Tungsten And Other Advanced Metals For Vlsi Ulsi Applications
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Multicomponent And Multilayered Thin Films For Advanced Microtechnologies Techniques Fundamentals And Devices
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Author : O. Auciello
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Multicomponent And Multilayered Thin Films For Advanced Microtechnologies Techniques Fundamentals And Devices written by O. Auciello and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices. This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above. The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films. The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students.
Tungsten And Other Advanced Metals For Vlsi Ulsi Applications
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Author :
language : en
Publisher:
Release Date : 1990
Tungsten And Other Advanced Metals For Vlsi Ulsi Applications written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1990 with categories.
Handbook Of Semiconductor Manufacturing Technology
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Author : Yoshio Nishi
language : en
Publisher: CRC Press
Release Date : 2017-12-19
Handbook Of Semiconductor Manufacturing Technology written by Yoshio Nishi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Technology & Engineering categories.
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Modeling Of Chemical Vapor Deposition Of Tungsten Films
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Author : Chris R. Kleijn
language : en
Publisher: Birkhäuser
Release Date : 2013-11-11
Modeling Of Chemical Vapor Deposition Of Tungsten Films written by Chris R. Kleijn and has been published by Birkhäuser this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-11 with Social Science categories.
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Tungsten And Other Advanced Metals For Vlsi Ulsi Applications
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Author :
language : en
Publisher:
Release Date : 1990
Tungsten And Other Advanced Metals For Vlsi Ulsi Applications written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1990 with Heat resistant alloys categories.
Advanced Metallization For Ulsi Applications
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Author :
language : en
Publisher:
Release Date : 1992
Advanced Metallization For Ulsi Applications written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992 with Electrochemical metallizing categories.
Advanced Metallization Conference In
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Author :
language : en
Publisher:
Release Date : 2007
Advanced Metallization Conference In written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with Integrated circuits categories.
Tungsten And Other Advanced Metals For Vlsi Ulsi Applications V
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Author : S. Simon Wong
language : en
Publisher:
Release Date : 1990
Tungsten And Other Advanced Metals For Vlsi Ulsi Applications V written by S. Simon Wong and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1990 with Technology & Engineering categories.
Advanced Metallization Conference 1999 Amc 1999 Volume 15
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Author : Mihal E. Gross
language : en
Publisher:
Release Date : 2000
Advanced Metallization Conference 1999 Amc 1999 Volume 15 written by Mihal E. Gross and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Ultraclean Surface Processing Of Silicon Wafers
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Author : Takeshi Hattori
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-03-09
Ultraclean Surface Processing Of Silicon Wafers written by Takeshi Hattori and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-03-09 with Technology & Engineering categories.
A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.