Ultra Clean Processing Of Silicon Surfaces Vii
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Ultra Clean Processing Of Silicon Surfaces Vii
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Author : Paul Mertens
language : en
Publisher: Trans Tech Publications Ltd
Release Date : 2005-04-01
Ultra Clean Processing Of Silicon Surfaces Vii written by Paul Mertens and has been published by Trans Tech Publications Ltd this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-04-01 with Technology & Engineering categories.
UCPSS 2004 Proceddings of the 7th International Symposium on Ultra Cleyn Processing of Silicon Surfaces (UCPSS), Brussels, Belgium, Sept. 20-22, 2004
Ultra Clean Processing Of Silicon Surfaces
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Author :
language : en
Publisher:
Release Date : 2004
Ultra Clean Processing Of Silicon Surfaces written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Contamination control categories.
Ultraclean Surface Processing Of Silicon Wafers
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Author : Takeshi Hattori
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-03-09
Ultraclean Surface Processing Of Silicon Wafers written by Takeshi Hattori and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-03-09 with Technology & Engineering categories.
A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.
Ulsi Process Integration 7
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Author : C. Claeys
language : en
Publisher: The Electrochemical Society
Release Date : 2011
Ulsi Process Integration 7 written by C. Claeys and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011 with categories.
Ultra Clean Processing Of Semiconductor Surfaces Xiii
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Author : Paul W. Mertens
language : en
Publisher: Trans Tech Publications Ltd
Release Date : 2016-09-05
Ultra Clean Processing Of Semiconductor Surfaces Xiii written by Paul W. Mertens and has been published by Trans Tech Publications Ltd this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-09-05 with Technology & Engineering categories.
Selected, peer reviewed papers from the 13th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 12-14, 2016, Knokke, Belgium
Ultra Clean Processing Of Semiconductor Surfaces Xvi
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Author : Paul Mertens
language : en
Publisher: Trans Tech Publications Ltd
Release Date : 2023-08-14
Ultra Clean Processing Of Semiconductor Surfaces Xvi written by Paul Mertens and has been published by Trans Tech Publications Ltd this book supported file pdf, txt, epub, kindle and other format this book has been release on 2023-08-14 with Science categories.
Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023) Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023), September 12-14, 2023, Brugge, Belgium
Scientific Wet Process Technology For Innovative Lsi Fpd Manufacturing
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Author : Tadahiro Ohmi
language : en
Publisher: CRC Press
Release Date : 2018-10-03
Scientific Wet Process Technology For Innovative Lsi Fpd Manufacturing written by Tadahiro Ohmi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-10-03 with Science categories.
As science pushes closer toward the atomic size scale, new challenges arise to slow the pace of the miniaturization that has transformed our society and fueled the information age. New technologies are necessary to surpass these obstacles and realize the tremendous growth predicted by Moore's law. Assembled from the works of pioneering researchers, Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing presents new developments and technologies for producing the next generation of electronic circuits and displays. This book introduces radical-reaction-based semiconductor manufacturing technologies that overcome the limitations of the existing molecule-reaction-based technologies. It systematically details the procedures and underlying concepts involved in wet process technologies and applications. Following an introduction to semiconductor surface chemical electronics, expert contributors discuss the principles and technology of high-performance wet cleaning; etching technologies and processes; antistatic technology; wet vapor resist stripping technology; and process and safety technologies including waste reclamation, chemical composition control, and ultrapure water and liquid chemical supply systems and materials for fluctuation-free facilities. Currently, large production runs are needed to balance the costs of acquiring and tuning equipment for specialized operating conditions. Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing explains the technologies and processes used to meet the demand for variety and low volumes that exists in today's digital electronics marketplace.
Particles On Surfaces Detection Adhesion And Removal Volume 7
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Author : Kash L. Mittal
language : en
Publisher: CRC Press
Release Date : 2023-01-06
Particles On Surfaces Detection Adhesion And Removal Volume 7 written by Kash L. Mittal and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2023-01-06 with Science categories.
This volume documents the proceedings of the 7th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Newark, NJ, June 19-21, 2000. The study of particles on surfaces is extremely important in a host of diverse technological areas, ranging from microelectronics to optics to biomedical. This volume contains a total of 28 papers, which were all properly peer reviewed, revised and edited before inclusion. Therefore, this book is not merely a collection of unreviewed manuscripts, but rather represents information which has passed peer scrutiny. Furthermore, the authors were asked to update their manuscripts, so the information contained in this book should be current and fresh. This volume is divided into two parts: 1) Particle Analysis and General Cleaning-Related Topics; and 2) Particle Adhesion and Removal. The topics covered include: surface analysis techniques for particle identification; cleaning, rinsing and drying issues in post-CMP cleaning; fundamental forces involved in particle adhesion; factors affecting adhesion of small (nanosize) particles; factors important in particle detachment; particle adhesion measurement by AFM; various (wet and dry) techniques for particle removal, e.g., laser, ultrasonic, megasonic, use of surfactants; toner particles and pharmaceutical particles. This volume offers a wealth of information on the tremendously technologically important field of particles on surfaces and should provide a consolidated source of current R&D activity in this arena. Therefore, it will be of value and use to anyone interested in the topic of particles on surfaces.
Advanced Gate Stacks For High Mobility Semiconductors
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Author : Athanasios Dimoulas
language : en
Publisher: Springer Science & Business Media
Release Date : 2008-01-01
Advanced Gate Stacks For High Mobility Semiconductors written by Athanasios Dimoulas and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-01-01 with Technology & Engineering categories.
This book provides a comprehensive monograph on gate stacks in semiconductor technology. It covers the major latest developments and basics and will be useful as a reference work for researchers, engineers and graduate students alike. The reader will get a clear view of what has been done so far, what is the state-of-the-art and which are the main challenges ahead before we come any closer to a viable Ge and III-V MOS technology.
Materials Reliability In Microelectronics Vii Volume 473
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Author : J. Joseph Clement
language : en
Publisher:
Release Date : 1997-10-20
Materials Reliability In Microelectronics Vii Volume 473 written by J. Joseph Clement and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1997-10-20 with Technology & Engineering categories.
The inexorable drive for increased integrated circuit functionality and performance places growing demands on the metal and dielectric thin films used in fabricating these circuits, as well as spurring demand for new materials applications and processes. This book directly addresses issues of widespread concern in the microelectronics industry - smaller feature sizes, new materials and new applications that challenge the reliability of new technologies. While the book continues the focus on issues related to interconnect reliability, such as electromigration and stress, particular emphasis is placed on the effects of microstructure. An underlying theme is understanding the importance of interactions among different materials and associated interfaces comprising a single structure with dimensions near or below the micrometer scale. Topics include: adhesion and fracture; gate oxide growth and oxide interfaces; surface preparation and gate oxide reliability; oxide degradation and defects; micro-structure, texture and reliability; novel measurement techniques; interconnect performance and reliability modeling; electromigration and interconnect reliability and stress and stress relaxation.