Plasma Processing Of Semiconductors
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Plasma Processing Of Semiconductors
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Author : P.F. Williams
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-11-11
Plasma Processing Of Semiconductors written by P.F. Williams and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-11 with Technology & Engineering categories.
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Plasma Processes For Semiconductor Fabrication
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Author : W. N. G. Hitchon
language : en
Publisher: Cambridge University Press
Release Date : 1999-01-28
Plasma Processes For Semiconductor Fabrication written by W. N. G. Hitchon and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999-01-28 with Computers categories.
An up-to-date description of plasma etching and deposition in semiconductor fabrication.
Defect Recognition And Image Processing In Semiconductors 1997
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Author : J. Doneker
language : en
Publisher: Routledge
Release Date : 2017-11-22
Defect Recognition And Image Processing In Semiconductors 1997 written by J. Doneker and has been published by Routledge this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-11-22 with Science categories.
Defect Recognition and Image Processing in Semiconductors 1997 provides a valuable overview of current techniques used to assess, monitor, and characterize defects from the atomic scale to inhomogeneities in complete silicon wafers. This volume addresses advances in defect analyzing techniques and instrumentation and their application to substrates, epilayers, and devices. The book discusses the merits and limits of characterization techniques; standardization; correlations between defects and device performance, including degradation and failure analysis; and the adaptation and application of standard characterization techniques to new materials. It also examines the impressive advances made possible by the increase in the number of nanoscale scanning techniques now available. The book investigates defects in layers and devices, and examines the problems that have arisen in characterizing gallium nitride and silicon carbide.
Nato Advanced Study Institute On Plasma Processing Of Semiconductors
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Author :
language : en
Publisher:
Release Date : 1997
Nato Advanced Study Institute On Plasma Processing Of Semiconductors written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with categories.
Partial contents: Introduction to Plasma Etching; Plasma Chemistry, Basic Processes and PECVD; The Role of ions in Reactive Ion Etching with Low Density Plasmas; SiO2 Etching in High-Density Plasmas: Differences with Low-Density Plasmas; Introduction to Plasma Enhanced Chemical Vapor Deposition; Topography Evolution During Semiconductor Processing; Deposition of Amorphous Silicon; High Density Sources for Plasma Etching; Resonant Plasma Excitation by Electron Cyclotron Waves-Fundamentals and Applications; The Transition from Capacitive to Inductive to Wave Sustained Discharges.
Cmos Plasma And Process Damage
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Author : Kirk Prall
language : en
Publisher: Springer Nature
Release Date : 2025-05-16
Cmos Plasma And Process Damage written by Kirk Prall and has been published by Springer Nature this book supported file pdf, txt, epub, kindle and other format this book has been release on 2025-05-16 with Technology & Engineering categories.
This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems.
Handbook Of Semiconductor Technology Processing Of Semiconductors
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Author :
language : en
Publisher:
Release Date : 2000
Handbook Of Semiconductor Technology Processing Of Semiconductors written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Electronic structure categories.
Database Needs For Modeling And Simulation Of Plasma Processing
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Author : Panel on Database Needs in Plasma Processing
language : en
Publisher: National Academies Press
Release Date : 1996-11-04
Database Needs For Modeling And Simulation Of Plasma Processing written by Panel on Database Needs in Plasma Processing and has been published by National Academies Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-11-04 with Science categories.
In spite of its high cost and technical importance, plasma equipment is still largely designed empirically, with little help from computer simulation. Plasma process control is rudimentary. Optimization of plasma reactor operation, including adjustments to deal with increasingly stringent controls on plant emissions, is performed predominantly by trial and error. There is now a strong and growing economic incentive to improve on the traditional methods of plasma reactor and process design, optimization, and control. An obvious strategy for both chip manufacturers and plasma equipment suppliers is to employ large-scale modeling and simulation. The major roadblock to further development of this promising strategy is the lack of a database for the many physical and chemical processes that occur in the plasma. The data that are currently available are often scattered throughout the scientific literature, and assessments of their reliability are usually unavailable. "Database Needs for Modeling and Simulation of Plasma Processing" identifies strategies to add data to the existing database, to improve access to the database, and to assess the reliability of the available data. In addition to identifying the most important needs, this report assesses the experimental and theoretical/computational techniques that can be used, or must be developed, in order to begin to satisfy these needs.
Plasma Processing
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Author : R. G. Frieser
language : en
Publisher:
Release Date : 1981
Plasma Processing written by R. G. Frieser and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1981 with Plasma engineering categories.
Materials Science And Technology Processing Of Semiconductors
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Author : Kenneth A. Jackson
language : en
Publisher: Wiley-VCH
Release Date : 1996-09-17
Materials Science And Technology Processing Of Semiconductors written by Kenneth A. Jackson and has been published by Wiley-VCH this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-09-17 with Science categories.
This self-contained handbook deals with the enabling materials technology for the electronics industry. World renowned authors have contributed to this unique treatment of the processing of semiconductors and related technologies. Contents: Wilkes: Silicon Processing. Mullin: Compound Semiconductor Processing, Kuech/BleLagally/Tischler: Epitaxial Growth. Leuschner/Pawlowski: Photolithography. Griffin: Doping. Turner/Donohoe: Etching Processes in Semiconductor Manufacturing. Chang/Sze: Silicon Device Structures. Lam/Stanchina: Compound Semiconductor Device Structures. Kwong: Silicon Device Processing. Parsey, Jr: Compound Semiconductor Device Processing. Amey: Chip Carriers. Knausenberger/Turlik: Interconnection Systems.
Hydrogen In Semiconductors
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Author : M. Stutzmann
language : en
Publisher: Elsevier
Release Date : 2012-12-02
Hydrogen In Semiconductors written by M. Stutzmann and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Science categories.
Hydrogen on semiconductor surfaces has been an area of considerable activity over the last two decades. Structural, thermal, and dynamical properties of hydrogen chemisorbed on crystalline silicon and other semiconductors have been studied in great detail. These properties serve as a reference for related, but more complex systems such as hydrogen at multiple vacancies in crystalline semiconductors or at microvoids in amorphous samples. Interesting from a surface physics point of view is the fact that hydrogen as a monovalent element is an ideal terminator for unsaturated bonds on surfaces and therefore tends to have a large influence on surface reconstruction. A related phenomenon with large technological impact (for example in low cost solar cells) is the passivation of grain boundaries in microcrystalline semiconductors. Finally, hydrogenated semiconductor surfaces always appear as a boundary layer during low-energy hydrogenation of bulk semiconductors, so that a complete description of hydrogen uptake or desorption necessarily has to take these surfaces into account.This collection of invited and contributed papers has been carefully balanced to deal with amorphous and crystalline semiconductors and surfaces and presents basic and experimental work (basic and applied) as well as theory. The resulting volume presents a summary of the state-of-the-art in the field of hydrogen in semiconductors and will hopefully stimulate future work in this area.