Performance Of Actinic Euvl Mask Imaging Using A Zoneplate Microscope
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Performance Of Actinic Euvl Mask Imaging Using A Zoneplate Microscope
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Author :
language : en
Publisher:
Release Date : 2007
Performance Of Actinic Euvl Mask Imaging Using A Zoneplate Microscope written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with categories.
The SEMATECH Berkeley Actinic Inspection Tool (AIT) is a dual-mode, scanning and imaging extreme-ultraviolet (EUV) microscope designed for pre-commercial EUV mask research. Dramatic improvements in image quality have been made by the replacement of several critical optical elements, and the introduction of scanning illumination to improve uniformity and contrast. We report high quality actinic EUV mask imaging with resolutions as low as 100-nm half-pitch, (20-nm, 5x wafer equivalent size), and an assessment of the imaging performance based on several metrics. Modulation transfer function (MTF) measurements show high contrast imaging for features sizes close to the diffraction-limit. An investigation of the illumination coherence shows that AIT imaging is much more coherent than previously anticipated, with [sigma] below 0.2. Flare measurements with several line-widths show a flare contribution on the order of 2-3% relative intensity in dark regions above the 1.3% absorber reflectivity on the test mask used for these experiments. Astigmatism coupled with focal plane tilt are the dominant aberrations we have observed. The AIT routinely records 250-350 high-quality images in numerous through-focus series per 8-hour shift. Typical exposure times range from 0.5 seconds during alignment, to approximately 20 seconds for high-resolution images.
X Ray Lasers 2010
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Author : Jongmin Lee
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-06-01
X Ray Lasers 2010 written by Jongmin Lee and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-06-01 with Science categories.
This book provides a thorough account of the current status of achievements made in the area of soft X-Ray laser source development and of the increasingly diverse applications being demonstrated using such radiation sources. There is significant effort worldwide to develop very bright, short duration radiation sources in the X-Ray spectral region – driven by the multitude of potential applications in all branches of science. This book contains updates on several different approaches for comparative purposes but concentrates on developments in the area of laser-produced plasmas, whereby transient population inversion and gain between ion states is pumped by optical lasers interacting with pre-formed plasmas. Topics covered will include Laser-driven XRLs, Collisional XRLs, Recombination XRLs, Transient Inversion Collisional XRLs, Optical Field Ionization XRLs, Alternative XRL, pumping schemes Theory and simulations of XRL gain media and beam properties High order harmonic sources of XUV radiation, Free-electron lasers and other accelerator based X-Ray sources, X-Ray Laser drives, X-Ray optics and instrumentation Spectroscopy, and other diagnostics of laser media Applications of XRLs.
Japanese Journal Of Applied Physics
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Author :
language : en
Publisher:
Release Date : 2007
Japanese Journal Of Applied Physics written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with Physics categories.
Emerging Lithographic Technologies
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Author :
language : en
Publisher:
Release Date : 2005
Emerging Lithographic Technologies written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Lithography categories.
Performance Of Actinic Euvl Mask Imaging Using A Zoneplatemicroscope
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Author :
language : en
Publisher:
Release Date : 2007
Performance Of Actinic Euvl Mask Imaging Using A Zoneplatemicroscope written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with categories.
The SEMATECH Berkeley Actinic Inspection Tool (AIT) is a dual-mode, scanning and imaging extreme-ultraviolet (EUV) microscope designed for pre-commercial EUV mask research. Dramatic improvements in image quality have been made by the replacement of several critical optical elements, and the introduction of scanning illumination to improve uniformity and contrast. We report high quality actinic EUV mask imaging with resolutions as low as 100-nm half-pitch, (20-nm, 5x wafer equivalent size), and an assessment of the imaging performance based on several metrics. Modulation transfer function (MTF) measurements show high contrast imaging for features sizes close to the diffraction-limit. An investigation of the illumination coherence shows that AIT imaging is much more coherent than previously anticipated, with [sigma] below 0.2. Flare measurements with several line-widths show a flare contribution on the order of 2-3% relative intensity in dark regions above the 1.3% absorber reflectivity on the test mask used for these experiments. Astigmatism coupled with focal plane tilt are the dominant aberrations we have observed. The AIT routinely records 250-350 high-quality images in numerous through-focus series per 8-hour shift. Typical exposure times range from 0.5 seconds during alignment, to approximately 20 seconds for high-resolution images.
Quantitative Evaluation Of Mask Phase Defects From Through Focus Euv Aerial Images
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Author :
language : en
Publisher:
Release Date : 2011
Quantitative Evaluation Of Mask Phase Defects From Through Focus Euv Aerial Images written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011 with categories.
Mask defects inspection and imaging is one of the most important issues for any pattern transfer lithography technology. This is especially true for EUV lithography where the wavelength-specific properties of masks and defects necessitate actinic inspection for a faithful prediction of defect printability and repair performance. In this paper we will present a technique to obtain a quantitative characterization of mask phase defects from EUV aerial images. We apply this technique to measure the aerial image phase of native defects on a blank mask, measured with the SEMATECH Berkeley Actinic Inspection Tool (AIT) an EUV zoneplate microscope that operates at Lawrence Berkeley National Laboratory. The measured phase is compared with predictions made from AFM top-surface measurements of those defects. While amplitude defects are usually easy to recognize and quantify with standard inspection techniques like scanning electron microscopy (SEM), defects or structures that have a phase component can be much more challenging to inspect. A phase defect can originate from the substrate or from any level of the multilayer. In both cases its effect on the reflected field is not directly related to the local topography of the mask surface, but depends on the deformation of the multilayer structure. Using the AIT, we have previously showed that EUV inspection provides a faithful and reliable way to predict the appearance of mask defect on the printed wafer; but to obtain a complete characterization of the defect we need to evaluate quantitatively its phase component. While aerial imaging doesn't provide a direct measurement of the phase of the object, this information is encoded in the through focus evolution of the image intensity distribution. Recently we developed a technique that allows us to extract the complex amplitude of EUV mask defects using two aerial images from different focal planes. The method for the phase reconstruction is derived from the Gerchberg-Saxton (GS) algorithm, an iterative method that can be used to reconstruct phase and amplitude of an object from the intensity distributions in the image and in the pupil plane. The GS algorithm is equivalent to a two-parameter optimization problem and it needs exactly two constraints to be solved, namely two intensity distributions in different focal planes. In some formulations, adding any other constraint would result in an ill posed problem. On the other hand, the solution's stability and convergence time can both be improved using more information. We modified our complex amplitude reconstruction algorithm to use an arbitrary number of through focus images and we compared its performance with the previous version in terms of convergence speed, robustness and accuracy. We have demonstrated the phase-reconstruction method on native, mask-blank phase defects and compared the results with phase-predictions made from AFM data collected before and after the multilayer deposition. The method and the current results could be extremely useful for improving the modeling and understanding of native phase defects, their detectability, and their printability.
Optical Modeling Of Fresnel Zoneplate Microscopes
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Author :
language : en
Publisher:
Release Date : 2011
Optical Modeling Of Fresnel Zoneplate Microscopes written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011 with categories.
Defect free masks remain one of the most significant challenges facing the commercialization of extreme ultraviolet (EUV) lithography. Progress on this front requires high-performance wavelength-specific metrology of EUV masks, including high-resolution and aerial-image microscopy performed near the 13.5 nm wavelength. Arguably the most cost-effective and rapid path to proliferating this capability is through the development of Fresnel zoneplate-based microscopes. Given the relative obscurity of such systems, however, modeling tools are not necessarily optimized to deal with them and their imaging properties are poorly understood. Here we present a modeling methodology to analyze zoneplate microscopes based on commercially available optical modeling software and use the technique to investigate the imaging performance of an off-axis EUV microscope design. The modeling predicts that superior performance can be achieved by tilting the zoneplate, making it perpendicular to the chief ray at the center of the field, while designing the zoneplate to explicitly work in that tilted plane. Although the examples presented here are in the realm of EUV mask inspection, the methods described and analysis results are broadly applicable to zoneplate microscopes in general, including full-field soft-x-ray microscopes rou tinely used in the synchrotron community.
Using Aberration Test Patterns To Optimize The Performance Of Euv Aerial Imaging Microscopes
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Author :
language : en
Publisher:
Release Date : 2009
Using Aberration Test Patterns To Optimize The Performance Of Euv Aerial Imaging Microscopes written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with categories.
The SEMATECH Berkeley Actinic Inspection Tool (AIT) is a prototype EUV-wavelength zoneplate microscope that provides high quality aerial image measurements of EUV reticles. To simplify and improve the alignment procedure we have created and tested arrays of aberration-sensitive patterns on EUV reticles and we have compared their images collected with the AIT to the expected shapes obtained by simulating the theoretical wavefront of the system. We obtained a consistent measure of coma and astigmatism in the center of the field of view using two different patterns, revealing a misalignment condition in the optics.
Actinic Mask Imaging
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Author :
language : en
Publisher:
Release Date : 2014
Actinic Mask Imaging written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014 with categories.
Carbon Contamination Of Extreme Ultraviolet Euv Mask And Its Effect On Imaging
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Author :
language : en
Publisher:
Release Date : 2009
Carbon Contamination Of Extreme Ultraviolet Euv Mask And Its Effect On Imaging written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with categories.
Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging is a significant issue due to lowered throughput and potential effects on imaging performance. In this work, a series of carbon contamination experiments were performed on a patterned EUV mask. Contaminated features were then inspected with a reticle scanning electron microscope (SEM) and printed with the SEMA TECH Berkeley Microfield-Exposure tool (MET) [1]. In addition, the mask was analyzed using the SEMA TECH Berkeley Actinic-Inspection tool (AIT) [2] to determine the effect of carbon contamination on the absorbing features and printing performance. To understand the contamination topography, simulations were performed based on calculated aerial images and resist parameters. With the knowledge of the topography, simulations were then used to predict the effect of other thicknesses of the contamination layer, as well as the imaging performance on printed features.