Materials Science Of Thin Films Deposition And Structure

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The Materials Science Of Thin Films

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Author : Milton Ohring
language : en
Publisher: Academic Press
Release Date : 1992

The Materials Science Of Thin Films written by Milton Ohring and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992 with Science categories.

Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.

Materials Science Of Thin Films

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Author : Milton Ohring
language : en
Publisher: Academic Press
Release Date : 2002

Materials Science Of Thin Films written by Milton Ohring and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Science categories.

This is the first book that can be considered a textbook on thin film science, complete with exercises at the end of each chapter. Ohring has contributed many highly regarded reference books to the AP list, including Reliability and Failure of Electronic Materials and the Engineering Science of Thin Films. The knowledge base is intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films and scientists and engineers who are entering or require an overview of the field. Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have been greatly updated, and several new chapters have been added.

Materials Science Of Thin Films

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Author : Milton Ohring
language : en
Publisher: Academic Press
Release Date : 2013-07-15

Materials Science Of Thin Films written by Milton Ohring and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-07-15 with Technology & Engineering categories.

When Ohring's Materials Science of Thin Films was first published in 1992, there were already at least 200 existing books on various aspects of thin film science and technology, but Ohring was quickly recognized as the first true textbook on the subject specifically intended for senior/graduate level classroom use in universities, as well as industrial in-house or short courses offered by professional societies. It offers the most comprehensive coverage of materials science and technology related to thin films and coatings of any book in the field. Partly because of that and because of the author's engaging writing style, Materials Science of Thin Films has been, and continues to be, the leading textbook in the field. The 3rd edition has been capably revised by Dr. Daniel Gall, associate professor of materials science and engineering at RPI, and Dr. Shefford Baker, associate professor of materials science and engineering at Cornell University. Provides the most comprehensive coverage of materials science and technology related to thin films and coatings of any book in the field Content has been updated to include coverage of the latest and most important deposition techniques, including atomic layer deposition and high impulse magnetron sputtering Includes new or expanded coverage of recent developments in thin films technology, such as filtered cathodic arcs, nanorod growth by the vapor-liquid-solid process, carbon nanotubes, new quantitative kinetic nucleation models, atomic-level growth classifications, bi-textured layers, surface morphological evolution models, and competitive grain growth

Thin Film Materials

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Author : L. B. Freund
language : en
Publisher: Cambridge University Press
Release Date : 2004-01-08

Thin Film Materials written by L. B. Freund and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004-01-08 with Technology & Engineering categories.

Thin film mechanical behavior and stress presents a technological challenge for materials scientists, physicists and engineers. This book provides a comprehensive coverage of the major issues and topics dealing with stress, defect formation, surface evolution and allied effects in thin film materials. Physical phenomena are examined from the continuum down to the sub-microscopic length scales, with the connections between the structure of the material and its behavior described. Theoretical concepts are underpinned by discussions on experimental methodology and observations. Fundamental scientific concepts are embedded through sample calculations, a broad range of case studies with practical applications, thorough referencing, and end of chapter problems. With solutions to problems available on-line, this book will be essential for graduate courses on thin films and the classic reference for researchers in the field.

Principles Of Vapor Deposition Of Thin Films

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Author : Professor K.S. K.S Sree Harsha
language : en
Publisher: Elsevier
Release Date : 2005-12-16

Principles Of Vapor Deposition Of Thin Films written by Professor K.S. K.S Sree Harsha and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-12-16 with Technology & Engineering categories.

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.* Offers detailed derivation of important formulae.* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

Science And Technology Of Thin Films

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Author : F. C. Matacotta
language : en
Publisher: World Scientific
Release Date : 1995

Science And Technology Of Thin Films written by F. C. Matacotta and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995 with Science categories.

This book brings together detailed discussions by leading experts on the various innovative aspects of thin films growth, deposition and characterization techniques, and new thin film materials and devices. It addresses through the different viewpoints of the contributors, the major problem of thin films science - the relation between the energy of the condensing species and the resulting properties of the films. Some of the issues considered include energetic condensation, bombardment stabilization, pulsed electron beam ablation, orientation and self-organization of organic, ferroelectric and nanoparticle thin films. Several chapters focus on applications such as the recent developments in organic optoelectronics, large area electronic technology and superconducting thin film devices.

Thin Films By Chemical Vapour Deposition

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Author : C.E. Morosanu
language : en
Publisher: Elsevier
Release Date : 2016-06-22

Thin Films By Chemical Vapour Deposition written by C.E. Morosanu and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-06-22 with Technology & Engineering categories.

The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously. Contents: Part I. 1. Evolution of CVD Films. Introductory remarks. Short history of CVD thin films. II. Fundamentals. 2. Techniques of Preparing Thin Films. Electrolytic deposition techniques. Vacuum deposition techniques. Plasma deposition techniques. Liquid-phase deposition techniques. Solid-phase deposition techniques. Chemical vapour conversion of substrate. Chemical vapour deposition. Comparison between CVD and other thin film deposition techniques. 3. Chemical Processes Used in CVD. Introduction. Description of chemical reactions used in CVD. 4. Thermodynamics of CVD. Feasibility of a CVD process. Techniques for equilibrium calculations in CVD systems. Examples of thermodynamic studies of CVD systems. 5. Kinetics of CVD. Steps and control type of a CVD heterogeneous reaction. Influence of experimental parameters on thin film deposition rate. Continuous measurement of the deposition rate. Experimental methods for studying CVD kinetics. Role of homogeneous reactions in CVD. Mechanism of CVD processes. Kinetics and mechanism of dopant incorporation. Transport phenomena in CVD. Status of kinetic and mechanism investigations in CVD systems. 6. Measurement of Thin Film Thickness. Mechanical methods. Mechanical-optical methods. Optical methods. Electrical methods. Miscellaneous methods. 7. Nucleation and Growth of CVD Films. Stages in the nucleation and growth mechanism. Regimes of nucleation and growth. Nucleation theory. Dependence of nucleation on deposition parameters. Heterogeneous nucleation and CVD film structural forms. Homogeneous nucleation. Experimental techniques. Experimental results of CVD film nucleation. 8. Thin Film Structure. Techniques for studying thin film structure. Structural defects in CVD thin films. 9. Analysis of CVD Films. Analysis techniques of thin film bulk. Analysis techniques of thin film surfaces. Film composition measurement. Depth concentration profiling. 10. Properties of CVD Films. Mechanical properties. Thermal properties. Optical properties. Photoelectric properties. Electrical properties. Magnetic properties. Chemical properties. Part III. 11. Equipment and Substrates. Equipment for CVD. Safety in CVD. Substrates. 12. Preparation and Properties of Semiconducting Thin Films. Homoepitaxial semiconducting films. Heteroepitaxial semiconducting films. 13. Preparation and Properties of Amorphous Insulating Thin Films. Oxides. Nitrides and Oxynitrides. Polymeric thin films. 14. Preparation and Properties of Conductive Thin Films. Metals and metal alloys. Resistor materials. Transparent conducting films. Miscellaneous materials. 15. Preparation and Properties of Superconducting and Magnetic Thin Films. Superconducting materials. Magnetic materials. 16. Uses of CVD Thin Films. Applications in electronics and microelectronics. Applications in the field of microwaves and optoelectronics. Miscellaneous applications. Artificial heterostructures (Quantum wells, superlattices, monolayers, two-dimensional electron gases). Part V. 17. Present and Future Importance of CVD Films.

Sputtering Materials For Vlsi And Thin Film Devices

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Author : Jaydeep Sarkar
language : en
Publisher: William Andrew
Release Date : 2010-12-13

Sputtering Materials For Vlsi And Thin Film Devices written by Jaydeep Sarkar and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-12-13 with Technology & Engineering categories.

An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . - Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements - Practical information on technology trends, role of sputtering and major OEMs - Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. - Practical case-studies on target performance and troubleshooting - Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry

Surface Properties And Engineering Of Complex Intermetallics

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Author : Esther Belin-Ferré
language : en
Publisher: World Scientific
Release Date : 2010

Surface Properties And Engineering Of Complex Intermetallics written by Esther Belin-Ferré and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010 with Science categories.

This book, the third in a series of four publications issued annually as a deliverable of the research school established within the European Network of Excellence CMA (for Complex Metallic Alloys), is written by reputed experts in the fields of surface physics and chemistry, metallurgy and process engineering. It combines expertise found inside as well as outside the network. The CMA network focuses on the huge group of largely unknown multinary alloys and compounds formed with crystal structures based on giant unit cells containing clusters, with many tens or up to thousands of atoms per unit cell. In these phases, for many phenomena, the physical length scales are substantially smaller than the unit-cell dimension. Hence, these materials offer unique combinations of properties which are mutually excluded in conventional materials: metallic electric conductivity combined with low thermal conductivity, combination of good light absorption with high-temperature stability, combination of high metallic hardness with reduced wetting by liquids, electrical and thermal resistance tuneable by composition variation, excellent resistance to corrosion, reduced cold-welding and adhesion, enhanced hydrogen storage capacity and light absorption. This book series will concentrate on the: development of fundamental knowledge with the aim of understanding materials phenomena, technologies associated with the production, transformation and processing of knowledge-based multifunctional materials, surface engineering, support for new materials development and new knowledge-based higher performance materials for macro-scale applications.

An Introduction To Thin Films

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Author : Leon I. Maissel
language : en
Publisher: CRC Press
Release Date : 1973

An Introduction To Thin Films written by Leon I. Maissel and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1973 with Science categories.