Polysilicon Thin Films And Interfaces

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Polysilicon Thin Films And Interfaces Volume 182

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Author : Theodore Kamins
language : en
Publisher:
Release Date : 1990-11-15

Polysilicon Thin Films And Interfaces Volume 182 written by Theodore Kamins and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1990-11-15 with Technology & Engineering categories.

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Polysilicon Films And Interfaces Volume 106

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Author : C. Y. Wong
language : en
Publisher:
Release Date : 1988-07-27

Polysilicon Films And Interfaces Volume 106 written by C. Y. Wong and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1988-07-27 with Technology & Engineering categories.

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Thin Films And Interfaces Ii

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Author : John E. E. Baglin
language : en
Publisher: North Holland
Release Date : 1984

Thin Films And Interfaces Ii written by John E. E. Baglin and has been published by North Holland this book supported file pdf, txt, epub, kindle and other format this book has been release on 1984 with Technology & Engineering categories.

Proceedings Of The Symposium On Thin Film Interfaces And Interactions

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Author : John E. E. Baglin
language : en
Publisher:
Release Date : 1980

Proceedings Of The Symposium On Thin Film Interfaces And Interactions written by John E. E. Baglin and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1980 with Thin films categories.

Polycrystalline Semiconductors

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Author : Hans J. Möller
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06

Polycrystalline Semiconductors written by Hans J. Möller and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.

This book summarizes the most recent aspects of polycrystalline semiconductors as presented at the conference Polycrystalline Semiconductors - Grain Boundaries and Interfaces. It contains 12 review articles on selected topics written by experts in their fields and 41 complementary contributed papers. The structure, chemistry and physics of grain boundaries and other interfaces are experimentally and theoretically studied. Aspects of the technologically important polycrystalline silicon are discussed in detail. Also covered are other polycrystalline semiconductors, germanium and compound semiconductors, that are currently of interest in fundamental research and in the technology of solar cells and thin film devices. Anyone interested in polycrystalline semiconductors will be able to use this comprehensive collection to advantage. It also suggests directions for new research and development.

The Physics And Chemistry Of Sio2 And The Si Sio2 Interface 3 1996

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Author : Hisham Z. Massoud
language : en
Publisher:
Release Date : 1996

The Physics And Chemistry Of Sio2 And The Si Sio2 Interface 3 1996 written by Hisham Z. Massoud and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996 with Science categories.

Characterization In Silicon Processing

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Author : Yale Strausser
language : en
Publisher: Elsevier
Release Date : 2013-10-22

Characterization In Silicon Processing written by Yale Strausser and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-10-22 with Technology & Engineering categories.

This volume is devoted to the consideration of the use use of surface, thin film and interface characterization tools in support of silicon-based semiconductor processing. The approach taken is to consider each of the types of films used in silicon devices individually in its own chapter and to discuss typical problems seen throughout that films' history, including characterization tools which are most effectively used to clarifying and solving those problems.

Proceedings Of The Symposium On Thin Film Transistor Technologies

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Author :
language : en
Publisher:
Release Date : 1992

Proceedings Of The Symposium On Thin Film Transistor Technologies written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992 with Thin film transistors categories.

Proceedings Of The Third Symposium On Thin Film Transistor Technologies

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Author : Yue Kuo
language : en
Publisher: The Electrochemical Society
Release Date : 1997

Proceedings Of The Third Symposium On Thin Film Transistor Technologies written by Yue Kuo and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with Technology & Engineering categories.

Polycrystalline Silicon For Integrated Circuit Applications

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Author : Ted Kamins
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06

Polycrystalline Silicon For Integrated Circuit Applications written by Ted Kamins and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.

Recent years have seen silicon integrated circuits enter into an increasing number of technical and consumer applications, until they now affect everyday life, as well as technical areas. Polycrystalline silicon has been an important component of silicon technology for nearly two decades, being used first in MOS integrated circuits and now becoming pervasive in bipolar circuits, as well. During this time a great deal of informa tion has been published about polysilicon. A wide range of deposition conditions has been used to form films exhibiting markedly different properties. Seemingly contradictory results can often be explained by considering the details of the structure formed. This monograph is an attempt to synthesize much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon so that it can be used most effectively to enhance device and integrated-circuit perfor mance. As device performance improves, however, some of the proper ties of polysilicon are beginning to restrict the overall performance of integrated circuits, and the basic limitations of the properties of polysili con also need to be better understood to minimize potential degradation of circuit behavior.