Plasma Processing
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Plasma Processing Of Nanomaterials
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Author : R. Mohan Sankaran
language : en
Publisher: CRC Press
Release Date : 2017-12-19
Plasma Processing Of Nanomaterials written by R. Mohan Sankaran and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Science categories.
We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.
Plasma Processing Of Semiconductors
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Author : P.F. Williams
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-11-11
Plasma Processing Of Semiconductors written by P.F. Williams and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-11 with Technology & Engineering categories.
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Plasma Processing Of Polymers
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Author : Ricardo d'Agostino
language : en
Publisher: Springer Science & Business Media
Release Date : 1997-11-30
Plasma Processing Of Polymers written by Ricardo d'Agostino and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997-11-30 with Technology & Engineering categories.
Proceedings of the NATO Advanced Study Institute on Plasma Treatments and Deposition of Polymers, Acquafredda di Maratea, Italy, May 19-June 2, 1996
Thermal Plasma Processing Of Ilmenite
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Author : Sneha Samal
language : en
Publisher: Springer
Release Date : 2017-11-28
Thermal Plasma Processing Of Ilmenite written by Sneha Samal and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-11-28 with Technology & Engineering categories.
This book shows how to prepare titania rich slag from metallized ilmenite using thermal plasma processing. The author reveals the development of a thermal plasma process alternative to the current used ones, which are highly energy costly. The appropriate design of the plasma reactor, which is crucial for achieving reduced energy consumption, is described in this book. The content can be of interest for industrial purposes.
Plasma And High Frequency Processes For Obtaining And Processing Materials In The Nuclear Fuel Cycle
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Author : I. N. Toumanov
language : en
Publisher: Nova Publishers
Release Date : 2003
Plasma And High Frequency Processes For Obtaining And Processing Materials In The Nuclear Fuel Cycle written by I. N. Toumanov and has been published by Nova Publishers this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with Business & Economics categories.
Plasma & High Frequency Processes for Obtaining & Processing Materials in the Nuclear Fuel Cycle
Plasma Processes And Polymers
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Author : Riccardo d'Agostino
language : en
Publisher: John Wiley & Sons
Release Date : 2006-03-06
Plasma Processes And Polymers written by Riccardo d'Agostino and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2006-03-06 with Science categories.
This volume compiles essential contributions to the most innovative fields of Plasma Processes and Polymers. High-quality contributions cover the fields of plasma deposition, plasma treatment of polymers and other organic compounds, plasma processes under partial vacuum and at atmospheric pressure, biomedical, textile, automotive, and optical applications as well as surface treatment of bulk materials, clusters, particles and powders. This unique collection of refereed papers is based on the best contributions presented at the 16th International Symposium on Plasma Chemistry in Taormina, Italy (ISPC-16, June 2003). A high class reference of relevance to a large audience in plasma community as well as in the area of its industrial applications.
Database Needs For Modeling And Simulation Of Plasma Processing
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Author : National Research Council
language : en
Publisher: National Academies Press
Release Date : 1996-10-21
Database Needs For Modeling And Simulation Of Plasma Processing written by National Research Council and has been published by National Academies Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-10-21 with Science categories.
In spite of its high cost and technical importance, plasma equipment is still largely designed empirically, with little help from computer simulation. Plasma process control is rudimentary. Optimization of plasma reactor operation, including adjustments to deal with increasingly stringent controls on plant emissions, is performed predominantly by trial and error. There is now a strong and growing economic incentive to improve on the traditional methods of plasma reactor and process design, optimization, and control. An obvious strategy for both chip manufacturers and plasma equipment suppliers is to employ large-scale modeling and simulation. The major roadblock to further development of this promising strategy is the lack of a database for the many physical and chemical processes that occur in the plasma. The data that are currently available are often scattered throughout the scientific literature, and assessments of their reliability are usually unavailable. Database Needs for Modeling and Simulation of Plasma Processing identifies strategies to add data to the existing database, to improve access to the database, and to assess the reliability of the available data. In addition to identifying the most important needs, this report assesses the experimental and theoretical/computational techniques that can be used, or must be developed, in order to begin to satisfy these needs.
Film Deposition By Plasma Techniques
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Author : Mitsuharu Konuma
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Film Deposition By Plasma Techniques written by Mitsuharu Konuma and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Science categories.
Properties of thin films depend strongly upon the deposition technique and conditions chosen. In order to achieve the desired film, optimum deposition conditions have to be found by carrying out experiments in a trial-and error fashion with varying parameters. The data obtained on one growth apparatus are often not transferable to another. This is especially true for film deposition processes using a cold plasma because of our poor under standing of the mechanisms. Relatively precise studies have been carried out on the role that physical effects play in film formation such as sputter deposition. However, there are many open questions regarding processes that involve chemical reactions, for example, reactive sputter deposition or plasma enhanced chemical vapor deposition. Much further research is re quired in order to understand the fundamental deposition processes. A sys tematic collection of basic data, some of which may be readily available in other branches of science, for example, reaction cross sections for gases with energetic electrons, is also required. The need for pfasma deposition techniques is felt strongly in industrial applications because these techniques are superior to traditional thin-film deposition techniques in many ways. In fact, plasma deposition techniques have developed rapidly in the semiconductor and electronics industries. Fields of possible application are still expanding. A reliable plasma reactor with an adequate in situ system for monitoring the deposition conditions and film properties must be developed to improve reproducibility and pro ductivity at the industrial level.
Atmospheric Pressure Plasma Treatment Of Polymers
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Author : Michael Thomas
language : en
Publisher: John Wiley & Sons
Release Date : 2013-06-19
Atmospheric Pressure Plasma Treatment Of Polymers written by Michael Thomas and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-06-19 with Technology & Engineering categories.
An indispensable volume detailing the current and potential applications of atmospheric pressure plasma treatment by experts practicing in fields around the world Polymers are used in a wide variety of industries to fabricate legions of products because of their many desirable traits. However, polymers in general (and polyolefins, in particular) are innately not very adhesionable because of the absence of polar or reactive groups on their surfaces and concomitant low surface energy. Surface treatment of polymers, however, is essential to impart reactive chemical groups on their surfaces to enhance their adhesion characteristic. Proper surface treatment can endow polymers with improved adhesion without affecting the bulk properties. A plethora of techniques (ranging from wet to dry, simple to sophisticated, vacuum to non-vacuum) for polymer surface modification have been documented in the literature but the Atmospheric Pressure Plasma (APP) treatment has attracted much attention because it offers many advantages vis-a-vis other techniques, namely uniform treatment, continuous operation, no need for vacuum, simplicity, low cost, no environmental or disposal concern, and applicability to large area samples. Although the emphasis in this book is on the utility of APP treatment for enhancement of polymer adhesion, APP is also applicable and effective to modulate many other surface properties of polymers: superhydrophilicity, superhydrophobicity, anti-fouling, anti-fogging, anti-icing, cell adhesion, biocompatibility, tribological behavior, etc. The key features of Atmospheric Pressure Plasma Treatment of Polymers: Address design and functions of various types of reactors Bring out current and potential applications of APP treatment Represent the cumulative wisdom of many key academic and industry researchers actively engaged in this key and enabling technology
Handbook Of Physical Vapor Deposition Pvd Processing
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Author : D. M. Mattox
language : en
Publisher: Cambridge University Press
Release Date : 2014-09-19
Handbook Of Physical Vapor Deposition Pvd Processing written by D. M. Mattox and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-09-19 with Technology & Engineering categories.
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.