Microscopic Modeling Machine Learning Based Modeling And Optimal Operation Of Thermal And Plasma Atomic Layer Deposition
DOWNLOAD
Download Microscopic Modeling Machine Learning Based Modeling And Optimal Operation Of Thermal And Plasma Atomic Layer Deposition PDF/ePub or read online books in Mobi eBooks. Click Download or Read Online button to get Microscopic Modeling Machine Learning Based Modeling And Optimal Operation Of Thermal And Plasma Atomic Layer Deposition book now. This website allows unlimited access to, at the time of writing, more than 1.5 million titles, including hundreds of thousands of titles in various foreign languages. If the content not found or just blank you must refresh this page
Machine Learning Based Modelling In Atomic Layer Deposition Processes
DOWNLOAD
Author : Oluwatobi Adeleke
language : en
Publisher: CRC Press
Release Date : 2023-12-15
Machine Learning Based Modelling In Atomic Layer Deposition Processes written by Oluwatobi Adeleke and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2023-12-15 with Technology & Engineering categories.
While thin film technology has benefited greatly from artificial intelligence (AI) and machine learning (ML) techniques, there is still much to be learned from a full-scale exploration of these technologies in atomic layer deposition (ALD). This book provides in-depth information regarding the application of ML-based modeling techniques in thin film technology as a standalone approach and integrated with the classical simulation and modeling methods. It is the first of its kind to present detailed information regarding approaches in ML-based modeling, optimization, and prediction of the behaviors and characteristics of ALD for improved process quality control and discovery of new materials. As such, this book fills significant knowledge gaps in the existing resources as it provides extensive information on ML and its applications in film thin technology. Offers an in-depth overview of the fundamentals of thin film technology, state-of-the-art computational simulation approaches in ALD, ML techniques, algorithms, applications, and challenges. Establishes the need for and significance of ML applications in ALD while introducing integration approaches for ML techniques with computation simulation approaches. Explores the application of key techniques in ML, such as predictive analysis, classification techniques, feature engineering, image processing capability, and microstructural analysis of deep learning algorithms and generative model benefits in ALD. Helps readers gain a holistic understanding of the exciting applications of ML-based solutions to ALD problems and apply them to real-world issues. Aimed at materials scientists and engineers, this book fills significant knowledge gaps in existing resources as it provides extensive information on ML and its applications in film thin technology. It also opens space for future intensive research and intriguing opportunities for ML-enhanced ALD processes, which scale from academic to industrial applications.
Microscopic Modeling Machine Learning Based Modeling And Optimal Operation Of Thermal And Plasma Atomic Layer Deposition
DOWNLOAD
Author : Yangyao Ding
language : en
Publisher:
Release Date : 2021
Microscopic Modeling Machine Learning Based Modeling And Optimal Operation Of Thermal And Plasma Atomic Layer Deposition written by Yangyao Ding and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2021 with categories.
Atomic layer deposition (ALD) and plasma enhanced atomic layer deposition (PEALD) are the most widely utilized deposition techniques in the semiconductor industry due to their superior ability to produce highly conformal films and to deposit materials into high aspect-ratio geometric structures. Additionally, plasma enhanced ALD is able to further speed up the deposition process and to reduce the temperature requirement through the utilization of high energy particles. However, ALD and PEALD experiments remain expensive and time-consuming, and the existing first-principles based models have not yet been able to provide solutions to key process outputs that are computationally efficient, which is necessary for on-line optimization and real-time control. Motivated by the above considerations, this dissertation focuses on addressing these issues for both ALD and PEALD. First, for ALD, the development of key components of a comprehensive simulation framework is presented. The simulation framework integrates first-principles-based microscopic modeling, input/output modeling and optimal operation of thermal atomic layer deposition (ALD) of SiO2 thin-films using bis(tertiary-butylamino)silane (BTBAS) and ozone as precursors. Specifically, we initially utilize Density Functional Theory (DFT)-based calculations for the computation of the key thermodynamic and kinetic parameters, which are then used in the microscopic modeling of the ALD process. Subsequently, a detailed microscopic model is constructed, accounting for the microscopic lattice structure and atomic interactions, as well as multiple microscopic film growth processes including physisorption, abstraction and competing chemical reaction pathways. Kinetic Monte-Carlo (kMC) algorithms are utilized to obtain computationally efficient microscopic model solutions while preserving model fidelity. The obtained kMC simulation results are used to train Artificial Neural Network (ANN)-based data-driven models that capture the relationship between operating process parameters and time to ALD cycle completion. Specifically, a two-hidden-layer feed-forward ANN is constructed to find a feasible range of ALD operating conditions accounting for industrial considerations, and a Bayesian Regularized ANN is constructed to implement the cycle-to-cycle optimization of ALD cycle time. Extensive simulation results demonstrate the effectiveness of the proposed approaches. The kMC models successfully achieves a growth per cycle (GPC) of 1.8 A per cycle, which is in the range of reported experimental values. The ANN models accurately predict deposition time to steady-state from the given operating condition input, and the cycle time optimization using BRANN model reduces the conventional BTBAS cycle time by 60%. After developing an efficient simulation framework, a more detailed study on the optimal operation policy is performed using a multiscale data-driven model. The multiscale data-driven model captures the macroscopic process domain dynamics with a linear parameter varying model, and characterizes the microscopic domain film growth dynamics with a feed-forward artificial neural network (ANN) model. The multiscale data-driven model predicts the transient deposition rate from the following four key process operating parameters that can be manipulated, measured or estimated by process engineers: precursor feed flow rate, operating pressure, surface heating, and transient film coverage. Our results demonstrate that the multiscale data-driven model can efficiently characterize the transient input-output relationship for the SiO2 thermal ALD process using Bis(tertiary-butylamino)silane (BTBAS) as the Si precursor. The multiscale data-driven model successfully reduces the computational time from 0.6 - 1.2 hr for each time step, which is required for the first-principles based multiscale computational fluid dynamics (CFD) model, to less than 0.1 s, making its real-time usage feasible. The developed data-driven modeling methodology can be further generalized and used for other thermal ALD or similar deposition systems, which will greatly enhance the feasibility of industrial manufacturing processes. For PEALD, a similar methodology is adopted. First, an accurate, yet efficient kinetic Monte Carlo (kMC) model and an associated machine learning (ML) analysis are proposed to capture the surface deposition mechanism of the HfO2 thin-film PEALD using Tetrakis-dimethylamino-Hafnium (TDMAHf) and oxygen plasma. Density Functional Theory (DFT) calculations are performed to obtain the key kinetic parameters and the structural details. After the model is validated by experimental data, a database is generated to explore a variety of precursor partial pressure and substrate temperature combinations using the kMC algorithm. A feed-forward Bayesian regularized artificial neural network (BRANN) is then constructed to characterize the input-output relationship and to investigate the optimal operating condition. Next, based on an associated work on a comprehensive 3D multiscale computational fluid dynamics (CFD) model for the PEALD process, a 2D axisymmetric reduction of the previous 3D model of PEALD reactors with and without the showerhead design has been adopted to enhance the computational efficiency. Using the derived 2D CFD model, a data-driven model is constructed based on a recurrent neural network (RNN) for process characterization. The developed integrated data-driven model is demonstrated to accurately characterize the key aspects of the deposition process as well as the gas-phase transport profile while maintaining computational efficiency. The derived data-driven model is further validated with the results from a full 3D multiscale CFD model to evaluate model discrepancy. Using the data-driven model, an operational strategy database is generated, from which the optimal operating conditions can be determined for the deposition of HfO2 thin-film based on an elementary cost analysis.
Process Modelling And Simulation
DOWNLOAD
Author : César de Prada
language : en
Publisher: MDPI
Release Date : 2019-09-23
Process Modelling And Simulation written by César de Prada and has been published by MDPI this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019-09-23 with Technology & Engineering categories.
Since process models are nowadays ubiquitous in many applications, the challenges and alternatives related to their development, validation, and efficient use have become more apparent. In addition, the massive amounts of both offline and online data available today open the door for new applications and solutions. However, transforming data into useful models and information in the context of the process industry or of bio-systems requires specific approaches and considerations such as new modelling methodologies incorporating the complex, stochastic, hybrid and distributed nature of many processes in particular. The same can be said about the tools and software environments used to describe, code, and solve such models for their further exploitation. Going well beyond mere simulation tools, these advanced tools offer a software suite built around the models, facilitating tasks such as experiment design, parameter estimation, model initialization, validation, analysis, size reduction, discretization, optimization, distributed computation, co-simulation, etc. This Special Issue collects novel developments in these topics in order to address the challenges brought by the use of models in their different facets, and to reflect state of the art developments in methods, tools and industrial applications.
Atomic Layer Processing
DOWNLOAD
Author : Thorsten Lill
language : en
Publisher: John Wiley & Sons
Release Date : 2021-06-28
Atomic Layer Processing written by Thorsten Lill and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2021-06-28 with Technology & Engineering categories.
Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Additive Manufacturing Technologies
DOWNLOAD
Author : Ian Gibson
language : en
Publisher: Springer Nature
Release Date : 2020-11-10
Additive Manufacturing Technologies written by Ian Gibson and has been published by Springer Nature this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-11-10 with Technology & Engineering categories.
This textbook covers in detail digitally-driven methods for adding materials together to form parts. A conceptual overview of additive manufacturing is given, beginning with the fundamentals so that readers can get up to speed quickly. Well-established and emerging applications such as rapid prototyping, micro-scale manufacturing, medical applications, aerospace manufacturing, rapid tooling and direct digital manufacturing are also discussed. This book provides a comprehensive overview of additive manufacturing technologies as well as relevant supporting technologies such as software systems, vacuum casting, investment casting, plating, infiltration and other systems. Reflects recent developments and trends and adheres to the ASTM, SI and other standards; Includes chapters on topics that span the entire AM value chain, including process selection, software, post-processing, industrial drivers for AM, and more; Provides a broad range of technical questions to ensure comprehensive understanding of the concepts covered.
Scientific And Technical Aerospace Reports
DOWNLOAD
Author :
language : en
Publisher:
Release Date : 1995
Scientific And Technical Aerospace Reports written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995 with Aeronautics categories.
Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
The Engineering Index Annual
DOWNLOAD
Author :
language : en
Publisher:
Release Date : 1992
The Engineering Index Annual written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992 with Engineering categories.
Since its creation in 1884, Engineering Index has covered virtually every major engineering innovation from around the world. It serves as the historical record of virtually every major engineering innovation of the 20th century. Recent content is a vital resource for current awareness, new production information, technological forecasting and competitive intelligence. The world?s most comprehensive interdisciplinary engineering database, Engineering Index contains over 10.7 million records. Each year, over 500,000 new abstracts are added from over 5,000 scholarly journals, trade magazines, and conference proceedings. Coverage spans over 175 engineering disciplines from over 80 countries. Updated weekly.
Atomic Layer Deposition
DOWNLOAD
Author : Tommi Kääriäinen
language : en
Publisher: John Wiley & Sons
Release Date : 2013-05-28
Atomic Layer Deposition written by Tommi Kääriäinen and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-05-28 with Technology & Engineering categories.
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Evolution Of Thin Film Morphology
DOWNLOAD
Author : Matthew Pelliccione
language : en
Publisher: Springer Science & Business Media
Release Date : 2008-01-29
Evolution Of Thin Film Morphology written by Matthew Pelliccione and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-01-29 with Technology & Engineering categories.
The focus of this book is on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem. The book will enable readers themselves to set up a computational program to investigate specific topics of interest in thin film deposition. It will benefit those working in any discipline that requires an understanding of thin film growth processes.
International Aerospace Abstracts
DOWNLOAD
Author :
language : en
Publisher:
Release Date : 1997
International Aerospace Abstracts written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with Aeronautics categories.