Ultrathin Silicon Dioxide And Aluminum Oxide On Silicon
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Ultrathin Silicon Dioxide And Aluminum Oxide On Silicon
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Author : Abhijit Roy Chowdhuri
language : en
Publisher:
Release Date : 2003
Ultrathin Silicon Dioxide And Aluminum Oxide On Silicon written by Abhijit Roy Chowdhuri and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with categories.
Studies Of The Coincident Interfacial Structure And The Desorption Kinetics Of Ultrathin Films Of Aluminum Oxide On Silicon 111
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Author : Luke Andre Emmert
language : en
Publisher:
Release Date : 2000
Studies Of The Coincident Interfacial Structure And The Desorption Kinetics Of Ultrathin Films Of Aluminum Oxide On Silicon 111 written by Luke Andre Emmert and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with categories.
Semiconductor Surface Properties In The System
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Author : William Milton Gosney (Jr.)
language : en
Publisher:
Release Date : 1970
Semiconductor Surface Properties In The System written by William Milton Gosney (Jr.) and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1970 with Metallic films categories.
Fundamental Aspects Of Silicon Oxidation
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Author : Yves J. Chabal
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Fundamental Aspects Of Silicon Oxidation written by Yves J. Chabal and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
Discusses silicon oxidation in a tutorial fashion from both experimental and theoretical viewpoints. The authors report on the state of the art both at Lucent Technology and in academic research. The book will appeal to researchers and advanced students.
Semiconductor Surface Properties In The System
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Author : William Milton Gosney
language : en
Publisher:
Release Date : 1970
Semiconductor Surface Properties In The System written by William Milton Gosney and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1970 with categories.
Ultrathin Oxide Layers For Solar And Electrocatalytic Systems
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Author : Heinz Frei
language : en
Publisher: Royal Society of Chemistry
Release Date : 2022-01-12
Ultrathin Oxide Layers For Solar And Electrocatalytic Systems written by Heinz Frei and has been published by Royal Society of Chemistry this book supported file pdf, txt, epub, kindle and other format this book has been release on 2022-01-12 with Science categories.
This book brings together the fundamentals and applications of ultrathin oxide layers while highlighting connections and future opportunities.
Silicon Devices And Process Integration
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Author : Badih El-Kareh
language : en
Publisher: Springer Science & Business Media
Release Date : 2009-01-09
Silicon Devices And Process Integration written by Badih El-Kareh and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009-01-09 with Technology & Engineering categories.
Silicon Devices and Process Integration covers state-of-the-art silicon devices, their characteristics, and their interactions with process parameters. It serves as a comprehensive guide which addresses both the theoretical and practical aspects of modern silicon devices and the relationship between their electrical properties and processing conditions. The book is compiled from the author’s industrial and academic lecture notes and reflects years of experience in the development of silicon devices. Features include: A review of silicon properties which provides a foundation for understanding the device properties discussion, including mobility-enhancement by straining silicon; State-of-the-art technologies on high-K gate dielectrics, low-K dielectrics, Cu interconnects, and SiGe BiCMOS; CMOS-only applications, such as subthreshold current and parasitic latch-up; Advanced Enabling processes and process integration. This book is written for engineers and scientists in semiconductor research, development and manufacturing. The problems at the end of each chapter and the numerous charts, figures and tables also make it appropriate for use as a text in graduate and advanced undergraduate courses in electrical engineering and materials science.
Rapid Silicon Dioxide Film Formation On Clean Silicon Surfaces
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Author :
language : en
Publisher:
Release Date : 1992
Rapid Silicon Dioxide Film Formation On Clean Silicon Surfaces written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992 with categories.
Future generations of silicon-based microelectronic circuits will require ever-smaller devices, new classes of devices, and demands for higher reliability, thereby requiring further refinements of silicon planar technology. An understanding of the kinetics of film formation and optical properties of ultrathin silicon dioxide films on a parent silicon substrate is necessary to measure and predict the behavior of such devices. A high-speed ellipsometer and growth chamber were constructed to measure the growth rate of SiO2 on hot silicon substrates from which the prior native oxide had been removed. Data gathered from temperatures between 800 deg C and 1000 deg C for three substrate orientations (100), (111), and (1 10) reveal the dependence of the refractive index of SiO2 as a function of oxide thickness. No orientation effects were found. Kinetic measurements reveal two new linear growth regions with activation energies of El = 0.603 eV and Ell = 0.794 eV, respectively. X-ray photoelectron spectroscopy provides chemical evidence of oxygen supersaturation and a coesite- like structure near the oxide-substrate interface. The results will provide baseline data necessary for radiation hardening assessments, data to aid the development of the next generation of ellipsometric thin film standards, and will permit process designers to develop thinner device oxides. The instrumentation developed for this work may have commercial applicability for process control feedback and in situ quality assurance. SiO2 Films, Si, Ellipsometry, X-ray Photoelectron Spectroscopy Kinetics of Film Formation, High Temperature Oxidation.
Silicon Nitride And Silicon Dioxide Thin Insulating Films
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Author :
language : en
Publisher:
Release Date : 2001
Silicon Nitride And Silicon Dioxide Thin Insulating Films written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with Silicon dioxide categories.
Fundamental Aspects Of Ultrathin Dielectrics On Si Based Devices
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Author : Eric Garfunkel
language : en
Publisher: Springer Science & Business Media
Release Date : 1998-03-31
Fundamental Aspects Of Ultrathin Dielectrics On Si Based Devices written by Eric Garfunkel and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 1998-03-31 with Technology & Engineering categories.
An extrapolation of ULSI scaling trends indicates that minimum feature sizes below 0.1 mu and gate thicknesses of Audience: Both expert scientists and engineers who wish to keep up with cutting edge research, and new students who wish to learn more about the exciting basic research issues relevant to next-generation device technology.