Mos Interface Physics Process And Characterization
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Mos Interface Physics Process And Characterization
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Author : Shengkai Wang
language : en
Publisher: CRC Press
Release Date : 2021-10-05
Mos Interface Physics Process And Characterization written by Shengkai Wang and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2021-10-05 with Technology & Engineering categories.
The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit, and is therefore a fundamental building block of the information society. Indeed, high quality MOS structure is the key to achieving high performance devices and integrated circuits. Meanwhile, the control of interface physics, process and characterization methods determine the quality of MOS structure. This book tries to answer five key questions: Why are high-performance integrated circuits bonded together so closely with MOS structure? Which physical phenomena occur in MOS structure? How do these phenomena affect the performance of MOS structure? How can we observe and quantify these phenomena scientifically? How to control the above phenomena through process? Principles are explained based on common experimental phenomena, from sensibility to rationality, via abundant experimental examples focusing on MOS structure, including specific experimental steps with a strong level of operability. This book will be an essential reference for engineers in semiconductor related fields and academics and postgraduates within the field of microelectronics.
Physics And Chemistry Of Iii V Compound Semiconductor Interfaces
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Author : Carl Wilmsen
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-06-29
Physics And Chemistry Of Iii V Compound Semiconductor Interfaces written by Carl Wilmsen and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-06-29 with Science categories.
The application of the 111-V compound semiconductors to device fabrica tion has grown considerably in the last few years. This process has been stimulated, in part, by the advancement in the understanding of the interface physics and chemistry of the III-V's. The literature on this subject is spread over the last 15 years and appears in many journals and conference proceedings. Understanding this literature requires consider able effort by the seasoned researcher, and even more for those starting out in the field or by engineers and scientists who wish to apply this knowledge to the fabrication of devices. The purpose of this book is to bring together much of the fundamental and practical knowledge on the physics and chemistry of the 111-V compounds with metals and dielectrics. The authors of this book have endeavored to provide concise overviews of these areas with many tahles ancI grarhs whic. h c. omr>are and summarize the literature. In this way, the book serves as both an insightful treatise on III-V interfaces and a handy reference to the literature. The selection of authors was mandated by the desire to include both fundamental and practical approaches, covering device and material aspects of the interfaces. All of the authors are recognized experts on III-V interfaces and each has worked for many years in his subject area. This experience is projected in the breadth of understanding in each chapter.
Recent Advances In Nanophotonics
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Author : Mojtaba Kahrizi
language : en
Publisher: BoD – Books on Demand
Release Date : 2020-11-26
Recent Advances In Nanophotonics written by Mojtaba Kahrizi and has been published by BoD – Books on Demand this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-11-26 with Technology & Engineering categories.
This volume brings together several recent research articles in the field of nanophotonics. The editors have arranged the chapters in three main parts: quantum devices, photonic devices, and semiconductor devices. The chapters cover a wide variety of scopes in those areas including principles of plasmonic, SPR, LSPR and their applications, graphene-based nanophotonic devices, generation of entangled photon and quantum dots, perovskite solar cells, photo-detachment and photoionization of two-electrons systems, diffusion and intermixing of atoms in semiconductor crystals, lattice and molecular elastic and inelastic scattering including surface-enhanced Raman Scattering and their applications. It is our sincerest hope that science and engineering students and researchers could benefit from the new ideas and recent advances in the field that are covered in this book.
Postdoctoral Research Associateships
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Author :
language : en
Publisher:
Release Date : 1986
Postdoctoral Research Associateships written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1986 with Research categories.
Selected Semiconductor Research
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Author : Ming Fu Li
language : en
Publisher: World Scientific
Release Date : 2011-02-28
Selected Semiconductor Research written by Ming Fu Li and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-02-28 with Technology & Engineering categories.
This unique volume assembles the author's scientific and engineering achievements of the past three decades in the areas of (1) semiconductor physics and materials, including topics in deep level defects and band structures, (2) CMOS devices, including the topics in device technology, CMOS device reliability, and nano CMOS device quantum modeling, and (3) Analog Integrated circuit design. It reflects the scientific career of a semiconductor researcher educated in China during the 20th century. The book can be referenced by research scientists, engineers, and graduate students working in the areas of solid state and semiconductor physics and materials, electrical engineering and semiconductor devices, and chemical engineering./a
Physics And Technology Of High K Gate Dielectrics 4
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Author : Samares Kar
language : en
Publisher: The Electrochemical Society
Release Date : 2006
Physics And Technology Of High K Gate Dielectrics 4 written by Samares Kar and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with Science categories.
This issue covers, in detail, all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Physics And Technology Of High K Gate Dielectrics 6
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Author : S. Kar
language : en
Publisher: The Electrochemical Society
Release Date : 2008-10
Physics And Technology Of High K Gate Dielectrics 6 written by S. Kar and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-10 with Science categories.
The issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, novel and still higher permittivity dielectric materials, CMOS processing with high-K layers, metals for gate electrodes, interface issues, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Physics Of Semiconductor Devices
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Author : V. K. Jain
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-11-27
Physics Of Semiconductor Devices written by V. K. Jain and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-27 with Science categories.
The purpose of this workshop is to spread the vast amount of information available on semiconductor physics to every possible field throughout the scientific community. As a result, the latest findings, research and discoveries can be quickly disseminated. This workshop provides all participating research groups with an excellent platform for interaction and collaboration with other members of their respective scientific community. This workshop’s technical sessions include various current and significant topics for applications and scientific developments, including • Optoelectronics • VLSI & ULSI Technology • Photovoltaics • MEMS & Sensors • Device Modeling and Simulation • High Frequency/ Power Devices • Nanotechnology and Emerging Areas • Organic Electronics • Displays and Lighting Many eminent scientists from various national and international organizations are actively participating with their latest research works and also equally supporting this mega event by joining the various organizing committees.
Defects In Microelectronic Materials And Devices
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Author : Daniel M. Fleetwood
language : en
Publisher: CRC Press
Release Date : 2008-11-19
Defects In Microelectronic Materials And Devices written by Daniel M. Fleetwood and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-11-19 with Science categories.
Uncover the Defects that Compromise Performance and ReliabilityAs microelectronics features and devices become smaller and more complex, it is critical that engineers and technologists completely understand how components can be damaged during the increasingly complicated fabrication processes required to produce them.A comprehensive survey of defe
High Permittivity Gate Dielectric Materials
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Author : Samares Kar
language : en
Publisher: Springer
Release Date : 2016-08-23
High Permittivity Gate Dielectric Materials written by Samares Kar and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-08-23 with Technology & Engineering categories.
"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects." .