Submicron Lithography

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The Physics Of Submicron Lithography

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Author : Kamil A. Valiev
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06

The Physics Of Submicron Lithography written by Kamil A. Valiev and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Science categories.

This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.

Submicron Lithography

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Author : Phillip D. Blais
language : en
Publisher:
Release Date : 1982

Submicron Lithography written by Phillip D. Blais and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1982 with Integrated circuits categories.

Submicron Lithography

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Author :
language : en
Publisher:
Release Date : 1982

Submicron Lithography written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1982 with Photolithography categories.

The Physics Of Submicron Lithography

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Author : K.A. Valiev
language : it
Publisher:
Release Date :

The Physics Of Submicron Lithography written by K.A. Valiev and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on with categories.

Lithography For Submicron Structures

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Author :
language : en
Publisher:
Release Date : 1990

Lithography For Submicron Structures written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1990 with Ion beam lithography categories.

Patterning Of Material Layers In Submicron Region

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Author : U. S. Tandon
language : en
Publisher: John Wiley & Sons
Release Date : 1993

Patterning Of Material Layers In Submicron Region written by U. S. Tandon and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 1993 with Technology & Engineering categories.

It invokes the interests of the reader into the wonderland of nanominiaturization for industrial, biological and fundamental applications. Its contents portray the advent and relevance of submicron structures and proffer a perception of materials, modules and schemes for preparing them.

The Physics Of Submicron Semiconductor Devices

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Author : Harold L. Grubin
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-11-11

The Physics Of Submicron Semiconductor Devices written by Harold L. Grubin and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-11 with Technology & Engineering categories.

The papers contained in the volume represent lectures delivered as a 1983 NATO ASI, held at Urbino, Italy. The lecture series was designed to identify the key submicron and ultrasubmicron device physics, transport, materials and contact issues. Nonequilibrium transport, quantum transport, interfacial and size constraints issues were also highlighted. The ASI was supported by NATO and the European Research Office. H. L. Grubin D. K. Ferry C. Jacoboni v CONTENTS MODELLING OF SUB-MICRON DEVICES.................. .......... 1 E. Constant BOLTZMANN TRANSPORT EQUATION... ... ...... .................... 33 K. Hess TRANSPORT AND MATERIAL CONSIDERATIONS FOR SUBMICRON DEVICES. . .. . . . . .. . . . .. . .. . .... ... .. . . . .. . . . .. . . . . . . . . . . 45 H. L. Grubin EPITAXIAL GROWTH FOR SUB MICRON STRUCTURES.................. 179 C. E. C. Wood INSULATOR/SEMICONDUCTOR INTERFACES.......................... 195 C. W. Wilms en THEORY OF THE ELECTRONIC STRUCTURE OF SEMICONDUCTOR SURFACES AND INTERFACES......................................... 223 C. Calandra DEEP LEVELS AT COMPOUND-SEMICONDUCTOR INTERFACES........... 253 W. Monch ENSEMBLE MONTE CARLO TECHNIqUES............................. 289 C. Jacoboni NOISE AND DIFFUSION IN SUBMICRON STRUCTURES................. 323 L. Reggiani SUPERLATTICES. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 361 . . . . . . . . . . . . K. Hess SUBMICRON LITHOGRAPHY 373 C. D. W. Wilkinson and S. P. Beaumont QUANTUM EFFECTS IN DEVICE STRUCTURES DUE TO SUBMICRON CONFINEMENT IN ONE DIMENSION.... ....................... 401 B. D. McCombe vii viii CONTENTS PHYSICS OF HETEROSTRUCTURES AND HETEROSTRUCTURE DEVICES..... 445 P. J. Price CORRELATION EFFECTS IN SHORT TIME, NONS TAT I ONARY TRANSPORT. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 477 . . . . . . . . . . . . J. J. Niez DEVICE-DEVICE INTERACTIONS............ ...................... 503 D. K. Ferry QUANTUM TRANSPORT AND THE WIGNER FUNCTION................... 521 G. J. Iafrate FAR INFRARED MEASUREMENTS OF VELOCITY OVERSHOOT AND HOT ELECTRON DYNAMICS IN SEMICONDUCTOR DEVICES............. 577 S. J. Allen, Jr.

The Application Of Submicron Lithography Defect Simulation To Ic Yield Improvement

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Author : Linda Milor
language : en
Publisher:
Release Date : 1999

The Application Of Submicron Lithography Defect Simulation To Ic Yield Improvement written by Linda Milor and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Fault location (Engineering) categories.

Abstract: "Yield improvement efforts traditionally involve extensive experimental work aimed at diagnosis of defect sources. This paper proposes a methodology for supplementing such experimental work with defect simulation. In particular, it is shown that lithography defect simulation can provide insight into defect mechanisms that cause major distortions in photoresist profiles. The nature of the distorted patterns can assist us in yield improvement efforts, since by comparing simulation results with the observed photoresist profiles on wafers, defect sources may be identified. Several lithography defect diagnosis examples are presented to demonstrate the approach."

On Submicron Electron Beam Lithography Using Field Emission Cathodes

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Author :
language : en
Publisher:
Release Date : 1980

On Submicron Electron Beam Lithography Using Field Emission Cathodes written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1980 with categories.

On Submicron Electron Beam Lithography Using Field Emission Cathodes

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Author : Göran Stille
language : en
Publisher:
Release Date : 1980

On Submicron Electron Beam Lithography Using Field Emission Cathodes written by Göran Stille and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1980 with categories.