Thin Film Growth Techniques For Low Dimensional Structures


Thin Film Growth Techniques For Low Dimensional Structures
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Thin Film Growth Techniques For Low Dimensional Structures


Thin Film Growth Techniques For Low Dimensional Structures
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Author : R.F.C. Farrow
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-03-09

Thin Film Growth Techniques For Low Dimensional Structures written by R.F.C. Farrow and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-03-09 with Technology & Engineering categories.


This work represents the account of a NATO Advanced Research Workshop on "Thin Film Growth Techniques for Low Dimensional Structures", held at the University of Sussex, Brighton, England from 15-19 Sept. 1986. The objective of the workshop was to review the problems of the growth and characterisation of thin semiconductor and metal layers. Recent advances in deposition techniques have made it possible to design new material which is based on ultra-thin layers and this is now posing challenges for scientists, technologists and engineers in the assessment and utilisation of such new material. Molecular beam epitaxy (MBE) has become well established as a method for growing thin single crystal layers of semiconductors. Until recently, MBE was confined to the growth of III-V compounds and alloys, but now it is being used for group IV semiconductors and II-VI compounds. Examples of such work are given in this volume. MBE has one major advantage over other crystal growth techniques in that the structure of the growing layer can be continuously monitored using reflection high energy electron diffraction (RHEED). This technique has offered a rare bonus in that the time dependent intensity variations of RHEED can be used to determine growth rates and alloy composition rather precisely. Indeed, a great deal of new information about the kinetics of crystal growth from the vapour phase is beginning to emerge.



Thin Film Growth Techniques For Low Dimensional Structures


Thin Film Growth Techniques For Low Dimensional Structures
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Author : R. F. C. Farrow
language : en
Publisher:
Release Date : 2014-01-15

Thin Film Growth Techniques For Low Dimensional Structures written by R. F. C. Farrow and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-01-15 with categories.




Thin Film Growth Techniques For Low Dimensional Structures


Thin Film Growth Techniques For Low Dimensional Structures
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Author : R.F.C. Farrow
language : en
Publisher: Springer
Release Date : 2012-12-28

Thin Film Growth Techniques For Low Dimensional Structures written by R.F.C. Farrow and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-28 with Technology & Engineering categories.


This work represents the account of a NATO Advanced Research Workshop on "Thin Film Growth Techniques for Low Dimensional Structures", held at the University of Sussex, Brighton, England from 15-19 Sept. 1986. The objective of the workshop was to review the problems of the growth and characterisation of thin semiconductor and metal layers. Recent advances in deposition techniques have made it possible to design new material which is based on ultra-thin layers and this is now posing challenges for scientists, technologists and engineers in the assessment and utilisation of such new material. Molecular beam epitaxy (MBE) has become well established as a method for growing thin single crystal layers of semiconductors. Until recently, MBE was confined to the growth of III-V compounds and alloys, but now it is being used for group IV semiconductors and II-VI compounds. Examples of such work are given in this volume. MBE has one major advantage over other crystal growth techniques in that the structure of the growing layer can be continuously monitored using reflection high energy electron diffraction (RHEED). This technique has offered a rare bonus in that the time dependent intensity variations of RHEED can be used to determine growth rates and alloy composition rather precisely. Indeed, a great deal of new information about the kinetics of crystal growth from the vapour phase is beginning to emerge.



Thin Film Growth Techniques For Low Dimensional Structures


Thin Film Growth Techniques For Low Dimensional Structures
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Author : R.F.C. Farrow
language : en
Publisher: Springer
Release Date : 1987-12-01

Thin Film Growth Techniques For Low Dimensional Structures written by R.F.C. Farrow and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 1987-12-01 with Technology & Engineering categories.


This work represents the account of a NATO Advanced Research Workshop on "Thin Film Growth Techniques for Low Dimensional Structures", held at the University of Sussex, Brighton, England from 15-19 Sept. 1986. The objective of the workshop was to review the problems of the growth and characterisation of thin semiconductor and metal layers. Recent advances in deposition techniques have made it possible to design new material which is based on ultra-thin layers and this is now posing challenges for scientists, technologists and engineers in the assessment and utilisation of such new material. Molecular beam epitaxy (MBE) has become well established as a method for growing thin single crystal layers of semiconductors. Until recently, MBE was confined to the growth of III-V compounds and alloys, but now it is being used for group IV semiconductors and II-VI compounds. Examples of such work are given in this volume. MBE has one major advantage over other crystal growth techniques in that the structure of the growing layer can be continuously monitored using reflection high energy electron diffraction (RHEED). This technique has offered a rare bonus in that the time dependent intensity variations of RHEED can be used to determine growth rates and alloy composition rather precisely. Indeed, a great deal of new information about the kinetics of crystal growth from the vapour phase is beginning to emerge.



Handbook Of Crystal Growth


Handbook Of Crystal Growth
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Author : Tom Kuech
language : en
Publisher: Elsevier
Release Date : 2014-11-02

Handbook Of Crystal Growth written by Tom Kuech and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-11-02 with Science categories.


Volume IIIA Basic Techniques Handbook of Crystal Growth, Second Edition Volume IIIA (Basic Techniques), edited by chemical and biological engineering expert Thomas F. Kuech, presents the underpinning science and technology associated with epitaxial growth as well as highlighting many of the chief and burgeoning areas for epitaxial growth. Volume IIIA focuses on major growth techniques which are used both in the scientific investigation of crystal growth processes and commercial development of advanced epitaxial structures. Techniques based on vacuum deposition, vapor phase epitaxy, and liquid and solid phase epitaxy are presented along with new techniques for the development of three-dimensional nano-and micro-structures. Volume IIIB Materials, Processes, and Technology Handbook of Crystal Growth, Second Edition Volume IIIB (Materials, Processes, and Technology), edited by chemical and biological engineering expert Thomas F. Kuech, describes both specific techniques for epitaxial growth as well as an array of materials-specific growth processes. The volume begins by presenting variations on epitaxial growth process where the kinetic processes are used to develop new types of materials at low temperatures. Optical and physical characterizations of epitaxial films are discussed for both in situ and exit to characterization of epitaxial materials. The remainder of the volume presents both the epitaxial growth processes associated with key technology materials as well as unique structures such as monolayer and two dimensional materials. Volume IIIA Basic Techniques Provides an introduction to the chief epitaxial growth processes and the underpinning scientific concepts used to understand and develop new processes. Presents new techniques and technologies for the development of three-dimensional structures such as quantum dots, nano-wires, rods and patterned growth Introduces and utilizes basic concepts of thermodynamics, transport, and a wide cross-section of kinetic processes which form the atomic level text of growth process Volume IIIB Materials, Processes, and Technology Describes atomic level epitaxial deposition and other low temperature growth techniques Presents both the development of thermal and lattice mismatched streams as the techniques used to characterize the structural properties of these materials Presents in-depth discussion of the epitaxial growth techniques associated with silicone silicone-based materials, compound semiconductors, semiconducting nitrides, and refractory materials



Surface Science


Surface Science
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Author : R.J. MacDonald
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06

Surface Science written by R.J. MacDonald and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Science categories.


Modern technologies increasingly rely on low-dimensional physics at interfaces and in thin-films and nano-structures. Surface science holds a key position in providing the experimental methods and theoretical models for a basic understanding of these effects. This book includes case studies and status reports about research topics such as: surface structure determination by tensor-LEED and surface X-ray diffraction; the preparation and detection of low-dimensional electronic surface states; quantitative surface compositional analysis; the dynamics of adsorption and reaction of adsorbates, e.g. kinetic oscillations; the characterization and control of thin-film and multilayer growth including the influence of surfactants; a critical assessment of the surface physics approach to heterogeneous catalysis.



Bulk Crystal And Thin Film Formation


Bulk Crystal And Thin Film Formation
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Author : Sharon Levine
language : en
Publisher:
Release Date : 2015-02-26

Bulk Crystal And Thin Film Formation written by Sharon Levine and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2015-02-26 with categories.


In present-day research and development, materials manufacturing crystal growth is referred to as a method to solve a broad spectrum of technological tasks in the fabrications of materials with stipulated properties. This all-inclusive book enables a reader to achieve insight into essential characteristics of the field, including formation of thin films, crystallization of proteins, rise of bulk organic crystals, low-dimensional structures, and other organic compounds.



Devices Based On Low Dimensional Semiconductor Structures


Devices Based On Low Dimensional Semiconductor Structures
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Author : M. Balkanski
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06

Devices Based On Low Dimensional Semiconductor Structures written by M. Balkanski and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Science categories.


Low-dimensional semiconductor quantum structures are a major, high-technological development that has a considerable industrial potential. The field is developing extremely rapidly and the present book represents a timely guide to the latest developments in device technology, fundamental properties, and some remarkable applications. The content is largely tutorial, and the book could be used as a textbook. The book deals with the physics, fabrication, characteristics and performance of devices based on low-dimensional semiconductor structures. It opens with fabrication procedures. The fundamentals of quantum structures and electro-optical devices are dealt with extensively. Nonlinear optical devices are discussed from the point of view of physics and applications of exciton saturation in MQW structures. Waveguide-based devices are also described in terms of linear and nonlinear coupling. The basics of pseudomorphic HEMT technology, device physics and materials layer design are presented. Each aspect is reviewed from the elementary basics up to the latest developments. Audience: Undergraduates in electrical engineering, graduates in physics and engineering schools. Useful for active scientists and engineers wishing to update their knowledge and understanding of recent developments.



Growth And Optical Properties Of Wide Gap Ii Vi Low Dimensional Semiconductors


Growth And Optical Properties Of Wide Gap Ii Vi Low Dimensional Semiconductors
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Author : T.C. McGill
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06

Growth And Optical Properties Of Wide Gap Ii Vi Low Dimensional Semiconductors written by T.C. McGill and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Science categories.


This volume contains the Proceedings of the NATO Advanced Research Workshop on "Growth and Optical Properties of Wide Gap II-VI Low Dimensional Semiconductors", held from 2 - 6 August 1988 in Regensburg, Federal Republic of Germany, under the auspices of the NATO International Scientific Exchange Programme. Semiconducting compounds formed by combining an element from column II of the periodic table with an element from column VI (so called II-VI Semiconductors) have long promised many optoelectronic devices operating in the visible region of the spectrum. However, these materials have encountered numerous problems including: large number of defects and difficulties in obtaining p- and n-type doping. Advances in new methods of material preparation may hold the key to unlocking the unfulfilled promises. During the workshop a full session was taken up covering the prospects for wide-gap II-VI Semiconductor devices, particularly light emitting ones. The growth of bulk materials was reviewed with the view of considering II-VI substrates for the novel epitaxial techniques such as MOCVD, MBE, ALE, MOMBE and ALE-MBE. The controlled introduction of impurities during non-equilibrium growth to provide control of the doping type and conductivity was emphasized.



Low Energy Ion Assisted Film Growth


Low Energy Ion Assisted Film Growth
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Author : A R González-Elipe
language : en
Publisher: World Scientific
Release Date : 2003-03-21

Low Energy Ion Assisted Film Growth written by A R González-Elipe and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-03-21 with Science categories.


This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book. Contents:Basic Concepts on the Interaction of Low Energy Ion Beams with Solid TargetsIon Assisted Methods of Preparation of Thin FilmsEffects Induced by the Ion Assistance of Film GrowthApplications of IAD ProcessingDiamond-Like Carbon and Cubic-Boron Nitride Films Readership: Researchers, post-graduate students and engineers with limited experience in the techniques of thin film deposition. Keywords:IAD (Ion Assisted Deposition);IBAD (Ion Beam Assisted Deposition);Ion Plating;Thin Films or Thin Film Growth;Broad Beam or Thin Film Growth;Broad Beam Ion Sources;Ion Bombardment;Low Energy Ions, Interaction with Solid Targets;Thin Film Properties: Stress, Adhesion, Defects, Surface Roughness, Interface Mixing, Densification, Nucleation, Texture Development