Lithography For Submicron Structures

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Lithography For Submicron Structures

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Author :
language : en
Publisher:
Release Date : 1990

Lithography For Submicron Structures written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1990 with Ion beam lithography categories.

Fabrication Of Micron And Submicron Compound Structures By Combining Interference Lithography And Nanoimprint Lithography

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Author : 邱信傑
language : en
Publisher:
Release Date : 2009

Fabrication Of Micron And Submicron Compound Structures By Combining Interference Lithography And Nanoimprint Lithography written by 邱信傑 and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with categories.

Patterning Of Material Layers In Submicron Region

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Author : U. S. Tandon
language : en
Publisher: John Wiley & Sons
Release Date : 1993

Patterning Of Material Layers In Submicron Region written by U. S. Tandon and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 1993 with Technology & Engineering categories.

It invokes the interests of the reader into the wonderland of nanominiaturization for industrial, biological and fundamental applications. Its contents portray the advent and relevance of submicron structures and proffer a perception of materials, modules and schemes for preparing them.

The Physics Of Submicron Lithography

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Author : Kamil A. Valiev
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06

The Physics Of Submicron Lithography written by Kamil A. Valiev and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Science categories.

This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.

The Physics Of Submicron Semiconductor Devices

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Author : Harold L. Grubin
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-11-11

The Physics Of Submicron Semiconductor Devices written by Harold L. Grubin and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-11 with Technology & Engineering categories.

The papers contained in the volume represent lectures delivered as a 1983 NATO ASI, held at Urbino, Italy. The lecture series was designed to identify the key submicron and ultrasubmicron device physics, transport, materials and contact issues. Nonequilibrium transport, quantum transport, interfacial and size constraints issues were also highlighted. The ASI was supported by NATO and the European Research Office. H. L. Grubin D. K. Ferry C. Jacoboni v CONTENTS MODELLING OF SUB-MICRON DEVICES.................. .......... 1 E. Constant BOLTZMANN TRANSPORT EQUATION... ... ...... .................... 33 K. Hess TRANSPORT AND MATERIAL CONSIDERATIONS FOR SUBMICRON DEVICES. . .. . . . . .. . . . .. . .. . .... ... .. . . . .. . . . .. . . . . . . . . . . 45 H. L. Grubin EPITAXIAL GROWTH FOR SUB MICRON STRUCTURES.................. 179 C. E. C. Wood INSULATOR/SEMICONDUCTOR INTERFACES.......................... 195 C. W. Wilms en THEORY OF THE ELECTRONIC STRUCTURE OF SEMICONDUCTOR SURFACES AND INTERFACES......................................... 223 C. Calandra DEEP LEVELS AT COMPOUND-SEMICONDUCTOR INTERFACES........... 253 W. Monch ENSEMBLE MONTE CARLO TECHNIqUES............................. 289 C. Jacoboni NOISE AND DIFFUSION IN SUBMICRON STRUCTURES................. 323 L. Reggiani SUPERLATTICES. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 361 . . . . . . . . . . . . K. Hess SUBMICRON LITHOGRAPHY 373 C. D. W. Wilkinson and S. P. Beaumont QUANTUM EFFECTS IN DEVICE STRUCTURES DUE TO SUBMICRON CONFINEMENT IN ONE DIMENSION.... ....................... 401 B. D. McCombe vii viii CONTENTS PHYSICS OF HETEROSTRUCTURES AND HETEROSTRUCTURE DEVICES..... 445 P. J. Price CORRELATION EFFECTS IN SHORT TIME, NONS TAT I ONARY TRANSPORT. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 477 . . . . . . . . . . . . J. J. Niez DEVICE-DEVICE INTERACTIONS............ ...................... 503 D. K. Ferry QUANTUM TRANSPORT AND THE WIGNER FUNCTION................... 521 G. J. Iafrate FAR INFRARED MEASUREMENTS OF VELOCITY OVERSHOOT AND HOT ELECTRON DYNAMICS IN SEMICONDUCTOR DEVICES............. 577 S. J. Allen, Jr.

Submicron Lithography

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Author :
language : en
Publisher:
Release Date : 1982

Submicron Lithography written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1982 with Photolithography categories.

Physics And Technology Of Submicron Structures

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Author : Helmut Heinrich
language : en
Publisher: Springer
Release Date : 1988

Physics And Technology Of Submicron Structures written by Helmut Heinrich and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 1988 with Science categories.

This volume presents a discussion of the latest results in the physics of low-dimensional structures. At the winter school major breakthroughs were reported, and some of the excitement of the participants is reflected in the contributions. The topics treated range from the fabrication of microstructures and the physical background of future semiconductor devices to vertical transport in nanostructures, universal conductance fluctuations, and the transition from two-dimensional to one-dimensional conduction in semiconductor structures.

Submicron Lithography I

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Author :
language : en
Publisher:
Release Date : 1982

Submicron Lithography I written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1982 with Photolithography categories.

The Modification Of Polymer Surfaces And The Fabrication Of Submicron Scale Functionalized Structures By Deep Uv And Electron Beam Lithography

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Author :
language : en
Publisher:
Release Date : 1993

The Modification Of Polymer Surfaces And The Fabrication Of Submicron Scale Functionalized Structures By Deep Uv And Electron Beam Lithography written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1993 with categories.

We present a general technique to modify polymer surfaces using N- hydroxysuccinimide (NHS) funtionalized perfluorophenyl azides (PFPAs). Thin polystyrene films are spin-coated with a solution containing the NHS PFPA ester and are either UV photolyzed with a dosage of 10 mJ sq cm or exposed with a 15 kV electron beam with a dosage between 1 and 75 micrometers / sq cm. The NHS active ester groups become covalently attached to the polymer via photogenerated or electron beam generated, highly reactive nitrene intermediates derived from the PFPA. Using this technique we demonstrate that well-defined surface regions can be funtionalized with a minimum observable feature size of 0.5 micrometers and 0.2 micrometers for UV and electron-beam exposure, respectively. Through reaction of the functionalized surfaces with primary amine-containing reagents, we have installed biological molecules on the polymer and have measured the activity of an immobilized enzyme.

Scaling Behavior In Interference Lithography

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Author :
language : en
Publisher:
Release Date : 1998

Scaling Behavior In Interference Lithography written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998 with categories.

Interference lithography is an emerging, technology that provides a means for achieving high resolution over large exposure areas (approximately 1 m2) with virtually unlimited depth of field. One- and two-dimensional arrays of deep submicron structures can be created using near i-line wavelengths and standard resist processing. In this paper, we report on recent advances in the development of this technology, focusing, in particular, on how exposure latitude and resist profile scale with interference period We present structure width vs dose curves for periods ranging from 200 nm to 1 um, demonstrating that deep submicron structures can be generated with exposure latitudes exceeding 30%. Our experimental results are compared to simulations based on PROLITIV2.