Materials Technology And Reliability For Advanced Interconnects And Low K Dielectrics 2003
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Materials Technology And Reliability For Advanced Interconnects And Low K Dielectrics 2003
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Author : Materials Research Society. Meeting
language : en
Publisher:
Release Date : 2003
Materials Technology And Reliability For Advanced Interconnects And Low K Dielectrics 2003 written by Materials Research Society. Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with Technology & Engineering categories.
Materials Technology And Reliability For Advanced Interconnects And Low K Dielectrics
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Author :
language : en
Publisher:
Release Date : 2001
Materials Technology And Reliability For Advanced Interconnects And Low K Dielectrics written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Dielectric films categories.
Materials Technology And Reliability For Advanced Interconnects And Low K Dielectrics
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Author :
language : en
Publisher:
Release Date : 2004
Materials Technology And Reliability For Advanced Interconnects And Low K Dielectrics written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Dielectric films categories.
Dielectrics For Nanosystems
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Author :
language : en
Publisher: The Electrochemical Society
Release Date : 2004
Dielectrics For Nanosystems written by and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Dielectrics categories.
Materials Processes And Reliability For Advanced Interconnects For Micro And Nanoelectronics 2009 Volume 1156
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Author : Martin Gall
language : en
Publisher:
Release Date : 2009-11-18
Materials Processes And Reliability For Advanced Interconnects For Micro And Nanoelectronics 2009 Volume 1156 written by Martin Gall and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009-11-18 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Handbook Of Semiconductor Manufacturing Technology
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Author : Yoshio Nishi
language : en
Publisher: CRC Press
Release Date : 2017-12-19
Handbook Of Semiconductor Manufacturing Technology written by Yoshio Nishi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Technology & Engineering categories.
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Copper Interconnect Technology
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Author : Tapan Gupta
language : en
Publisher: Springer Science & Business Media
Release Date : 2010-01-22
Copper Interconnect Technology written by Tapan Gupta and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-01-22 with Technology & Engineering categories.
Since overall circuit performance has depended primarily on transistor properties, previous efforts to enhance circuit and system speed were focused on transistors as well. During the last decade, however, the parasitic resistance, capacitance, and inductance associated with interconnections began to influence circuit performance and will be the primary factors in the evolution of nanoscale ULSI technology. Because metallic conductivity and resistance to electromigration of bulk copper (Cu) are better than aluminum, use of copper and low-k materials is now prevalent in the international microelectronics industry. As the feature size of the Cu-lines forming interconnects is scaled, resistivity of the lines increases. At the same time electromigration and stress-induced voids due to increased current density become significant reliability issues. Although copper/low-k technology has become fairly mature, there is no single book available on the promise and challenges of these next-generation technologies. In this book, a leader in the field describes advanced laser systems with lower radiation wavelengths, photolithography materials, and mathematical modeling approaches to address the challenges of Cu-interconnect technology.
Materials Technology And Reliability Of Low K Dielectrics And Copper Interconnects
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Author : Ting Y. Tsui
language : en
Publisher:
Release Date : 2006
Materials Technology And Reliability Of Low K Dielectrics And Copper Interconnects written by Ting Y. Tsui and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with Technology & Engineering categories.
Materials Technology And Reliability For Advanced Interconnects 2005 Volume 863
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Author : Paul R. Besser
language : en
Publisher:
Release Date : 2005-08-26
Materials Technology And Reliability For Advanced Interconnects 2005 Volume 863 written by Paul R. Besser and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-08-26 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This volume was first published in 2005.
Handbook Of Thin Film Deposition
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Author : Krishna Seshan
language : en
Publisher: William Andrew
Release Date : 2018-02-23
Handbook Of Thin Film Deposition written by Krishna Seshan and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-02-23 with Technology & Engineering categories.
Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability. - Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes - Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries - Features a new chapter discussing Gates Dielectrics