Vlsi Science And Technology 1982

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Vlsi Science And Technology 1982

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Author : Conrad J. Dell'Oca
language : en
Publisher:
Release Date : 1982

Vlsi Science And Technology 1982 written by Conrad J. Dell'Oca and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1982 with Integrated circuits categories.

Microelectronic Materials And Processes

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Author : R.A. Levy
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06

Microelectronic Materials And Processes written by R.A. Levy and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.

The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!.

Proceedings Of The Symposium On Multilevel Metallization Interconnection And Contact Technologies

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Author : L. B. Rothman
language : en
Publisher:
Release Date : 1987

Proceedings Of The Symposium On Multilevel Metallization Interconnection And Contact Technologies written by L. B. Rothman and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1987 with Electronics categories.

Semiconductor Measurement Technology

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Author : United States. National Bureau of Standards
language : en
Publisher:
Release Date : 1988

Semiconductor Measurement Technology written by United States. National Bureau of Standards and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1988 with Integrated circuits categories.

Semiconductor Measurement Technology

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Author : National Institute of Standards and Technology (U.S.)
language : en
Publisher:
Release Date : 1990

Semiconductor Measurement Technology written by National Institute of Standards and Technology (U.S.) and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1990 with Semiconductors categories.

The Physics And Fabrication Of Microstructures And Microdevices

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Author : Michael J. Kelly
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06

The Physics And Fabrication Of Microstructures And Microdevices written by Michael J. Kelly and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.

les Houches This Winter School on "The Physics and Fabrication of Microstructures" originated with a European industrial decision to investigate in some detail the potential of custom-designed microstructures for new devices. Beginning in 1985, GEC and THOMSON started a collaboration on these subjects, supported by an ESPRIT grant from the Commission of the European Com munity. To the outside observer of the whole field, it appears clear that the world effort is very largely based in the United States and Japan. It also appears that cooperation and dissemination of results are very well organised outside Europe and act as a major influence on the development of new concepts and devices. In Japan, a main research programme of the Research and Development for Basic Technology for Future Industries is focused on "Future Electron Devices". In Japan and in the United States, many workshops are organised annually in order to bring together the major specialists in industry and academia, allowing fast dissemination of advances and contacts for setting up cooperative efforts.

Handbook Of Semiconductor Manufacturing Technology

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Author : Yoshio Nishi
language : en
Publisher: CRC Press
Release Date : 2000-08-09

Handbook Of Semiconductor Manufacturing Technology written by Yoshio Nishi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000-08-09 with Technology & Engineering categories.

The Handbook of Semiconductor Manufacturing Technology describes the individual processes and manufacturing control, support, and infrastructure technologies of silicon-based integrated-circuit manufacturing, many of which are also applicable for building devices on other semiconductor substrates. Discussing ion implantation, rapid thermal processing, photomask fabrication, chip testing, and plasma etching, the editors explore current and anticipated equipment, devices, materials, and practices of silicon-based manufacturing. The book includes a foreword by Jack S. Kilby, cowinner of the Nobel Prize in Physics 2000 "for his part in the invention of the integrated circuit."

Proceedings Of The Ninth International Conference On Chemical Vapor Deposition 1984

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Author : McD. Robinson
language : en
Publisher:
Release Date : 1984

Proceedings Of The Ninth International Conference On Chemical Vapor Deposition 1984 written by McD. Robinson and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1984 with Vapor-plating categories.

Microelectronic Materials

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Author : C.R.M. Grovenor
language : en
Publisher: Routledge
Release Date : 2017-10-05

Microelectronic Materials written by C.R.M. Grovenor and has been published by Routledge this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-10-05 with Science categories.

This practical book shows how an understanding of structure, thermodynamics, and electrical properties can explain some of the choices of materials used in microelectronics, and can assist in the design of new materials for specific applications. It emphasizes the importance of the phase chemistry of semiconductor and metal systems for ensuring the long-term stability of new devices. The book discusses single-crystal and polycrystalline silicon, aluminium- and gold-based metallisation schemes, packaging semiconductor devices, failure analysis, and the suitability of various materials for optoelectronic devices and solar cells. It has been designed for senior undergraduates, graduates, and researchers in physics, electronic engineering, and materials science.

Dry Etching For Microelectronics

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Author : R.A. Powell
language : en
Publisher: Elsevier
Release Date : 2012-12-02

Dry Etching For Microelectronics written by R.A. Powell and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-02 with Technology & Engineering categories.

This volume collects together for the first time a series of in-depth, critical reviews of important topics in dry etching, such as dry processing of III-V compound semiconductors, dry etching of refractory metal silicides and dry etching aluminium and aluminium alloys. This topical format provides the reader with more specialised information and references than found in a general review article. In addition, it presents a broad perspective which would otherwise have to be gained by reading a large number of individual research papers. An additional important and unique feature of this book is the inclusion of an extensive literature review of dry processing, compiled by search of computerized data bases. A subject index allows ready access to the key points raised in each of the chapters.