Templated Self Assembly Of Novel Block Copolymers
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Templated Self Assembly Of Novel Block Copolymers
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Author : Li-Chen Cheng (Ph.D.)
language : en
Publisher:
Release Date : 2019
Templated Self Assembly Of Novel Block Copolymers written by Li-Chen Cheng (Ph.D.) and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019 with categories.
Self-assembly of block copolymers (BCPs) is emerging as a promising route for numerous technological applications to fabricate a variety of nanoscopic structures. The resulting feature sizes range from a few to several hundred nanometers, and are readily tunable by varying the molecular weights of block copolymers. Directed self-assembly of block copolymer is an effective way to pattern periodic arrays of features with long-range order, to generate complex patterns, and to multiplicatively increase the pattern density and resolution that are far beyond the limit of conventional lithography. Despite of the significant progress in the area of directed self-assembly in recent years, critical research problems regarding the dimension scalability toward sub-10-nm regime and large feature sizes on hundreds of nanometers scale as well as the capability of generating complex device-oriented patterns remain challenging. In this thesis, BCP systems, including high-v BCPs that are capable of self-assembling into extreme small and large feature sizes as well as those with more complex block architectures, are identified and studied in order to understand how those materials may be processed and directed selfassembly to bridge the patterning size spectrum between nano- and micro-fabrication. Another focus is placed on the scientific exploration of directed self-assembly of triblock terpolymers and the investigation on the mechanisms that regulate the scaling and geometry of self-assembled patterns. A comprehensive understanding about self-assembly of BCP thin films will enable developing device-oriented geometries, manipulating BCPs phase behavior, and incorporating new functional materials for a wider range of applications. In the meanwhile, optimizing the processing condition of self-assembly of various BCPs is essential to confirm viability of the directed self-assembly of block copolymers process in manufacturing.
Directed Self Assembly Of Block Co Polymers For Nano Manufacturing
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Author : Roel Gronheid
language : en
Publisher: Woodhead Publishing
Release Date : 2015-07-17
Directed Self Assembly Of Block Co Polymers For Nano Manufacturing written by Roel Gronheid and has been published by Woodhead Publishing this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015-07-17 with Technology & Engineering categories.
The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques. Authoritative outlining of theoretical principles and modeling techniques to give a thorough introdution to the topic Discusses a broad range of practical applications for directed self-assembly in nano-manufacturing Highlights the importance of this technology to both the present and future of nano-manufacturing by exploring its potential use in a range of fields
Amphiphilic Block Copolymers
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Author : P. Alexandridis
language : en
Publisher: Elsevier
Release Date : 2000-10-18
Amphiphilic Block Copolymers written by P. Alexandridis and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000-10-18 with Science categories.
It is the belief of the editors of this book that the recognition of block copolymers as being amphiphilic molecules and sharing common features with other well-studied amphiphiles will prove beneficial to both the surfactant and the polymer communities. An aim of this book is to bridge the two communities and cross-fertilise the different fields. To this end, leading researchers in the field of amphiphilic block copolymer self-assembly, some having a background in surfactant chemistry, and others with polymer physics roots, have agreed to join forces and contribute to this book.The book consists of four entities. The first part discusses theoretical considerations behind the block copolymer self-assembly in solution and in the melt. The second part provides case studies of self-assembly in different classes of block copolymers (e.g., polyethers, polyelectrolytes) and in different environments (e.g., in water, in non-aqueous solvents, or in the absence of solvents). The third part presents experimental tools, ranging from static (e.g., small angle neutron scattering) to dynamic (e.g., rheology), which can prove valuable in the characterization of block copolymer self-assemblies. The fourth part offers a sampling of current applications of block copolymers in, e.g., formulations, pharmaceutics, and separations, applications which are based on the unique self-assembly properties of block copolymers.
Templated Self Assembly Of Siloxane Block Copolymers For Nanofabrication
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Author : Yeon Sik Jung
language : en
Publisher:
Release Date : 2009
Templated Self Assembly Of Siloxane Block Copolymers For Nanofabrication written by Yeon Sik Jung and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with categories.
(Cont.) For example, arrays of parallel lines were used as a mask to pattern poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) conducting polymer thin films. The resulting PEDOT:PSS nanowire array was used as an chemiresistive-type ethanol-sensing device. Metallic films such as Ti, Pt, Ta, W, and magnetic Co and Ni were structured using a pattern-reversal process. Coercivity enhancements were observed for the fabricated ferromagnetic nanostructures such as wires, rings, and antidots. These functional nanostructures can be utilized for a variety of devices such as high-density and high performance sensor or memory devices.
Block Copolymer Self Assembly A Computational Approach Towards Novel Morphologies
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Author : Karim Raafat Gadelrab
language : en
Publisher:
Release Date : 2019
Block Copolymer Self Assembly A Computational Approach Towards Novel Morphologies written by Karim Raafat Gadelrab and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019 with categories.
Spontaneous self-assembly of materials is a phenomenon exhibited by different molecular systems. Among many, Block copolymers (BCPs) proved to be particularly interesting due to their ability to microphase separate into periodic domains. Nonetheless, the rising need for arbitrary, complex, 3D nanoscale morphology shows that what is commonly achievable is quite limited. Expanding the range of BCPs morphologies could be attained through the implementation of a host of strategies that could be used concurrently. Using directed self-assembly (DSA), a sphere forming BCP was assembled in a randomly displaced post template to study system resilience towards defect creation. Template shear-like distortion seemed to govern local defect generation. Defect clusters with symmetries compatible with that of the BCP showed enhanced stability. Using 44 and 32434 Archimedean tiling templates that are incompatible with BCP six-fold symmetry created low symmetry patterns with an emergent behavior dependent on pattern size and shape. A variation of DSA is studied using modulated substrates. Layer-by-layer deposition of cylinder forming BCPs was investigated. Self-consistent field theory (SCFT) and strong segregation theory SST were employed to provide the understanding and the conditions under which particular orientations of consecutive layers were produced. Furthermore, deep functionalized trenches were employed to create vertically standing high-[chi] BCP structures. Changing annealing conditions for a self-assembled lamellar structure evolved the assembled pattern to a tubular morphology that is non-native to diblock copolymers. A rather fundamental but challenging strategy to go beyond the standard motifs common to BCPs is to synthesize multiblock molecules with an expanded design space. Triblock copolymers produced bilayer perforated lamellar morphology. SCFT analysis showed a large window of stability of such structures in thin films. In addition, a model for bottlebrush BCPs (BBCPs) was constructed to investigate the characteristics of BBCPs self-assembly. Pre-stacked diblock sidechains showed improved microphase separation while providing domain spacing relevant to lithography applications. A rich phase diagram was constructed at different block concentrations. The ability to explore new strategies to discover potential equilibrium morphologies in BCPs is supported by strong numerical modeling and simulations efforts. Accelerating SCFT performance would greatly benefit BCP phase discovery. Preliminary work discussed the first attempt to Neural Network (NN) assisted SCFT. The use of NN was able to cut on the required calculations steps to reach equilibrium morphology, demonstrating accelerated calculation, and escaping trapped states, with no effect on final structure.
Physical Aspects Of Polymer Self Assembly
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Author : P. R. Sundararajan
language : en
Publisher: John Wiley & Sons
Release Date : 2016-11-15
Physical Aspects Of Polymer Self Assembly written by P. R. Sundararajan and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-11-15 with Science categories.
Offering an overview of principles and techniques, this book covers all major categories of self-assembled polymers – properties, processes, and design. Each chapter focuses on morphology, applications, and advanced concepts to illustrate the advantages of polymer self-assembly across industrial and academic research. • Provides an organized, comprehensive overview of polymer self-assembly, its fundamentals, principles, and applications • Includes chapters on block copolymers, amphiphilic polymers, supramolecular polymers, rotaxenes, polymer gels, dendrimers, and small molecules in polymer matrices • Focuses on novel applications, block copolymer assembly to nanotechnology, photonics and metamaterials, molecular machines and artificial muscle, gels that can be applied to polymer science, materials science, and nanotechnology • Examines state-of-the-art concepts, like lithographic patterning and foldaxane • Discusses challenges and future outlook of a popular and emerging field of study
Self Assembly Of Block Copolymers For Nanopatterning
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Author : Nathanael Lap-Yan Wu
language : en
Publisher:
Release Date : 2014
Self Assembly Of Block Copolymers For Nanopatterning written by Nathanael Lap-Yan Wu and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014 with Block copolymers categories.
The impressive developments in the semiconductor industry over the past five decades have largely been dependent on the ability to continually reduce the dimensions of devices on a chip. However, as critical dimension requirements for these devices approach the limits of photolithography, new fabrication strategies must be introduced for these remarkable advances to continue. One technology listed by the International Technology Roadmap for Semiconductors as a candidate for next-generation nanostructure fabrication is the directed self-assembly of block copolymers. Block copolymers have received significant attention of late for their ability to template large regular arrays of nanostructures with dimensions ranging from 10 to 50 nm. The production of denser sub-10 nm nanostructures is also possible by reducing the size of these polymers, but a reduction of the polymer size also compromises the quality of nanostructures, making small polymers extremely difficult to use. In this thesis, two different patterning approaches are introduced to push the nanostructure density limits possible for a given polymer. In the first, a novel patterning approach involving thin films of bilayer block copolymer domains is used to effectively double the nanostructure density patterned by a given polymer. The technique is successfully applied to different types and sizes of polymer, and can also form highly controlled arrays of patterns with the help of surface topography. By varying different process parameters during the self-assembly or subsequent plasma steps, the dimensions of these density-doubled patterns may be finely-tuned to the desired width and pitch. The surface coverage of these density-doubled nanostructures is also maximized through adjusting the film thickness and parameters in the self-assembly process. Besides using bilayer films, dense arrays of nanostructures may also be patterned using a multi-step patterning approach. In this approach, multiple layers of block copolymer films are subsequently deposited onto the substrate to template nanostructures. Because nanostructures from previous layers contribute to the surface topography, they influence the self-assembly of successive layers and more dense and complex patterns may be produced as a result.
Block Copolymers In Solution
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Author : Ian W. Hamley
language : en
Publisher: John Wiley & Sons
Release Date : 2005-09-02
Block Copolymers In Solution written by Ian W. Hamley and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-09-02 with Science categories.
This unique text discusses the solution self-assembly of block copolymers and covers all aspects from basic physical chemistry to applications in soft nanotechnology. Recent advances have enabled the preparation of new materials with novel self-assembling structures, functionality and responsiveness and there have also been concomitant advances in theory and modelling. The present text covers the principles of self-assembly in both dilute and concentrated solution, for example micellization and mesophase formation, etc., in chapters 2 and 3 respectively. Chapter 4 covers polyelectrolyte block copolymers - these materials are attracting significant attention from researchers and a solid basis for understanding their physical chemistry is emerging, and this is discussed. The next chapter discusses adsorption of block copolymers from solution at liquid and solid interfaces. The concluding chapter presents a discussion of selected applications, focussing on several important new concepts. The book is aimed at researchers in polymer science as well as industrial scientists involved in the polymer and coatings industries. It will also be of interest to scientists working in soft matter self-assembly and self-organizing polymers.
Block Copolymer Self Assembly As A Template For The Generation Of Ordered Arrays Of Nanowires
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Author : Thomas Garrett Fitzgerald
language : en
Publisher:
Release Date : 2008
Block Copolymer Self Assembly As A Template For The Generation Of Ordered Arrays Of Nanowires written by Thomas Garrett Fitzgerald and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008 with Polymers categories.
Upon self-assembly block copolymers (BCP) form a variety of well-ordered nanometer-sized structures in thin films which satisfy the size requirement for many nanotechnologies. This thesis details the in-depth study of three different BCP systems including the various factors which influence the final film structure, the generation of nanoporous polymer templates and their subsequent use a lithographic etch masks. Chapter 1 provides a general introduction to the principles of BCP self-assembly as well as a brief overview of the current state of this continually expanding field. Chapter 2 focuses on microphase separation within cylinder-forming polystyrene-block-polyisoprene-block-polystyrene BCP thin films. Thermal and solvent annealing are both investigated as potential routes to achieve microphase separation. Following a thermal anneal approach ordered cylindrical structures exhibiting excellent long-range order are achieved using directing effects imposed topographically channelled substrates. Control of film thickness within the channelled structures provides a simple method for control of cylinder orientation (parallel or perpendicular). In Chapter 3 macrophase separation is demonstrated in blends of polystyrene and poly(methyl metacrylate) illustrating the importance of the bonding between polymer units in a polystyrene-block-poly(methyl metacrylate) BCP as a requisite for microphase separation. Both cylinder- and lamellar-forming systems are demonstrated with this BCP, depending on the polymer ratio, and the orientation of the structures can be controlled via polymer-substrate interactions. Variation of molecular weight of the BCP provides a simple means of controlling resultant feature sizes. Reactive ion etching provides a rapid route for the generation of polystyrene template structures which can be subsequently used as positive etch mask to produce arrays of silicon lines. The microphase separation within both polystyrene-block-poly(ethylene oxide) BCP and polystyrene-block-poly(ethylene oxide)/polystyrene blend thin films, induced via solvent annealing, is discussed in Chapter 4. Blends of polystyrene homopolymer and polystyrene-block-poly(ethylene oxide) BCP result in a cylindrical structure rather than the predicted lamellar morphology due to the increased amount of polystyrene present. Selection of the appropriate solvent anneal conditions provides a simple means of controlling the orientation of the final structure. Variation of molecular weight again provides excellent control over feature size, however, if it is too low microphase separation will not occur. Reactive ion etching also provides a rapid route for the generation of polystyrene template structures. Chapter 5 provides a general overview of the various techniques used during the course of this thesis as well as providing supplementary information on calculations and BCP synthesis mentioned in previous chapters.
Chemical And Physical Methods Of The Templated Direction Of Block Copolymers
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Author : Samuel Mospens Nicaise
language : en
Publisher:
Release Date : 2012
Chemical And Physical Methods Of The Templated Direction Of Block Copolymers written by Samuel Mospens Nicaise and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012 with categories.
This thesis discusses the investigation of various aspects of templated self-assembly of block copolymer (BCP) thin films for nanofeature fabrication. Two chapters outline the research of a combined physical and chemical templating method with two BCPs. The method was not effective in templating poly(styrene-block-methyl methacrylate) (PS-b-PMMA) BCP because of limited template wettability. The method effectively templated poly(octofluro pentamethacrylate-block-hydroxystyrene) (OFPMA-b-HSM) BCP to fabricate orthogonally-directed lamellar microdomains and nanohole-mesh arrays. Chapter 4 discusses the achievement of a mean overlay accuracy of 52 nm and 0' for two electron-beam-based lithographic features as a result of an investigated overlay process. Lastly, the thesis reports the fabrication of a wide-range of nanofeatures - from two-dimensional and three dimensional nanoholes arrays to elliptical and cylindrical meshes - by the sacrificial-post templating method with poly(styreneblock- dimethylsiloxane) (PS-b-PDMS) BCP.