Principles Of Vapor Deposition Of Thin Films

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Principles Of Vapor Deposition Of Thin Films

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Author : Professor K.S. K.S Sree Harsha
language : en
Publisher: Elsevier
Release Date : 2005-12-16

Principles Of Vapor Deposition Of Thin Films written by Professor K.S. K.S Sree Harsha and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-12-16 with Technology & Engineering categories.

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.* Offers detailed derivation of important formulae.* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

Principles Of Chemical Vapor Deposition

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Author : Daniel Dobkin
language : en
Publisher: Springer Science & Business Media
Release Date : 2003-04-30

Principles Of Chemical Vapor Deposition written by Daniel Dobkin and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-04-30 with Technology & Engineering categories.

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

Handbook Of Thin Film Deposition Processes And Techniques

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Author : Krishna Seshan
language : en
Publisher:
Release Date : 2002

Handbook Of Thin Film Deposition Processes And Techniques written by Krishna Seshan and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Chemical vapor deposition categories.

The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Chemical Physics Of Thin Film Deposition Processes For Micro And Nano Technologies

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Author : Y. Pauleau
language : en
Publisher: Springer Science & Business Media
Release Date : 2002-04-30

Chemical Physics Of Thin Film Deposition Processes For Micro And Nano Technologies written by Y. Pauleau and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002-04-30 with Science categories.

Proceedings of the NATO Advanced Study Institute, held in Kaunas, Lithuania, from 3-14 September 2001

Thin Film Deposition Techniques

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Author : Tahir Iqbal Awan
language : en
Publisher: Springer Nature
Release Date : 2025-01-02

Thin Film Deposition Techniques written by Tahir Iqbal Awan and has been published by Springer Nature this book supported file pdf, txt, epub, kindle and other format this book has been release on 2025-01-02 with Technology & Engineering categories.

This book describes the basics and historical aspects of thin film. The introductory chapter of this book contains various aspects about thin-film deposition methods, significance of nanomaterials in the fabrication of thin film, certain fundamental characteristics of thin films (electrical, optical, and morphological), some challenges (thickness uniformity, film adhesion issues, temperature-related challenges, film defects and quality control, preparation of the surface of the substrate before deposition, etc.) faced during the formation of thin film, significance, and different types of deposition techniques along with their basic introduction, working principle, construction, merits/demerits, and also application in specific fields. This book specifically works on the techniques of thin-film deposition and role of the thin film in the formation of these deposition methods.

Thin Film Deposition Principles And Practice

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Author : Donald L. Smith
language : en
Publisher: McGraw Hill Professional
Release Date : 1995-03-22

Thin Film Deposition Principles And Practice written by Donald L. Smith and has been published by McGraw Hill Professional this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995-03-22 with Technology & Engineering categories.

Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product.

Handbook Of Physical Vapor Deposition Pvd Processing

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Author : Donald M. Mattox
language : en
Publisher: William Andrew
Release Date : 2010-04-29

Handbook Of Physical Vapor Deposition Pvd Processing written by Donald M. Mattox and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-04-29 with Technology & Engineering categories.

This updated version of the popular handbook further explains all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the new edition remains on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications, with additional information to support the original material. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called "war stories", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language. - Fully revised and updated to include the latest developments in PVD process technology - 'War stories' drawn from the author's extensive experience emphasize important points in development and manufacturing - Appendices include listings of periodicals and professional societies, terms and acronyms, and material on transferring technology between R&D and manufacturing

Chemical Vapor Deposition

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Author : S Neralla
language : en
Publisher: BoD – Books on Demand
Release Date : 2016-08-31

Chemical Vapor Deposition written by S Neralla and has been published by BoD – Books on Demand this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-08-31 with Science categories.

This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.

Chemical Vapor Deposition For Microelectronics

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Author : Arthur Sherman
language : en
Publisher: William Andrew
Release Date : 1987

Chemical Vapor Deposition For Microelectronics written by Arthur Sherman and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 1987 with Computers categories.

Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

Thin Film Physics And Devices Fundamental Mechanism Materials And Applications For Thin Films

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Author : Jianguo Zhu
language : en
Publisher: World Scientific
Release Date : 2021-06-18

Thin Film Physics And Devices Fundamental Mechanism Materials And Applications For Thin Films written by Jianguo Zhu and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 2021-06-18 with Science categories.

Thin films have an extremely broad range of applications from electronics and optics to new materials and devices. Collaborative and multidisciplinary efforts from physicists, materials scientists, engineers and others have established and advanced a field with key pillars constituting (i) the synthesis and processing of thin films, (ii) the understanding of physical properties in relation to the nanometer scale, (iii) the design and fabrication of nano-devices or devices with thin film materials as building blocks, and (iv) the design and construction of novel tools for characterization of thin films.Against the backdrop of the increasingly interdisciplinary field, this book sets off to inform the basics of thin film physics and thin film devices. Readers are systematically introduced to the synthesis, processing and application of thin films; they will also study the formation of thin films, their structure and defects, and their various properties — mechanical, electrical, semiconducting, magnetic, and superconducting. With a primary focus on inorganic thin film materials, the book also ventures on organic materials such as self-assembled monolayers and Langmuir-Blodgett films.This book will be effective as a teaching or reference material in the various disciplines, ranging from Materials Science and Engineering, Electronic Science and Engineering, Electronic Materials and Components, Semiconductor Physics and Devices, to Applied Physics and more. The original Chinese publication has been instrumental in this purpose across many Chinese universities and colleges.