Resolution Enhancement Techniques In Optical Lithography
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Resolution Enhancement Techniques In Optical Lithography
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Author : Alfred Kwok-Kit Wong
language : en
Publisher: SPIE Press
Release Date : 2001
Resolution Enhancement Techniques In Optical Lithography written by Alfred Kwok-Kit Wong and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Science categories.
Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers
Selected Papers On Resolution Enhancement Techniques In Optical Lithography
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Author : F. M. Schellenberg
language : en
Publisher: SPIE-International Society for Optical Engineering
Release Date : 2004
Selected Papers On Resolution Enhancement Techniques In Optical Lithography written by F. M. Schellenberg and has been published by SPIE-International Society for Optical Engineering this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Integrated circuits categories.
Optical lithography for integrated circuits is undergoing a renaissance with the adoption of Resolution Enhancement Technology (RET). Some RET concepts have become routine in manufacturing. This volume gathers together seminal RET papers.
Selected Papers On Resolution Enhancement Techniques In Optical Lithography
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Author : F. M. Schellenberg
language : en
Publisher:
Release Date : 2004-03-30
Selected Papers On Resolution Enhancement Techniques In Optical Lithography written by F. M. Schellenberg and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004-03-30 with categories.
Optical lithography for integrated circuits is undergoing a renaissance with the adoption of resolution enhancement techniques (RET). Some RET concepts have become routine in manufacturing, almost two decades after the original applications were conceived. This volume gathers together seminal RET papers. Since many of the first applications were announced by Japanese authors well before the material was presented in English, some of the original Japanese papers are included plus their English translations.
Resolution Enhancement Techniques In Optical Lithography
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Author : Alfred K. Wong
language : en
Publisher:
Release Date : 2001
Resolution Enhancement Techniques In Optical Lithography written by Alfred K. Wong and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with categories.
Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers.
Computational Lithography
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Author : Xu Ma
language : en
Publisher: John Wiley & Sons
Release Date : 2011-01-06
Computational Lithography written by Xu Ma and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-01-06 with Technology & Engineering categories.
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.
Field Guide To Optical Lithography
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Author : Chris A. Mack
language : en
Publisher: Society of Photo Optical
Release Date : 2006
Field Guide To Optical Lithography written by Chris A. Mack and has been published by Society of Photo Optical this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006 with Technology & Engineering categories.
This Field Guide distills the material written by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. It details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.
Physics Of Semiconductor Devices
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Author : Vikram Kumar
language : en
Publisher: Allied Publishers
Release Date : 2002
Physics Of Semiconductor Devices written by Vikram Kumar and has been published by Allied Publishers this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Semiconductors categories.
Fundamental Principles Of Optical Lithography
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Author : Chris Mack
language : en
Publisher: John Wiley & Sons
Release Date : 2011-08-10
Fundamental Principles Of Optical Lithography written by Chris Mack and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-08-10 with Technology & Engineering categories.
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Extending Moore S Law Through Advanced Semiconductor Design And Processing Techniques
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Author : Wynand Lambrechts
language : en
Publisher: CRC Press
Release Date : 2018-09-13
Extending Moore S Law Through Advanced Semiconductor Design And Processing Techniques written by Wynand Lambrechts and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-09-13 with Computers categories.
This book provides a methodological understanding of the theoretical and technical limitations to the longevity of Moore’s law. The book presents research on factors that have significant impact on the future of Moore’s law and those factors believed to sustain the trend of the last five decades. Research findings show that boundaries of Moore’s law primarily include physical restrictions of scaling electronic components to levels beyond that of ordinary manufacturing principles and approaching the bounds of physics. The research presented in this book provides essential background and knowledge to grasp the following principles: Traditional and modern photolithography, the primary limiting factor of Moore’s law Innovations in semiconductor manufacturing that makes current generation CMOS processing possible Multi-disciplinary technologies that could drive Moore's law forward significantly Design principles for microelectronic circuits and components that take advantage of technology miniaturization The semiconductor industry economic market trends and technical driving factors The complexity and cost associated with technology scaling have compelled researchers in the disciplines of engineering and physics to optimize previous generation nodes to improve system-on-chip performance. This is especially relevant to participate in the increased attractiveness of the Internet of Things (IoT). This book additionally provides scholarly and practical examples of principles in microelectronic circuit design and layout to mitigate technology limits of previous generation nodes. Readers are encouraged to intellectually apply the knowledge derived from this book to further research and innovation in prolonging Moore’s law and associated principles.
Design For Manufacturability And Statistical Design
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Author : Michael Orshansky
language : en
Publisher: Springer Science & Business Media
Release Date : 2007-10-28
Design For Manufacturability And Statistical Design written by Michael Orshansky and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007-10-28 with Technology & Engineering categories.
Design for Manufacturability and Statistical Design: A Comprehensive Approach presents a comprehensive overview of methods that need to be mastered in understanding state-of-the-art design for manufacturability and statistical design methodologies. Broadly, design for manufacturability is a set of techniques that attempt to fix the systematic sources of variability, such as those due to photolithography and CMP. Statistical design, on the other hand, deals with the random sources of variability. Both paradigms operate within a common framework, and their joint comprehensive treatment is one of the objectives of this book and an important differentation.