Templated Self Assembly Of Siloxane Block Copolymers For Nanofabrication
DOWNLOAD
Download Templated Self Assembly Of Siloxane Block Copolymers For Nanofabrication PDF/ePub or read online books in Mobi eBooks. Click Download or Read Online button to get Templated Self Assembly Of Siloxane Block Copolymers For Nanofabrication book now. This website allows unlimited access to, at the time of writing, more than 1.5 million titles, including hundreds of thousands of titles in various foreign languages. If the content not found or just blank you must refresh this page
Templated Self Assembly Of Siloxane Block Copolymers For Nanofabrication
DOWNLOAD
Author : Yeon Sik Jung
language : en
Publisher:
Release Date : 2009
Templated Self Assembly Of Siloxane Block Copolymers For Nanofabrication written by Yeon Sik Jung and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with categories.
(Cont.) For example, arrays of parallel lines were used as a mask to pattern poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) conducting polymer thin films. The resulting PEDOT:PSS nanowire array was used as an chemiresistive-type ethanol-sensing device. Metallic films such as Ti, Pt, Ta, W, and magnetic Co and Ni were structured using a pattern-reversal process. Coercivity enhancements were observed for the fabricated ferromagnetic nanostructures such as wires, rings, and antidots. These functional nanostructures can be utilized for a variety of devices such as high-density and high performance sensor or memory devices.
Templated Self Assembly For Complex Pattern Fabrication
DOWNLOAD
Author : Jae-Byum Chang
language : en
Publisher:
Release Date : 2014
Templated Self Assembly For Complex Pattern Fabrication written by Jae-Byum Chang and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014 with categories.
The long-term goal of my Ph.D. study has been controlling the self-assembly of various materials using state-of-the-art nanofabrication techniques. Electron-beam lithography has been used for decades to generate nanoscale patterns, but its throughput is not high enough for fabricating sub-10-nm patterns over a large area. Templated block copolymer(BCP) self assembly is attractive for fabricating few-nanometer-scale structures at high throughput. On an unpattermed substrate, block copolymer self-assembly generates dense arrays of lines or dots without long-range order. Fortunately, physical features defined by electron lithography can guide the self-assembly of block copolymer. In our previous work, the orientation of cylindrical phase block copolymer was controlled simply by changing the distance between physical features, and resulting polymer patterns were analyzed by an image analysis program. Here, we first demonstrated high throughput sub-10-nm feature sizes by applying the same approach to a cylindrical morphology 16kg/mol PS-PDMS block copolymer. The half-pitch of the PDMS cylinders of this block copolymer film is 9 nm, so sub-10-nm structures can be fabricated. We also applied the similar approach to a triblock terpolymer to achieve dot patterns with square symmetry. To achieve a more complex pattern, electron-beam induced cross-linking of a block copolymer and second solvent-annealing process was used. By using this method, a line-dot hybrid pattern was achieved. Despite that the block copolymer self-assembly area had been heavily studied, researchers had yet to ascertain how to design nanostructures to achieve a desired target pattern using block copolymers. To address this problem, we developed a modular method that greatly simplifies the nanostructure design, and using this method, we achieved a circuit-like block-copolymer pattern over a large area. The key innovation is the use of a binary set of tiles that can be used to very simply cover the desired patterning area. Despite the simplicity of the approach, by exploiting neighbor-neighbor interactions of the tiles, a complex final pattern can be formed. The vision is thus one of programmability of patterning by using a simple instruction set. This development will thus be of interest to scientists and engineers across many fields involving self-assembly, including biomolecule, quantum-dot or nanowire positioning; algorithmic self-assembly; and integrated-circuit development. We applied this concept - controlling the assembly of materials using nanostructures - to a different material, protein. Single-molecule protein arrays are useful tools for studying biological phenomena at the single-molecule level, but have been developed only for a few specific proteins using the streptavidin-biotin complex as a linker. By using carefully designed gold nanopatterns and cysteine-gold interaction, we developed a process to make single-molecule protein arrays that can be used for patterning a broad range of proteins.
Self Assembly Of Block Copolymers For Nanopatterning
DOWNLOAD
Author : Nathanael Lap-Yan Wu
language : en
Publisher:
Release Date : 2014
Self Assembly Of Block Copolymers For Nanopatterning written by Nathanael Lap-Yan Wu and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014 with Block copolymers categories.
The impressive developments in the semiconductor industry over the past five decades have largely been dependent on the ability to continually reduce the dimensions of devices on a chip. However, as critical dimension requirements for these devices approach the limits of photolithography, new fabrication strategies must be introduced for these remarkable advances to continue. One technology listed by the International Technology Roadmap for Semiconductors as a candidate for next-generation nanostructure fabrication is the directed self-assembly of block copolymers. Block copolymers have received significant attention of late for their ability to template large regular arrays of nanostructures with dimensions ranging from 10 to 50 nm. The production of denser sub-10 nm nanostructures is also possible by reducing the size of these polymers, but a reduction of the polymer size also compromises the quality of nanostructures, making small polymers extremely difficult to use. In this thesis, two different patterning approaches are introduced to push the nanostructure density limits possible for a given polymer. In the first, a novel patterning approach involving thin films of bilayer block copolymer domains is used to effectively double the nanostructure density patterned by a given polymer. The technique is successfully applied to different types and sizes of polymer, and can also form highly controlled arrays of patterns with the help of surface topography. By varying different process parameters during the self-assembly or subsequent plasma steps, the dimensions of these density-doubled patterns may be finely-tuned to the desired width and pitch. The surface coverage of these density-doubled nanostructures is also maximized through adjusting the film thickness and parameters in the self-assembly process. Besides using bilayer films, dense arrays of nanostructures may also be patterned using a multi-step patterning approach. In this approach, multiple layers of block copolymer films are subsequently deposited onto the substrate to template nanostructures. Because nanostructures from previous layers contribute to the surface topography, they influence the self-assembly of successive layers and more dense and complex patterns may be produced as a result.
Characterization Of Nano Arrays Fabricated Via Self Assembly Of Block Copolymers
DOWNLOAD
Author : Marianna Shnayderman
language : en
Publisher:
Release Date : 2004
Characterization Of Nano Arrays Fabricated Via Self Assembly Of Block Copolymers written by Marianna Shnayderman and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with categories.
This research focused on methods for regulating arrangement of self-assembled block copolymers by understanding fabrication conditions and their effects on the polymers on flat and patterned substrates. Block copolymer self-assembly is a simple and low cost process for creating lithographic masks with features under 100nm in dimension. These patterns can be transferred to more permanent materials for applications in electronics, magnetic devices, as well as sensors and filters. Polystyrene-poly(ferrocenyldimethylsilane) block copolymer thin films were characterized in terms of their spin curves, PSF spherical domain cross sectional area distributions, and correlation distances. Optimal fabrication conditions were selected from studying polymer behavior on flat substrates and then used for templated substrate studies. Substrates that were templated with grooves produced quantized numbers of rows of spherical domains ranging from 4 to 7. Behavior in these grooves was characterized in terms of groove width constraints, cross sectional domain area distributions, and row ordering. For all templated arrays, the lengths of ordered regions were more than 2 fold higher than the diameters of ordered regions of arrays on flat substrates. The characterization accomplished in this work will be used to compare block copolymers with similar volume fractions of the blocks that allow sphere microdomain formation but of different molecular weights. The ultimate goals are to establish how the molecular weight of this block copolymer affects its self assembly on templated and on flat substrates and to use this factor as well as fabrication conditions and template geometries to engineer arrays with desirable properties.
Templated Self Assembly Of Novel Block Copolymers
DOWNLOAD
Author : Li-Chen Cheng (Ph.D.)
language : en
Publisher:
Release Date : 2019
Templated Self Assembly Of Novel Block Copolymers written by Li-Chen Cheng (Ph.D.) and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019 with categories.
Self-assembly of block copolymers (BCPs) is emerging as a promising route for numerous technological applications to fabricate a variety of nanoscopic structures. The resulting feature sizes range from a few to several hundred nanometers, and are readily tunable by varying the molecular weights of block copolymers. Directed self-assembly of block copolymer is an effective way to pattern periodic arrays of features with long-range order, to generate complex patterns, and to multiplicatively increase the pattern density and resolution that are far beyond the limit of conventional lithography. Despite of the significant progress in the area of directed self-assembly in recent years, critical research problems regarding the dimension scalability toward sub-10-nm regime and large feature sizes on hundreds of nanometers scale as well as the capability of generating complex device-oriented patterns remain challenging. In this thesis, BCP systems, including high-v BCPs that are capable of self-assembling into extreme small and large feature sizes as well as those with more complex block architectures, are identified and studied in order to understand how those materials may be processed and directed selfassembly to bridge the patterning size spectrum between nano- and micro-fabrication. Another focus is placed on the scientific exploration of directed self-assembly of triblock terpolymers and the investigation on the mechanisms that regulate the scaling and geometry of self-assembled patterns. A comprehensive understanding about self-assembly of BCP thin films will enable developing device-oriented geometries, manipulating BCPs phase behavior, and incorporating new functional materials for a wider range of applications. In the meanwhile, optimizing the processing condition of self-assembly of various BCPs is essential to confirm viability of the directed self-assembly of block copolymers process in manufacturing.
Chemical And Physical Methods Of The Templated Direction Of Block Copolymers
DOWNLOAD
Author : Samuel Mospens Nicaise
language : en
Publisher:
Release Date : 2012
Chemical And Physical Methods Of The Templated Direction Of Block Copolymers written by Samuel Mospens Nicaise and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012 with categories.
This thesis discusses the investigation of various aspects of templated self-assembly of block copolymer (BCP) thin films for nanofeature fabrication. Two chapters outline the research of a combined physical and chemical templating method with two BCPs. The method was not effective in templating poly(styrene-block-methyl methacrylate) (PS-b-PMMA) BCP because of limited template wettability. The method effectively templated poly(octofluro pentamethacrylate-block-hydroxystyrene) (OFPMA-b-HSM) BCP to fabricate orthogonally-directed lamellar microdomains and nanohole-mesh arrays. Chapter 4 discusses the achievement of a mean overlay accuracy of 52 nm and 0' for two electron-beam-based lithographic features as a result of an investigated overlay process. Lastly, the thesis reports the fabrication of a wide-range of nanofeatures - from two-dimensional and three dimensional nanoholes arrays to elliptical and cylindrical meshes - by the sacrificial-post templating method with poly(styreneblock- dimethylsiloxane) (PS-b-PDMS) BCP.
Selective Directed Self Assembly Of Coexisting Morphologies Using Block Copolymer Blends
DOWNLOAD
Author :
language : en
Publisher:
Release Date : 2016
Selective Directed Self Assembly Of Coexisting Morphologies Using Block Copolymer Blends written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016 with categories.
Directed self-assembly (DSA) of block copolymers is an emergent technique for nano-lithography, but is limited in the range of structures possible in a single fabrication step. We expand on traditional DSA chemical patterning. Moreover, a blend of lamellar- and cylinder-forming block copolymers assembles on specially designed surface chemical line gratings, leading to the simultaneous formation of coexisting ordered morphologies in separate areas of the substrate. The competing energetics of polymer chain distortions and chemical mismatch with the substrate grating bias the system towards either line/space or dot array patterns, depending on the pitch and linewidth of the prepattern. This contrasts with typical DSA, wherein assembly of a single-component block copolymer on chemical templates generates patterns of either lines/spaces (lamellar) or hexagonal dot arrays (cylinders). In our approach, the chemical template encodes desired local spatial arrangements of coexisting design motifs, self-assembled from a single, sophisticated resist.
Directed Self Assembly Of Nanostructured Block Copolymer Thin Films Via Dynamic Thermal Annealing
DOWNLOAD
Author : Monali N. Basutkar
language : en
Publisher:
Release Date : 2018
Directed Self Assembly Of Nanostructured Block Copolymer Thin Films Via Dynamic Thermal Annealing written by Monali N. Basutkar and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018 with Block copolymers categories.
The aggressive miniaturization of nanoelectronic devices poses a pressing challenge in using conventional patterning technologies that are fast approaching their intrinsic resolution limits. Molecular self-assembling block copolymers (BCPs) are promising candidates for integrating and extending the current photolithographic constraints, facilitating the fabrication of next-generation nanotemplating materials via directed self-assembly. The current work focuses on the development of viable dynamic self-assembly strategies for achieving highly ordered versatile BCP nanostructures with precise feature size control and registration, as well as provides insights into the fundamentals of BCP thin film self-assembly driven by dynamic annealing fields A continuous template-free method toward rapid fabrication (2-4 minutes) of highly ordered through-thickness vertical lamellar polystyrene-block-poly(methyl methacrylate) l-PS-b-PMMA) microdomains in l-BCP films on quartz (silicon oxide) substrate was developed. A molecular relaxation induced vertical l-BCP ordering occurs under a transient macroscopic vertical strain field, imposed by a high film thermal expansion rate under sharp thermal gradient cold zone annealing (CZA-S). The high thermal gradient had to be selectively tuned with the CZA-S sweep rates for controlling the polymer chain relaxation dynamics for vertical order. Comparable conventional static thermal annealing of identical l-BCP films using vacuum oven failed to induce the desired nanostructure. Morphology evolution tracked in real time along the CZA-S thermal gradient profile using in situ grazing incidence small angle x-ray scattering (GISAXS) demonstrated four regimes of ordering: microphase separation from a quenched-disordered state (Regime 1), initial formation of vertical lamellae due to the sharp thermal gradient imposed on the l-BCP film (Regime 2), polygrain structure resulting from the broad [del] T region around Tmax (Regime 3), and an ultimate highly vertically ordered l-BCP morphology due to grain coarsening on the cooling edge (Regime 4). A detailed examination of the influence of CZA process parameters such as temperature gradient field strength ([del] T) of the thermal annealing profile, sweep velocity (v) and the corresponding annealing time (t) on the mechanism and dynamics of l-BCP ordering was performed. The complex interplay between thermodynamic equilibrium, surface and interfacial energies, confinement effects and BCP ordering kinetics was also investigated to determine the effect of BCP film attributes on morphological development. By tuning the CZA-S process dynamics with the l-BCP relaxation timescales, this process created vertical l-BCP nanodomains with controlled feature sizes via molecular weight control. Besides regulating the out-of-plane nanostructure orientation, the alignment of BCP microdomains in-plane was locally tuned by biasing the BCP assembly energetics using an edge-templating strategy. The relaxation of residual stresses and minimization of chain distortion energy penalties along the film boundary were the factors governing the edge-templating mechanism that spontaneously aligns the BCP microdomains orthogonal to the film-discontinuity. Both, kinetic and thermodynamic factors were associated with the boundary-propagation effect. This research demonstrates a new paradigm for advancement of BCP nanotemplating and nanolithography applications due to its potential to fabricate user-defined hierarchical micro-nanopatterns.
Springer Handbook Of Nanotechnology
DOWNLOAD
Author : Bharat Bhushan
language : en
Publisher: Springer
Release Date : 2017-11-05
Springer Handbook Of Nanotechnology written by Bharat Bhushan and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-11-05 with Technology & Engineering categories.
This comprehensive handbook has become the definitive reference work in the field of nanoscience and nanotechnology, and this 4th edition incorporates a number of recent new developments. It integrates nanofabrication, nanomaterials, nanodevices, nanomechanics, nanotribology, materials science, and reliability engineering knowledge in just one volume. Furthermore, it discusses various nanostructures; micro/nanofabrication; micro/nanodevices and biomicro/nanodevices, as well as scanning probe microscopy; nanotribology and nanomechanics; molecularly thick films; industrial applications and nanodevice reliability; societal, environmental, health and safety issues; and nanotechnology education. In this new edition, written by an international team of over 140 distinguished experts and put together by an experienced editor with a comprehensive understanding of the field, almost all the chapters are either new or substantially revised and expanded, with new topics of interest added. It is an essential resource for anyone working in the rapidly evolving field of key technology, including mechanical and electrical engineers, materials scientists, physicists, and chemists.
Directed Self Assembly Of Block Copolymer Films On Chemically Nanopatterned Surfaces
DOWNLOAD
Author : Adam M. Welander
language : en
Publisher:
Release Date : 2009
Directed Self Assembly Of Block Copolymer Films On Chemically Nanopatterned Surfaces written by Adam M. Welander and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with categories.