Polycrystalline Thin Films Structure Texture Properties And Applications


Polycrystalline Thin Films Structure Texture Properties And Applications
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Polycrystalline Thin Films Structure Texture Properties And Applications


Polycrystalline Thin Films Structure Texture Properties And Applications
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Author :
language : en
Publisher:
Release Date : 1997

Polycrystalline Thin Films Structure Texture Properties And Applications written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with Thin films categories.




Polycrystalline Thin Films Volume 403


Polycrystalline Thin Films Volume 403
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Author : Harold J. Frost
language : en
Publisher: Materials Research Society
Release Date : 1996-09-20

Polycrystalline Thin Films Volume 403 written by Harold J. Frost and has been published by Materials Research Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-09-20 with Technology & Engineering categories.


This interdisciplinary book brings together researchers from a wide range of scientific fields to offer insights into the nature of polycrystalline thin films. These films have properties that are different from those of a bulk polycrystal and from those of a single crystal film. In particular, the volume focuses on film deposition and processing techniques which allow the fabrication of films with innovative microstructures and technologically relevant properties. The work presented ranges from theoretical studies to technological applications. Topics include: microstructural evolution; interfaces and mechanical properties; characterization of microstructure; hard and refractory films; polycrystalline silicon; electrical properties; optical properties; gas sensors; ferroelectric films; metallization; and magnetic and MEMS applications.



Polycrystalline Thin Films Structure Texture Properties Iii Volume 472


Polycrystalline Thin Films Structure Texture Properties Iii Volume 472
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Author : Brent L. Adams
language : en
Publisher: Materials Research Society
Release Date : 1997-11-25

Polycrystalline Thin Films Structure Texture Properties Iii Volume 472 written by Brent L. Adams and has been published by Materials Research Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997-11-25 with Technology & Engineering categories.


Thin films are used in virtually every manufacturing and technological area. A large fraction of these films are polycrystalline. Their uses range from critical components in the microelectronics industry, to hard coatings for wear resistance, corrosion resistance and thermal barriers, to magnetic, optical and medical applications. It is essential to the functional properties of these films that the microstructure, composition, architecture and stress state be produced with a high level of control which demands a detailed understanding of the mechanisms which are responsible for the formation of structure in polycrystalline thin films. This book focuses on thin polycrystalline metallic, ceramic and semiconducting films of thicknesses in the range of tens to thousands of nanometers. Topics range from fundamental to technological. Topics include: evolution of texture and microstructure; grain boundaries and interfaces; microstructure, stress and texture; characterization and representation; microstructure, texture and reliability; processing, characterization and application and polycrystalline Si and SiGe films.



Transparent Oxide Electronics


Transparent Oxide Electronics
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Author : Pedro Barquinha
language : en
Publisher: John Wiley & Sons
Release Date : 2012-04-09

Transparent Oxide Electronics written by Pedro Barquinha and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-04-09 with Technology & Engineering categories.


Transparent electronics is emerging as one of the most promising technologies for the next generation of electronic products, away from the traditional silicon technology. It is essential for touch display panels, solar cells, LEDs and antistatic coatings. The book describes the concept of transparent electronics, passive and active oxide semiconductors, multicomponent dielectrics and their importance for a new era of novel electronic materials and products. This is followed by a short history of transistors, and how oxides have revolutionized this field. It concludes with a glance at low-cost, disposable and lightweight devices for the next generation of ergonomic and functional discrete devices. Chapters cover: Properties and applications of n-type oxide semiconductors P-type conductors and semiconductors, including copper oxide and tin monoxide Low-temperature processed dielectrics n and p-type thin film transistors (TFTs) – structure, physics and brief history Paper electronics – Paper transistors, paper memories and paper batteries Applications of oxide TFTs – transparent circuits, active matrices for displays and biosensors Written by a team of renowned world experts, Transparent Oxide Electronics: From Materials to Devices gives an overview of the world of transparent electronics, and showcases groundbreaking work on paper transistors



Proceedings Of The Second Symposium On Thin Film Transistor Technologies


Proceedings Of The Second Symposium On Thin Film Transistor Technologies
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Author : Yue Kuo
language : en
Publisher: The Electrochemical Society
Release Date : 1995

Proceedings Of The Second Symposium On Thin Film Transistor Technologies written by Yue Kuo and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1995 with Technology & Engineering categories.




Handbook Of Physical Vapor Deposition Pvd Processing


Handbook Of Physical Vapor Deposition Pvd Processing
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Author : D. M. Mattox
language : en
Publisher: Cambridge University Press
Release Date : 2014-09-19

Handbook Of Physical Vapor Deposition Pvd Processing written by D. M. Mattox and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-09-19 with Technology & Engineering categories.


This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.



Nanostructured Films And Coatings


Nanostructured Films And Coatings
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Author : Gan-Moog Chow
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06

Nanostructured Films And Coatings written by Gan-Moog Chow and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.


Nanostructured films and coatings possess unique properties due to both size and interface effects. They find many applications in areas such as electronics, catalysis, protection, data storage, optics and sensors. The focus of the present book is on synthesis and processing; advanced characterization techniques; properties (including mechanical, chemical, electronic, thermal, catalytic, and magnetic); modelling of interlayer and intralayer interfaces; and applications.



Constrained Deformation Of Materials


Constrained Deformation Of Materials
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Author : Y.-L. Shen
language : en
Publisher: Springer Science & Business Media
Release Date : 2010-08-09

Constrained Deformation Of Materials written by Y.-L. Shen and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-08-09 with Technology & Engineering categories.


"Constrained Deformation of Materials: Devices, Heterogeneous Structures and Thermo-Mechanical Modeling" is an in-depth look at the mechanical analyses and modeling of advanced small-scale structures and heterogeneous material systems. Mechanical deformations in thin films and miniaturized materials, commonly found in microelectronic devices and packages, MEMS, nanostructures and composite and multi-phase materials, are heavily influenced by the external or internal physical confinement. A continuum mechanics-based approach is used, together with discussions on micro-mechanisms, to treat the subject in a systematic manner under the unified theme. Readers will find valuable information on the proper application of thermo-mechanics in numerical modeling as well as in the interpretation and prediction of physical material behavior, along with many case studies. Additionally, particular attention is paid to practical engineering relevance. Thus real-life reliability issues are discussed in detail to serve the needs of researchers and engineers alike.



Superplasticity And Grain Boundaries In Ultrafine Grained Materials


Superplasticity And Grain Boundaries In Ultrafine Grained Materials
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Author : Peter M. Burgess
language : en
Publisher: Elsevier
Release Date : 2011-05-31

Superplasticity And Grain Boundaries In Ultrafine Grained Materials written by Peter M. Burgess and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-05-31 with Science categories.


Superplasticity is a state in which solid crystalline materials, such as some fine-grained metals, are deformed well beyond their usual breaking point. The phenomenon is of importance in processes such as superplastic forming which allows the manufacture of complex, high-quality components in such areas as aerospace and biomedical engineering. Superplasticity and grain boundaries in ultrafine-grained materials discusses a number of problems associated with grain boundaries in metallic polycrystalline materials. The role of grain boundaries in processes such as grain boundary diffusion, relaxation and grain growth is investigated. The authors explore the formation and evolution of the microstructure, texture and ensembles of grain boundaries in materials produced by severe plastic deformation. Written by two leading experts in the field, Superplasticity and grain boundaries in ultrafine-grained materials significantly advances our understanding of this important phenomenon and will be an important reference work for metallurgists and those involved in superplastic forming processes. Discusses significant problems associated with grain boundaries in polycrystals incorporating structural superplasticity and grain boundary sliding Assesses the role of grain boundaries in processes such as grain boundary diffusion, relaxation and grain growth Explores the formation and evolution of the microstructure, texture and ensembles of grain boundaries in materials produced by severe plastic deformation



Interfacial Compatibility In Microelectronics


Interfacial Compatibility In Microelectronics
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Author : Tomi Laurila
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-01-10

Interfacial Compatibility In Microelectronics written by Tomi Laurila and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-01-10 with Technology & Engineering categories.


Interfaces between dissimilar materials are met everywhere in microelectronics and microsystems. In order to ensure faultless operation of these highly sophisticated structures, it is mandatory to have fundamental understanding of materials and their interactions in the system. In this difficult task, the “traditional” method of trial and error is not feasible anymore; it takes too much time and repeated efforts. In Interfacial Compatibility in Microelectronics, an alternative approach is introduced. In this revised method four fundamental disciplines are combined: i) thermodynamics of materials ii) reaction kinetics iii) theory of microstructures and iv) stress and strain analysis. The advantages of the method are illustrated in Interfacial Compatibility in Microelectronics which includes: solutions to several common reliability issues in microsystem technology, methods to understand and predict failure mechanisms at interfaces between dissimilar materials and an approach to DFR based on deep understanding in materials science, rather than on the use of mechanistic tools, such as FMEA. Interfacial Compatibility in Microelectronics provides a clear and methodical resource for graduates and postgraduates alike.