Cmos Front End Materials And Process Technology Volume 765
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Cmos Front End Materials And Process Technology Volume 765
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Author : Materials Research Society. Meeting
language : en
Publisher:
Release Date : 2003-09-12
Cmos Front End Materials And Process Technology Volume 765 written by Materials Research Society. Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-09-12 with Computers categories.
In the future, because fundamental materials and process limits are being approached, continued transistor scaling will not be as straightforward. Future complementary metal-oxide semiconductor (MOS) transistors will require high-permittivity (high-k) gate dielectrics and metal gate electrodes, as well as low-resistance ultrashallow junctions, in order to meet the stringent specifications of the International Technology Roadmap for Semiconductors. Techniques to improve transconductance and drive current may also be required. Process integration issues must be solved, and reliability must be assured, before any new material or processing technique can be used in IC manufacture. A further complication is that the key challenges will differ according to application. This book reports research results from industry, government labs and academia covering a wide scope of front-end process issues for future CMOS technologies. Topics include: advanced materials and structures; high-k dielectrics; advanced gate stack materials; heterogeneous integration and strained Si technologies; ultrashallow junction technology; strained Si and source/drain technology; and laser annealing and silicide processes.
Sige Materials Processing And Devices
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Author : David Louis Harame
language : en
Publisher: The Electrochemical Society
Release Date : 2004
Sige Materials Processing And Devices written by David Louis Harame and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Science categories.
Simulation Of Semiconductor Processes And Devices 2007
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Author : Tibor Grasser
language : en
Publisher: Springer Science & Business Media
Release Date : 2007-09-18
Simulation Of Semiconductor Processes And Devices 2007 written by Tibor Grasser and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007-09-18 with Computers categories.
This volume contains the proceedings of the 12th International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2007, held September 2007 in Vienna, Austria. It provides a global forum for the presentation and discussion of recent advances and developments in the theoretical description, physical modeling and numerical simulation and analysis of semiconductor fabrication processes, device operation and system performance.
High K Gate Dielectrics
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Author : Michel Houssa
language : en
Publisher: CRC Press
Release Date : 2003-12-01
High K Gate Dielectrics written by Michel Houssa and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-12-01 with Science categories.
The drive toward smaller and smaller electronic componentry has huge implications for the materials currently being used. As quantum mechanical effects begin to dominate, conventional materials will be unable to function at scales much smaller than those in current use. For this reason, new materials with higher electrical permittivity will be requ
Self Organized Processes In Semiconductor Heteroepitaxy Volume 794
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Author : Materials Research Society. Fall Meeting
language : en
Publisher:
Release Date : 2004-04-27
Self Organized Processes In Semiconductor Heteroepitaxy Volume 794 written by Materials Research Society. Fall Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004-04-27 with Science categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Fundamentals Of Novel Oxide Semiconductor Interfaces
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Author : C. R. Abernathy
language : en
Publisher:
Release Date : 2004
Fundamentals Of Novel Oxide Semiconductor Interfaces written by C. R. Abernathy and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Science categories.
Radiation Effects And Ion Beam Processing Of Materials
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Author : Materials Research Society. Fall Meeting
language : en
Publisher:
Release Date : 2004
Radiation Effects And Ion Beam Processing Of Materials written by Materials Research Society. Fall Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Technology & Engineering categories.
The catastrophic effect, as well as a potentially advantageous effect, from energetic beams is the instant high-energy deposition in a local volume, down to the nanoscale, and the rapid cooling processes resulting in changes in the structure and properties of materials that are hard to achieve by other methods. The challenging balance between controlling radiation damage and enhancing material properties has intrigued materials scientists and physicists, as well as engineers in the nuclear and semiconductor industry, and caused them to work closely together for many years. As clearly demonstrated in this volume, many new technologies for creating unique functional devices with energetic particle beams are based on the fundamental study of radiation-induced defect production and evolution. Scientists and engineers working in nuclear engineering, environmental sciences and functional materials share a common language and numerous opportunities for collaboration in this truly interdisciplinary area. Exciting and promising results are presented here, including the most recent progress in fundamental understanding of radiation effects using molecular dynamic (MD) and kinetic Monte Carlo (kMC) simulations, processing of monodisperse nanoparticles by ion implantation, production of a wide variety of nanostructures with the application of focused ion beams (FIB), and creating new types of nanoscale functional devices using high-energy ion tracks. These results demonstrate the important relation between fundamental research on radiation effects and the development of new types of nanoscale functional devices using energetic particles over a wide energy range. Topics include: radiation effects in nuclear materials; ion-beam processing of nanostructures; ion-beam processing of semiconductor devices; ion-beam modification of physical properties; modeling and computer simulation of beam-solid interactions; and ion-beam-assisted deposition and surface modification.
Chemical Mechanical Planarization Volume 767
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Author : Duane S. Boning
language : en
Publisher:
Release Date : 2003-08-27
Chemical Mechanical Planarization Volume 767 written by Duane S. Boning and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-08-27 with Technology & Engineering categories.
Chemical-mechanical planarization (CMP) has emerged as a critical fabrication technology for advanced integrated circuits. Even as the applications of CMP have diversified and we have begun to understand aspects of the physics and chemistry of the process, a new generation of CMP innovations is unfolding. New slurries and consumables are under development. New applications to novel devices continue to appear. This book, the most recent in a successful series on CMP, offers a review of the advances to date and provides a comprehensive discussion of the future challenges that must be overcome. Presentations from academia, government labs and industry are featured. Topics include; CMP modeling; CMP science; CMP slurries and particles for planarization of copper, oxide, and other materials; planarization applications including shallow trench isolation (STI), copper damascene, and novel devices and CMP integration.
Thermoelectric Materials 2003 Volume 793
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Author : G. S. Nolas
language : en
Publisher:
Release Date : 2004-03-17
Thermoelectric Materials 2003 Volume 793 written by G. S. Nolas and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004-03-17 with Science categories.
The measure of a thermoelectric material is given by the material's figure of merit. For over three decades the best thermoelectric materials had a ZT = 1. Recently, however, there are reports of new methods of materials synthesis that result in improvements beyond this performance. In addition, rapid characterization, as well as faster theoretical modeling of thermoelectric materials, has resulted in a more rapid evaluation of new materials. This book offers a look at these results and provides a benchmark for the current state in the field of thermoelectric materials research and development. The focus is on new and innovative directions that will lead to the next generation thermoelectric materials for small-scale refrigeration and power generation applications. The book emphasizes the multidisciplinary nature of the research needed to advance the science and technology of the field. Both theoretical and experimental studies are featured. Topics include: low-dimensional systems and nanocomposites; devices; oxides; skutterudites; complex bulk materials and measurements; novel approaches; and thermoelectric materials and technology.
Materials And Devices For Smart Systems
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Author : Materials Research Society. Fall Meeting
language : en
Publisher:
Release Date : 2004
Materials And Devices For Smart Systems written by Materials Research Society. Fall Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Technology & Engineering categories.