Solid State Devices 1984
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Solid State Devices 1984
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Author : Jean-Pierre Noblanc
language : en
Publisher:
Release Date : 1985
Solid State Devices 1984 written by Jean-Pierre Noblanc and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1985 with Semiconductors categories.
Silicon Solid State Devices And Radiation Detection
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Author : Claude Leroy
language : en
Publisher: World Scientific
Release Date : 2012
Silicon Solid State Devices And Radiation Detection written by Claude Leroy and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012 with Science categories.
This book addresses the fundamental principles of interaction between radiation and matter, the principles of working and the operation of particle detectors based on silicon solid state devices. It covers a broad scope with respect to the fields of application of radiation detectors based on silicon solid state devices from low to high energy physics experiments including in outer space and in the medical environment. This book covers state-of-the-art detection techniques in the use of radiation detectors based on silicon solid state devices and their readout electronics, including the latest developments on pixelated silicon radiation detector and their application. The content and coverage of the book benefit from the extensive experience of the two authors who have made significant contributions as researchers as well as in teaching physics students in various universities.
Amorphous Semiconductor
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Author : Yoshihiro Hamakawa
language : en
Publisher: Elsevier Science & Technology
Release Date : 1984
Amorphous Semiconductor written by Yoshihiro Hamakawa and has been published by Elsevier Science & Technology this book supported file pdf, txt, epub, kindle and other format this book has been release on 1984 with Amorphous semiconductors categories.
Compound And Josephson High Speed Devices
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Author : Takahiko Misugi
language : en
Publisher: Springer Science & Business Media
Release Date : 1993-07-31
Compound And Josephson High Speed Devices written by Takahiko Misugi and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 1993-07-31 with Science categories.
This book reviews both the fundamentals and recent advances in analog and digital integrated circuits in compound semiconductors and Josephson junctions. Researchers, engineers, and graduate students who are unfamiliar with the field will find here a complete, unified account of the physical principles, concepts, and design techniques of these devices.
Semiconductor Lithography
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Author : Wayne M. Moreau
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Semiconductor Lithography written by Wayne M. Moreau and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
Semiconductor lithography is one of the key steps in the manufacturing of integrated silicon-based circuits. In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography. Lithography, as adopted by the semiconductor industry, is the process of drawing or printing the pattern of an integrated circuit in a resist material. The pattern is formed and overlayed to a previous circuit layer as many as 30 times in the manufacture of logic and memory devices. With the resist pattern acting as a mask, a permanent device structure is formed by subtractive (removal) etching or by additive deposition of metals or insulators. Each process step in lithography uses inorganic or organic materials to physically transform semiconductors of silicon, insulators of oxides, nitrides, and organic polymers, and metals, into useful electronic devices. All forms of electromagnetic radiation are used in the processing. Lithography is a mUltidisciplinary science of materials, processes, and equipment, interacting to produce three-dimensional structures. Many aspects of chemistry, electrical engineering, materials science, and physics are involved. The purpose of this book is to bring together the work of many scientists and engineers over the last 10 years and focus upon the basic resist materials, the lithographic processes, and the fundamental principles behind each lithographic process.
Microlithography Fundamentals In Semiconductor Devices And Fabrication Technology
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Author : Saburo Nonogaki
language : en
Publisher: CRC Press
Release Date : 1998-06-25
Microlithography Fundamentals In Semiconductor Devices And Fabrication Technology written by Saburo Nonogaki and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998-06-25 with Technology & Engineering categories.
"Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."
Energy Research Abstracts
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Author :
language : en
Publisher:
Release Date : 1986
Energy Research Abstracts written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1986 with Power resources categories.
Silicon Molecular Beam Epitaxy
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Author : E. Kasper
language : en
Publisher: CRC Press
Release Date : 2018-05-04
Silicon Molecular Beam Epitaxy written by E. Kasper and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-05-04 with Technology & Engineering categories.
This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.
Low Temperature Epitaxial Growth Of Semiconductors
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Author : Hariu Takahashi
language : en
Publisher: World Scientific
Release Date : 1990-12-31
Low Temperature Epitaxial Growth Of Semiconductors written by Hariu Takahashi and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 1990-12-31 with Science categories.
Low temperature processes for semiconductors have been recently under intensive development to fabricate controlled device structures with minute dimensions in order to achieve the highest device performance and new device functions as well as high integration density. Comprising reviews by experts long involved in the respective pioneering work, this volume makes a useful contribution toward maturing the process of low temperature epitaxy as a whole.
Handbook Of Thin Film Deposition Techniques Principles Methods Equipment And Applications Second Editon
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Author : Krishna Seshan
language : en
Publisher: CRC Press
Release Date : 2002-02-01
Handbook Of Thin Film Deposition Techniques Principles Methods Equipment And Applications Second Editon written by Krishna Seshan and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002-02-01 with Science categories.
The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec
