Optimization Of Resolution Enhancement Techniques In Optical Lithography
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Resolution Enhancement Techniques In Optical Lithography
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Author : Alfred Kwok-Kit Wong
language : en
Publisher: SPIE Press
Release Date : 2001
Resolution Enhancement Techniques In Optical Lithography written by Alfred Kwok-Kit Wong and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Science categories.
Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers
Optimization Of Resolution Enhancement Techniques In Optical Lithography
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Author :
language : en
Publisher:
Release Date : 2009
Optimization Of Resolution Enhancement Techniques In Optical Lithography written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with Imaging systems categories.
As todays' semiconductor fabrication industry tries to keep up with Moore's Law, which predicts the downscaling of integrated circuit size and the doubling of transistor counts every two years, resolution enhancement techniques (RET) play a much more important role than anytime in the past. Optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) are RETs used extensively in the semiconductor industry to improve the resolution and pattern fidelity of optical lithography. Preserving the fidelity of the circuit patterns is important for preserving the performance predicted in the design stage of the integrated circuit (IC). Typical circuit patterns exhibit regular geometries, such as lines, L-joint, U-joint and so on. These regular geometries reduce the resistances between nodes and simplify the process of routing. In the past decades, a variety of OPC, PSM and illumination design approaches have been proposed in the literature. In general, these approaches are divided into two subsets: rule-based and model-based approaches. This dissertation focuses on the study and development of model-based OPC, PSM and illumination optimization approaches for both coherent imaging systems and partially coherent imaging systems. For coherent imaging systems, we develop generalized gradient-based RET optimization methods to solve for the inverse lithography problem, where the search space is not constrained to a finite phase tessellation but where arbitrary search trajectories in the complex space are allowed. Subsequent mask quantization leads to efficient design of PSMs having an arbitrary number of discrete phases. In order to influence the solution patterns to have more desirable manufacturability properties, a wavelet regularization framework is introduced offering more localized flexibility than total-variation regularization methods traditionally employed in inverse problems. The algorithms provide highly effective four-phase PSMs capable of generating mask patterns with arbitrary Manhattan geometries. Furthermore, a double-patterning optimization method for generalized inverse lithography is developed where each patterning uses an optimized two-phase mask. These algorithms are computationally efficient, however, they focused on coherent illumination systems. Most practical illumination sources have a nonzero line width and their radiation is more generally described as partially coherent. Partially coherent illumination (PCI) is desired, since it can improve the theoretical resolution limit. PCI is thus introduced in practice through modified illumination sources having large coherent factors or through off-axis illumination. In partially coherent imaging, the mask is illuminated by light travelling in various directions. The source points giving rise to these incident rays are incoherent with one another, such that there is no interference that could lead to nonuniform light intensity impinging on the mask. The gradient-based inverse lithography optimization methods derived under the coherent illumination assumption fail to account for the nonlinearities of partially coherent illumination and thus perform poorly in the partially coherent scenario. For partially coherent imaging systems with inherent nonlinearities, the sum of coherent systems (SOCS) model and the average coherent approximation model are applied to develop effective and computationally efficient OPC optimization algorithms for inverse lithography. Wavelet regularization is added to the optimization framework to reduce the complexity of the optimized masks. Subsequently, a Singular Value Decomposition (SVD) model is used to develop computationally efficient PSM optimization algorithms for inverse lithography. A novel DCT post-processing is proposed to cut off the high frequency components in the optimized PSMs and keep the fabricating simplicity. Furthermore, a photoresist tone reversing technique is exploited in the design of PSMs to project extremely sparse patterns. As traditional RETs, the above mentioned gradient-based inverse OPC and PSM optimization methods fix the source thus limiting the degrees of freedom during the optimization of the mask patterns. To overcome this restriction, computationally efficient, pixel-based, simultaneous source mask optimization (SMO) methods for both OPC and PSM designs are developed in this dissertation. The synergy is exploited in the joint optimization of source and mask patterns. The resulting source and mask patterns fall well outside the realm of known design forms. In these SMO algorithms, the Fourier series expansion model is applied to approximate the partially coherent system as a sum of coherent systems. Cost sensitivity is used to drive the output pattern error in the descent direction. In order to influence the solution patterns to have more desirable manufacturability properties, topological constraints are added to the optimization framework. Several illustrative simulations are presented to demonstrate the effectiveness of the proposed algorithms. The above gradient-based inverse lithography optimization approaches are effective and computationally efficient under the thin-mask assumption, where the mask is considered as a 2-D object. As the critical dimension (CD) printed on the wafer shrinks into the subwavelength regime, the thick-mask effects become prevalent and thus these effects must be taken into account. Thus, OPC and PSM methods derived under the thin-mask assumption have the inherent limitations and perform poorly in the subwavelength scenario. In order to overcome this limitation, the final contribution of this dissertation focuses on developing OPC and PSM optimization methods based on the boundary layer (BL) model to take into account the thick-mask effects. Attributed to the nonlinear properties of the BL model, model-based forward lithography methods are exploited to obtain the optimized binary and phase-shifting masks. The advantages and limitations of the proposed algorithm are discussed and several illustrative simulations are presented.
China Semiconductor Technology International Conference 2010 Cstic 2010
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Author : Han-Ming Wu
language : en
Publisher: The Electrochemical Society
Release Date : 2010-03
China Semiconductor Technology International Conference 2010 Cstic 2010 written by Han-Ming Wu and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-03 with Science categories.
Our mission is to provide a forum for world experts to discuss technologies, address the growing needs associated with silicon technology, and exchange their discoveries and solutions for current issues of high interest. We encourage collaboration, open discussion, and critical reviews at this conference. Furthermore, we hope that this conference will also provide collaborative opportunities for those who are interested in the semiconductor industry in Asia, particularly in China.
Selected Papers On Resolution Enhancement Techniques In Optical Lithography
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Author : F. M. Schellenberg
language : en
Publisher: SPIE-International Society for Optical Engineering
Release Date : 2004
Selected Papers On Resolution Enhancement Techniques In Optical Lithography written by F. M. Schellenberg and has been published by SPIE-International Society for Optical Engineering this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Art categories.
Optical lithography for integrated circuits is undergoing a renaissance with the adoption of Resolution Enhancement Technology (RET). Some RET concepts have become routine in manufacturing. This volume gathers together seminal RET papers.
Computational Lithography
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Author : Xu Ma
language : en
Publisher: John Wiley & Sons
Release Date : 2011-01-06
Computational Lithography written by Xu Ma and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-01-06 with Technology & Engineering categories.
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.
Emlc 2005
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Author : Uwe Behringer
language : en
Publisher: Margret Schneider
Release Date : 2005
Emlc 2005 written by Uwe Behringer and has been published by Margret Schneider this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with categories.
Handbook Of Semiconductor Manufacturing Technology
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Author : Yoshio Nishi
language : en
Publisher: CRC Press
Release Date : 2017-12-19
Handbook Of Semiconductor Manufacturing Technology written by Yoshio Nishi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Technology & Engineering categories.
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Agentic Ai Powered Computational Lithography Advancing Mask Optimization Strategies For Next Generation Transistor Scaling
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Author : Botlagunta Preethish Nanan
language : en
Publisher: Caneda Global Journal Group
Release Date :
Agentic Ai Powered Computational Lithography Advancing Mask Optimization Strategies For Next Generation Transistor Scaling written by Botlagunta Preethish Nanan and has been published by Caneda Global Journal Group this book supported file pdf, txt, epub, kindle and other format this book has been release on with Computers categories.
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Semiconductor Technology Istc2001
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Author : Ming Yang
language : en
Publisher:
Release Date : 2001
Semiconductor Technology Istc2001 written by Ming Yang and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Semiconductors categories.
Design And Process Integration For Microelectronic Manufacturing
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Author :
language : en
Publisher:
Release Date : 2006
Design And Process Integration For Microelectronic Manufacturing written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with Integrated circuits categories.