Plasma Processing Of Semiconductors
DOWNLOAD
Download Plasma Processing Of Semiconductors PDF/ePub or read online books in Mobi eBooks. Click Download or Read Online button to get Plasma Processing Of Semiconductors book now. This website allows unlimited access to, at the time of writing, more than 1.5 million titles, including hundreds of thousands of titles in various foreign languages. If the content not found or just blank you must refresh this page
Plasma Processing Of Semiconductors
DOWNLOAD
Author : P.F. Williams
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-11-11
Plasma Processing Of Semiconductors written by P.F. Williams and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-11 with Technology & Engineering categories.
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Plasma Processes For Semiconductor Fabrication
DOWNLOAD
Author : W. N. G. Hitchon
language : en
Publisher: Cambridge University Press
Release Date : 1999-01-28
Plasma Processes For Semiconductor Fabrication written by W. N. G. Hitchon and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-01-28 with Technology & Engineering categories.
Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then covers plasma chemistry, addressing the effects of different chemicals on the features being etched. Having presented the relevant background material, he then describes in detail the modeling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and serves as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practicing engineers in the semiconductor industry.
Plasma Processing For Vlsi
DOWNLOAD
Author : Norman G. Einspruch
language : en
Publisher: Academic Press
Release Date : 2014-12-01
Plasma Processing For Vlsi written by Norman G. Einspruch and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-12-01 with Technology & Engineering categories.
VLSI Electronics: Microstructure Science, Volume 8: Plasma Processing for VLSI (Very Large Scale Integration) discusses the utilization of plasmas for general semiconductor processing. It also includes expositions on advanced deposition of materials for metallization, lithographic methods that use plasmas as exposure sources and for multiple resist patterning, and device structures made possible by anisotropic etching. This volume is divided into four sections. It begins with the history of plasma processing, a discussion of some of the early developments and trends for VLSI. The second section, Deposition, discusses deposition techniques for VLSI such as sputtering metals for metallization and contacts, plasma-enhanced chemical vapor deposition of metals and suicides, and plasma enhanced chemical vapor deposition of dielectrics. The part on Lithography presents the high-resolution trilayer resist system, pulsed x-ray sources for submicrometer x-ray lithography, and high-intensity deep-UV sources. The last part, Etching, provides methods in etching, like ion-beam etching using reactive gases, low-pressure reactive ion etching, and the uses of inert-gas ion milling. The theory and mechanisms of plasma etching are described and a number of new device structures made possible by anisotropic etching are enumerated as well. Scientists, engineers, researchers, device designers, and systems architects will find the book useful.
Handbook Of Advanced Plasma Processing Techniques
DOWNLOAD
Author : R.J. Shul
language : en
Publisher: Springer Science & Business Media
Release Date : 2011-06-28
Handbook Of Advanced Plasma Processing Techniques written by R.J. Shul and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-06-28 with Technology & Engineering categories.
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Proceedings Of The Tenth Symposium On Plasma Processing
DOWNLOAD
Author : Electrochemical Society. Dielectric Science and Technology Division
language : en
Publisher: The Electrochemical Society
Release Date : 1994
Proceedings Of The Tenth Symposium On Plasma Processing written by Electrochemical Society. Dielectric Science and Technology Division and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994 with Science categories.
Plasma Processing
DOWNLOAD
Author : R. G. Frieser
language : en
Publisher:
Release Date : 1981
Plasma Processing written by R. G. Frieser and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1981 with Plasma engineering categories.
Lecture Notes On Principles Of Plasma Processing
DOWNLOAD
Author : Francis F. Chen
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Lecture Notes On Principles Of Plasma Processing written by Francis F. Chen and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Science categories.
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Plasma Processing Xiii
DOWNLOAD
Author : G. S. Mathad
language : en
Publisher: The Electrochemical Society
Release Date : 2000
Plasma Processing Xiii written by G. S. Mathad and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Plasma etching categories.
Applications Of Plasma Processes To Vlsi Technology
DOWNLOAD
Author : Takuo Sugano
language : en
Publisher: Wiley-Interscience
Release Date : 1985-09-24
Applications Of Plasma Processes To Vlsi Technology written by Takuo Sugano and has been published by Wiley-Interscience this book supported file pdf, txt, epub, kindle and other format this book has been release on 1985-09-24 with Science categories.
Presents state-of-the-art research in microelectronic processing for very large scale integration. Emphasizing applications and techniques, this book provides considerable insight into Japan's technological effort in this important area of science. Focuses on research involving plasma deposition and dry etching. Considerable attention is devoted to MOS gate fabrication, the studies of the influence of process parameters on electrical properties, dry processing technologies, and the theory of plasma chemical reactions.
Proceedings Of The Eleventh International Symposium On Plasma Processing
DOWNLOAD
Author : Electrochemical Society. Dielectric Science and Technology Division
language : en
Publisher: The Electrochemical Society
Release Date : 1996
Proceedings Of The Eleventh International Symposium On Plasma Processing written by Electrochemical Society. Dielectric Science and Technology Division and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996 with Plasma etching categories.