Modeling Template Distortion During Step And Flash Imprint Lithography
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Modeling Template Distortion During Step And Flash Imprint Lithography
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Author : Scott D. Schuetter
language : en
Publisher:
Release Date : 2005
Modeling Template Distortion During Step And Flash Imprint Lithography written by Scott D. Schuetter and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with categories.
Emerging Lithographic Technologies
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Author :
language : en
Publisher:
Release Date : 2003
Emerging Lithographic Technologies written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with Lithography categories.
Emerging Lithographic Technologies Viii
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Author :
language : en
Publisher:
Release Date : 2004
Emerging Lithographic Technologies Viii written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Lithography, Electron beam categories.
Modeling Innovations In Euv And Nanoimprint Lithography
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Author : Yunfei Deng
language : en
Publisher:
Release Date : 2005
Modeling Innovations In Euv And Nanoimprint Lithography written by Yunfei Deng and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with categories.
Advances In Mechanisms Robotics And Design Education And Research
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Author : Vijay Kumar
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-04-17
Advances In Mechanisms Robotics And Design Education And Research written by Vijay Kumar and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-04-17 with Technology & Engineering categories.
This book contains papers on a wide range of topics in the area of kinematics, mechanisms, robotics, and design, addressing new research advances and innovations in design education. The content is divided into five main categories headed ‘Historical Perspectives’, ‘Kinematics and Mechanisms’, ‘Robotic Systems’, ‘Legged Locomotion’, and ‘Design Engineering Education’. Contributions take the form of survey articles, historical perspectives, commentaries on trends on education or research, original research contributions, and papers on design education. This volume celebrates the achievements of Professor Kenneth Waldron who has made innumerable and invaluable contributions to these fields in the last fifty years. His leadership and his pioneering work have influenced thousands of people in this discipline.
Microlithography
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Author : Bruce W. Smith
language : en
Publisher: CRC Press
Release Date : 2020-05-01
Microlithography written by Bruce W. Smith and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-05-01 with Technology & Engineering categories.
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Proceedings Of The 4th International Conference On The Industry 4 0 Model For Advanced Manufacturing
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Author : Laszlo Monostori
language : en
Publisher: Springer
Release Date : 2019-04-30
Proceedings Of The 4th International Conference On The Industry 4 0 Model For Advanced Manufacturing written by Laszlo Monostori and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019-04-30 with Technology & Engineering categories.
This book gathers the proceedings of the 4th International Conference on the Industry 4.0 Model for Advanced Manufacturing (AMP 2019), held in Belgrade, Serbia, on 3–6 June 2019. The event marks the latest in a series of high-level conferences that bring together experts from academia and industry to exchange knowledge, ideas, experiences, research findings, and information in the field of manufacturing. The book addresses a wide range of topics, including: design of smart and intelligent products, developments in CAD/CAM technologies, rapid prototyping and reverse engineering, multistage manufacturing processes, manufacturing automation in the Industry 4.0 model, cloud-based products, and cyber-physical and reconfigurable manufacturing systems. By providing updates on key issues and highlighting recent advances in manufacturing engineering and technologies, the book supports the transfer of vital knowledge to the next generation of academics and practitioners. Further, it will appealto anyone working or conducting research in this rapidly evolving field.
Comprehensive Nanoscience And Technology
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Author :
language : en
Publisher: Academic Press
Release Date : 2010-10-29
Comprehensive Nanoscience And Technology written by and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-10-29 with Science categories.
From the Introduction: Nanotechnology and its underpinning sciences are progressing with unprecedented rapidity. With technical advances in a variety of nanoscale fabrication and manipulation technologies, the whole topical area is maturing into a vibrant field that is generating new scientific research and a burgeoning range of commercial applications, with an annual market already at the trillion dollar threshold. The means of fabricating and controlling matter on the nanoscale afford striking and unprecedented opportunities to exploit a variety of exotic phenomena such as quantum, nanophotonic and nanoelectromechanical effects. Moreover, researchers are elucidating new perspectives on the electronic and optical properties of matter because of the way that nanoscale materials bridge the disparate theories describing molecules and bulk matter. Surface phenomena also gain a greatly increased significance; even the well-known link between chemical reactivity and surface-to-volume ratio becomes a major determinant of physical properties, when it operates over nanoscale dimensions. Against this background, this comprehensive work is designed to address the need for a dynamic, authoritative and readily accessible source of information, capturing the full breadth of the subject. Its six volumes, covering a broad spectrum of disciplines including material sciences, chemistry, physics and life sciences, have been written and edited by an outstanding team of international experts. Addressing an extensive, cross-disciplinary audience, each chapter aims to cover key developments in a scholarly, readable and critical style, providing an indispensible first point of entry to the literature for scientists and technologists from interdisciplinary fields. The work focuses on the major classes of nanomaterials in terms of their synthesis, structure and applications, reviewing nanomaterials and their respective technologies in well-structured and comprehensive articles with extensive cross-references. It has been a constant surprise and delight to have found, amongst the rapidly escalating number who work in nanoscience and technology, so many highly esteemed authors willing to contribute. Sharing our anticipation of a major addition to the literature, they have also captured the excitement of the field itself in each carefully crafted chapter. Along with our painstaking and meticulous volume editors, full credit for the success of this enterprise must go to these individuals, together with our thanks for (largely) adhering to the given deadlines. Lastly, we record our sincere thanks and appreciation for the skills and professionalism of the numerous Elsevier staff who have been involved in this project, notably Fiona Geraghty, Megan Palmer and Greg Harris, and especially Donna De Weerd-Wilson who has steered it through from its inception. We have greatly enjoyed working with them all, as we have with each other.
Alternative Lithography
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Author : Clivia M. Sotomayor Torres
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Alternative Lithography written by Clivia M. Sotomayor Torres and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Science categories.
Good old Gutenberg could not have imagined that his revolutionary printing concept which so greatly contributed to dissemination of knowledge and thus today 's wealth, would have been a source of inspiration five hundred years later. Now, it seems intuitive that a simple way to produce a large number of replicates is using a mold to emboss pattern you need, but at the nanoscale nothing is simple: the devil is in the detail. And this book is about the "devil". In the following 17 chapters, the authors-all of them well recognized and active actors in this emerging field-describe the state-of-the-art, today 's technological bottlenecks and the prospects for micro-contact printing and nanoimprint lithography. Many results of this book originate from projects funded by the European Com mission through its "Nanotechnology Information Devices" (NID) initiative. NID was launched with the objective to develop nanoscale devices for the time when the red brick scenario of the ITRS roadmap would be reached. It became soon clear however, that there was no point to investigate only alternative devices to CMOS, but what was really needed was an integrated approach that took into account more facets of this difficult undertaking. Technologically speaking , this meant to have a coherent strategy to develop novel devices, nanofabrication tools and circuit & system architectures at the same time.
Dissertation Abstracts International
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Author :
language : en
Publisher:
Release Date : 2004
Dissertation Abstracts International written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Dissertations, Academic categories.