Around Structure written by Che Hsiang Cheng and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016 with categories.
Emerging Devices For Low Power And High Performance Nanosystems
DOWNLOAD
Author : Simon Deleonibus
language : en
Publisher: CRC Press
Release Date : 2018-12-13
Emerging Devices For Low Power And High Performance Nanosystems written by Simon Deleonibus and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-12-13 with Science categories.
The history of information and communications technologies (ICT) has been paved by both evolutive paths and challenging alternatives, so-called emerging devices and architectures. Their introduction poses the issues of state variable definition, information processing, and process integration in 2D, above IC, and in 3D. This book reviews the capabilities of integrated nanosystems to match low power and high performance either by hybrid and heterogeneous CMOS in 2D/3D or by emerging devices for alternative sensing, actuating, data storage, and processing. The choice of future ICTs will need to take into account not only their energy efficiency but also their sustainability in the global ecosystem.
Study Of Gate All Around P Channel Junctionless Poly Si Field Effect Transistor With Ultra Thin Body
DOWNLOAD
Author :
language : en
Publisher:
Release Date : 2015
Study Of Gate All Around P Channel Junctionless Poly Si Field Effect Transistor With Ultra Thin Body written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015 with categories.
Study Of Hybrid P N Channel With Back Gate Junctionless Field Effect Transistor
DOWNLOAD
Author :
language : en
Publisher:
Release Date : 2015
Study Of Hybrid P N Channel With Back Gate Junctionless Field Effect Transistor written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015 with categories.
Nanoscale Effects In Junctionless Field Effect Transistors
DOWNLOAD
Author : Abdussamad Ahmed Muntahi
language : en
Publisher:
Release Date : 2018
Nanoscale Effects In Junctionless Field Effect Transistors written by Abdussamad Ahmed Muntahi and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018 with Metal semiconductor field-effect transistors categories.
Though the concept of junctionless field effect transistor (JLFET) is old, it was not possible to fabricate a useful JLFET device, as it requires a very shallow channel region. Very recently, the emergence of new and advanced technologies has made it possible to create viable JLFET devices using nanowires. This work aims to computationally investigate the interplay of quantum size-quantization and random dopant fluctuations (RDF) effects in nanoscale JLFETs. For this purpose, a 3-D fully atomistic quantum-corrected Monte Carlo device simulator has been integrated and used in this work. The size-quantization effect has been accounted for via a parameter-free effective potential scheme and benchmarked against the NEGF approach in the ballistic limit. To study the RDF effects and treat full Coulomb (electron-ion and electron-electron) interactions in the real-space and beyond the Poisson picture, the simulator implements a corrected-Coulomb electron dynamics (QC-ED) approach. The essential bandstructure and scattering parameters (energy bandgap, effective masses, and the density-of-states) have been computed using an atomistic 20-band nearest-neighbour sp 3d5s* tight-binding scheme. First, an experimental device was simulated to evaluate the validity of the simulator. Because of the small dimension, quantum mechanical confinement was found to be the dominant mechanism that significantly degrades the current drive capability of nanoscale JLFETs. Surface roughness scattering is not as prominent as observed in conventional MOSFETs. Also, because of its small size, the performance of the device is prone to the effect of variability, for which a discrete doping model was proved essential. Finally, a new JLFET was designed and optimized in this work. The proposed device is based on a gate-all-around silicon nanowire. Source/drain length is 32.5 nm and channel length is 14 nm. Gate contact length is 9 nm. The EOT (equivalent oxide thickness) is 1 nm. It has a metal gate with a workfunction of 4.55 eV. The source, channel and drain regions are n-type with a doping density of 1.5×1019 cm-3. Detailed simulation shows that the two most influential mechanisms that degrade the drive capability are quantum mechanical confinement and Coulomb scattering. Surface roughness scattering is found to be very weak. In addition, thinner nanowire is more prone to Coulomb scattering exhibiting a reduced ON-current (ION). Simulation results show that silicon nanowires with a side length (width and depth) of 3 nm and a doping density of 1.5×1019 cm-3 produce satisfactory drive current.
Study Of Multi Stacking Hybrid P N O P Nanosheet Layers Junctionless Field Effect Transistors
DOWNLOAD
Author : Yi-Fan Chen
language : en
Publisher:
Release Date : 2018
Study Of Multi Stacking Hybrid P N O P Nanosheet Layers Junctionless Field Effect Transistors written by Yi-Fan Chen and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018 with categories.
Strain Engineered Si Ge Nanowire Heterostructures And Josephson Junction Field Effect Transistors For Logic Device Applications
DOWNLOAD
Author : Feng Wen
language : en
Publisher:
Release Date : 2020
Strain Engineered Si Ge Nanowire Heterostructures And Josephson Junction Field Effect Transistors For Logic Device Applications written by Feng Wen and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020 with categories.
There has been relentless effort on the physical scaling of silicon (Si) metal-oxide-semiconductor field-effect transistors (MOSFETs) in pursuit of higher computing power in the past decades. Silicon and germanium (Ge) based nanowires are compatible with the standard Si process and promising for the ultimately scaled devices, by allowing the gate-all-around geometry and integration of strain engineering through radial heterostructures to address device-scaling limitations. In the first part of the thesis, advances in probing the strain of radial nanowire heterostructures and carrier mobility enhancement through strain engineering are presented. We present a sequence of structural characterization techniques for Ge-Si [subscript x] Ge [subscript 1-x] and Si-Si [subscript x] Ge [subscript 1-x] core-shell nanowires that extends to all types of Si-Ge radial nanowire heterostructures examined in the thesis. We combine planar and cross-sectional transmission electron microscopy to identify the crystal structure, orientation and morphology of the nanowire heterostructures. We then apply continuum elasticity model to calculate the strain distribution, which coupled with the lattice dynamic theory yields the Ge-Ge or Si-Si Raman modes under strain, showing good agreement with the experimental values acquired via Raman spectroscopy. We also study the electrical properties of Si [subscript x] Ge [subscript 1-x]-Si core-shell nanowires by fabricating and characterizing n-type MOSFETs, and show that the tensile strain in the Si shell leads to a 40% electron mobility enhancement compared to bare Si nanowire MOSFETs. Additionally, we demonstrate both n-type and p-type MOSFETs using Si [subscript x] Ge [subscript 1-x]-Ge-Si core-double-shell nanowires as channel, designed so that holes populate the Ge shell and electrons populate the Si shell, with mobility enhancement of both carriers thanks to the compressive and tensile strain in the respective region. We also extract the valence band offset from the decoupled hole transport in the two shells at low temperature, overcoming the issue that most techniques available to probe the band structure in planar heterostructures are not promptly applicable. Reducing the operation temperature provides an additional path for system optimization in addition to the shrinking of device geometry. In the second part of the thesis, we explore a Boolean logic device suitable for cryogenic computing. We execute a combined effort of modeling and experimental characterization to examine the feasibility of Josephson junction field-effect transistors (JJ-FETs) for logic device applications at low temperatures. JJ-FETs are similar to MOSFETs, with their source and drain electrodes being superconducting at the operation temperature. We develop a compact model for JJ-FETs operating in the short ballistic regime, and perform circuit level simulations to investigate the criteria of signal restoration and fan-out for JJ-FET logic gates. We also experimentally demonstrate the operation of JJ-FETs based on an InAs quantum well heterostructure platform. We perform self-consistent Poisson-Schrödinger simulations, finding different gate voltage regimes where carriers populate one or more subbands in different vertical positions of the heterostructure. Furthermore, we extend the short ballistic model to interpret the experimental data, and discuss the impact of a low oxide/channel interface quality on the implementation of practical JJ-FET logic devices
A Simulation Study Of Enhancement Mode Indium Arsenide Nanowire Field Effect Transistor
DOWNLOAD
Author : Harish Narendar
language : en
Publisher:
Release Date : 2009
A Simulation Study Of Enhancement Mode Indium Arsenide Nanowire Field Effect Transistor written by Harish Narendar and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with categories.
As device dimensions continue to shrink into the nanometer length regime, conventional complementary metal-oxide semiconductor (CMOS) technology will approach its fundamental physical limits. Further miniaturization based on conventional scaling appears neither technically nor economically feasible. New strategies, including the use of novel materials and one-dimensional device concepts, innovative device architectures, and smart integration schemes need to be explored. They are crucial to extending current capabilities and maintaining momentum beyond the end of the technology roadmap. Semiconducting nanowires are an attractive and viable option for channel structures. By virtue of their potential one-dimensionality, such nanoscale structures introduce quantum confinement effects, thus enabling new functionalities and device concepts. In this thesis we study performance limits of Indium Arsenide nanowire Field Effect Transistors (InAs NWFETs) in a Gate All Around (GAA) structure and examine its upper limits of performance. InAs in particular is an attractive candidate for NW-based electronic devices because of its very high electron mobility at room temperature of 30,000 cm2/Vs in comparison to silicon's mobility of 1480 cm2/Vs. The device simulations were carried out using MultiGate Nanowire (Nanowire MG) simulator made available at NanoHUB (www.nanohub.org) by Network for Computational Nanotechnology (NCN). The InAs NWFET was simulated for variations in channel diameter, channel length, oxide thickness and the corresponding Id -- Vg characteristics were analyzed. Short Channel Effects (SCEs) namely Drain Induced Barrier Lowering (DIBL) and threshold voltage roll off were studied. Sub-threshold slope and ON/OFF current variations were analyzed for variations in device dimensions. Finally the device characteristics of Silicon Nanowire Field Effect Transistors (Si NWFETs) were simulated for the same variations in channel diameter, channel length and oxide thickness and a comparative study of the device performance between InAs NWFET and Si NWFET was carried out to assess the effect of varying the channel material system. It was concluded that Silicon NWFET showed higher immunity towards threshold voltage roll off with scaling in channel length and exhibited better sub-threshold slopes for the same device structure in comparison to the InAs NWFET. Also it was observed that Silicon NWFET operated with lower leakage currents compared to InAs NWFET. Overall it was concluded that SiNWFET exhibited higher immunity towards short channel effects while InAs NWFET showed higher drive currents in the order of 0.10x10^(−3) A/ [mu] m compared to 8.4x10^(−6) A/ [mu] m which would translate to higher switching speeds.
Fundamentals Of Iii V Semiconductor Mosfets
DOWNLOAD
Author : Serge Oktyabrsky
language : en
Publisher: Springer Science & Business Media
Release Date : 2010-03-16
Fundamentals Of Iii V Semiconductor Mosfets written by Serge Oktyabrsky and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-03-16 with Technology & Engineering categories.
Fundamentals of III-V Semiconductor MOSFETs presents the fundamentals and current status of research of compound semiconductor metal-oxide-semiconductor field-effect transistors (MOSFETs) that are envisioned as a future replacement of silicon in digital circuits. The material covered begins with a review of specific properties of III-V semiconductors and available technologies making them attractive to MOSFET technology, such as band-engineered heterostructures, effect of strain, nanoscale control during epitaxial growth. Due to the lack of thermodynamically stable native oxides on III-V's (such as SiO2 on Si), high-k oxides are the natural choice of dielectrics for III-V MOSFETs. The key challenge of the III-V MOSFET technology is a high-quality, thermodynamically stable gate dielectric that passivates the interface states, similar to SiO2 on Si. Several chapters give a detailed description of materials science and electronic behavior of various dielectrics and related interfaces, as well as physics of fabricated devices and MOSFET fabrication technologies. Topics also include recent progress and understanding of various materials systems; specific issues for electrical measurement of gate stacks and FETs with low and wide bandgap channels and high interface trap density; possible paths of integration of different semiconductor materials on Si platform.
A Simulation Study Of Silicon Nanowire Field Effect Transistors Fets
DOWNLOAD
Author :
language : en
Publisher:
Release Date : 2007
A Simulation Study Of Silicon Nanowire Field Effect Transistors Fets written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with categories.
Abstract Silicon planar MOSFETs are approaching their scaling limits. New device designs are being explored to replace the existing planar technology. Among the possible new device designs are Double Gate (DG) FETs, FinFETs, Tri-Gate FETs and Omega- Gate FETs. The Silicon Nanowire Gate All Around (GAA) FET stands out as one of the most promising FET designs due to its maximum gate effect in controlling the short channel effects. Recent developments such as synthesis of highly ordered nanowires and fabrication of nanowires as small as 1nm in diameter have illustrated the progress possible in silicon nanowire technology In this study we have explored the silicon nanowire FET as a possible candidate to replace the currently planar MOSFETs. In this thesis we investigated the silicon nanowire FET device and compared its performance with that of a double gate (DG) FET. The software used for the study assumed quantum-ballistic transport (NanoWire), which was developed at Purdue University. Initially, we presented a comparison of Nanowire FET with DG FET with for devices with same physical parameters. It was seen that superior subthreshold characteristics are exhibited by a silicon nanowire FET. We also conducted an optimization study for the 25 nm node from the ITRS report. The final device was optimized for both High Performance and Low Operating Power applications. A further study on future technology nodes down to the 14 nm node was performed which revealed short channel effects becomes significant at gate lengths ~ 5 nm even for a silicon nanowire device. Finally, a process variation study was conducted in comparison with a FinFET device. It was concluded that a silicon nanowire FET shows less sensitivity to process variation except it has higher sensitivity in variation with the diameter at less than ~4 nm than for FinFET where significant quantum effects set in. Variation with the gate length was found to be much less sensitive for the silicon nanowire FET because of its superior gate control characteristics.