Advanced Metallization For Ulsi Applications
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Advanced Metallization For Ulsi Applications
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Author : Osamu Nakatsuka
language : en
Publisher:
Release Date : 2014
Advanced Metallization For Ulsi Applications written by Osamu Nakatsuka and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014 with Integrated circuits categories.
Advanced Metallization And Interconnect Systems For Ulsi Applications In 1996 Volume 12
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Author : Robert Havemann
language : en
Publisher:
Release Date : 1997
Advanced Metallization And Interconnect Systems For Ulsi Applications In 1996 Volume 12 written by Robert Havemann and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997 with Computers categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Advanced Metallization For Ulsi Applications
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Author : Osamu Nakatsuka
language : en
Publisher:
Release Date : 2016
Advanced Metallization For Ulsi Applications written by Osamu Nakatsuka and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016 with categories.
Advanced Metallization For Ulsi Applications
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Author : Osamu Nakatsuka
language : en
Publisher:
Release Date : 2020
Advanced Metallization For Ulsi Applications written by Osamu Nakatsuka and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020 with categories.
Special Issue Advanced Metallization For Ulsi Applications
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Author : Fuminori Ito
language : en
Publisher:
Release Date : 2013
Special Issue Advanced Metallization For Ulsi Applications written by Fuminori Ito and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013 with categories.
Handbook Of Semiconductor Manufacturing Technology
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Author : Yoshio Nishi
language : en
Publisher: CRC Press
Release Date : 2017-12-19
Handbook Of Semiconductor Manufacturing Technology written by Yoshio Nishi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Technology & Engineering categories.
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Advanced Interconnects For Ulsi Technology
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Author : Mikhail Baklanov
language : en
Publisher: John Wiley & Sons
Release Date : 2012-02-17
Advanced Interconnects For Ulsi Technology written by Mikhail Baklanov and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-02-17 with Technology & Engineering categories.
Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto a single chip, the increased resistance and RC-delay at the smaller scale has become a significant factor affecting chip performance. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects, and discusses: Interconnect functions, characterisations, electrical properties and wiring requirements Low-k materials: fundamentals, advances and mechanical properties Conductive layers and barriers Integration and reliability including mechanical reliability, electromigration and electrical breakdown New approaches including 3D, optical, wireless interchip, and carbon-based interconnects Intended for postgraduate students and researchers, in academia and industry, this book provides a critical overview of the enabling technology at the heart of the future development of computer chips.
Advanced Metallization For Ulsi Applications In 1993
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Author : David P. Favreau
language : en
Publisher: Materials Research Society
Release Date : 1994-02-01
Advanced Metallization For Ulsi Applications In 1993 written by David P. Favreau and has been published by Materials Research Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994-02-01 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Proceedings Of The Symposium On Interconnect And Contact Metallization
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Author : Harzara S. Rathore
language : en
Publisher: The Electrochemical Society
Release Date : 1998
Proceedings Of The Symposium On Interconnect And Contact Metallization written by Harzara S. Rathore and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998 with Computers categories.
Multicomponent And Multilayered Thin Films For Advanced Microtechnologies Techniques Fundamentals And Devices
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Author : O. Auciello
language : en
Publisher: Springer Science & Business Media
Release Date : 1993-04-30
Multicomponent And Multilayered Thin Films For Advanced Microtechnologies Techniques Fundamentals And Devices written by O. Auciello and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 1993-04-30 with Technology & Engineering categories.
Proceedings of the NATO Advanced Study Institute on Multicomponent and Multilayered Thin Films for Advanced Microtechnologies, Bad Windsheim, Germany, September 21-October 2, 1992