Crystalline Oxide Volume 747
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Crystalline Oxide Volume 747
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Author : D. G. Schlom
language : en
Publisher:
Release Date : 2003-06-23
Crystalline Oxide Volume 747 written by D. G. Schlom and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-06-23 with Technology & Engineering categories.
This book contains the proceedings of two symposia held at the 2002 MRS Fall Meeting in Boston. Papers from Symposium T, Crystalline Oxides on Semiconductors, bring together experts from different technology areas - high-k gate dielectrics, novel memories, and ferroelectrics, for example - to examine commonality among the fields. These papers offer an overview of the field, highlight interesting experimental results and device ideas, and feature innovative theoretical approaches to understanding these systems. Symposium V, Interfacial Issues for Oxide-Based Electronics, covers a wide range of topics involving the interfaces between electro-optical oxide layers and other materials. Overall, it is clear that a new generation of materials and heterostructures has been enabled by the increasing control of interfacial phenomena. Topics include: epitaxial oxide-silicon heterostructures; ferroelectric thin films on silicon; theory and modeling; crystalline oxides for gate dielectrics; transparent conducting oxides; transparent conducting oxides and oxide growth and properties; field effect devices and gate dielectrics; ferroelectrics, capacitors and sensors; organic devices and interfacial growth issues.
Structure Property Relationships Of Oxide Surfaces And Interfaces Ii Volume 751
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Author : Materials Research Society. Meeting
language : en
Publisher:
Release Date : 2003-05-21
Structure Property Relationships Of Oxide Surfaces And Interfaces Ii Volume 751 written by Materials Research Society. Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-05-21 with Technology & Engineering categories.
Because surfaces and interfaces found in oxide systems are strikingly complex, they can only be fully understood when examined at an atomic level. Yet for the materials scientist, such understanding is of paramount importance since future technological advances require it. This book, the second in a new series from the Materials Research Society, addresses structure-property relationships in these systems. Compared to the first proceedings, here we see a shift towards less well-defined materials that often more closely resemble reality, and an increasing effort to study these phenomena using in situ techniques. Of particular interest are discussions on the dynamical evolution of surface structure and relationships between the structure of surfaces, their stoichiometry and the distribution of bulk dislocations, which in turn can control the growth and retraction of islands and pits. Modeling and characterization of thin intergranular films, with a focus on how these films influence the properties of so many ceramic materials, are also addressed.
Structure Property Relationships Of Oxide Surfaces And Interfaces
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Author :
language : en
Publisher:
Release Date : 2003
Structure Property Relationships Of Oxide Surfaces And Interfaces written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with Interfaces (Physical sciences) categories.
Membranes Volume 752
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Author : Materials Research Society. Meeting
language : en
Publisher:
Release Date : 2003-04-11
Membranes Volume 752 written by Materials Research Society. Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-04-11 with Technology & Engineering categories.
The objective of this 2003 volume from the Materials Research Society is twofold - to provide an overview of advances in membrane science and technology and to enhance communication among membrane researchers from a variety of disciplines including chemistry, biology, biotechnology, chemical engineering and materials science. Membranes can be used for inert or reactive separations in a variety of fields including gas purification, water treatment, energy storage and conversion, bio-technology and biomedicine. The book brings together scientists involved in the entire spectrum of modern approaches to membrane science and technology to address synthesis, characterization and transport properties and their use in established and emerging applications. Topics include: membrane synthesis and preparation; surface modification and additives; hybrid and composite membranes; membrane characterization; transport phenomena in membranes; charged membranes and ion transfer; gas permeation and separation; pervaporation and vapor permeation; dense membranes for hydrogen separation; applications in biotechnology and biomedicine; and membrane R&D for industrial and emerging applications.
Chemical Mechanical Planarization Volume 767
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Author : Duane S. Boning
language : en
Publisher:
Release Date : 2003-08-27
Chemical Mechanical Planarization Volume 767 written by Duane S. Boning and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-08-27 with Technology & Engineering categories.
Chemical-mechanical planarization (CMP) has emerged as a critical fabrication technology for advanced integrated circuits. Even as the applications of CMP have diversified and we have begun to understand aspects of the physics and chemistry of the process, a new generation of CMP innovations is unfolding. New slurries and consumables are under development. New applications to novel devices continue to appear. This book, the most recent in a successful series on CMP, offers a review of the advances to date and provides a comprehensive discussion of the future challenges that must be overcome. Presentations from academia, government labs and industry are featured. Topics include; CMP modeling; CMP science; CMP slurries and particles for planarization of copper, oxide, and other materials; planarization applications including shallow trench isolation (STI), copper damascene, and novel devices and CMP integration.
Nanostructuring Materials With Energetic Beams Volume 777
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Author : A. Meldrum
language : en
Publisher:
Release Date : 2003-06-05
Nanostructuring Materials With Energetic Beams Volume 777 written by A. Meldrum and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-06-05 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
New Applications For Wide Bandgap Semiconductors Volume 764
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Author : Materials Research Society. Meeting
language : en
Publisher:
Release Date : 2003-09-29
New Applications For Wide Bandgap Semiconductors Volume 764 written by Materials Research Society. Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-09-29 with Technology & Engineering categories.
Wide-bandgap semiconductors such as SiC, GaN and related alloys, BN and related alloys, ZnGeSiN2, ZnO, and others continue to find new applications in solid-state lighting, sensors, filters, high-power electronics, biological detection, and spintronics. Improved bulk and epitaxial growth, processing, device design, and understanding of the physics of transport in heterostructures are all necessary for realization of these new technologies. The papers in this book span a range of subjects from material growth and characterization to the processing and application of devices in the electronic, as well as the optoelectronic, fields. Topics include: special invited papers; growth, processing and devices; novel applications for wide-bandgap semiconductors; oxides, heterostructures and devices; processing and devices and emerging areas.
Amorphous And Nanocrystalline Silicon Based Films 2003 Volume 762
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Author : Materials Research Society. Meeting
language : en
Publisher:
Release Date : 2003-11-12
Amorphous And Nanocrystalline Silicon Based Films 2003 Volume 762 written by Materials Research Society. Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-11-12 with Science categories.
Amorphous silicon technology has been the subject of symposia every year since 1984. This remarkable longevity is due to the continuous emergence of new scientific questions and new technological challenges for silicon thin films. Earlier there was a strong emphasis on methods to achieve high deposition rates using plasma or hot-wire chemical vapor deposition, and on the properties and applications of nanocrystalline silicon films, which for example have been incorporated into stacked a-Si:H/nc-Si:H solar cells. The papers appearing in this book are sorted under six chapter headings on the basis of subject matter. Chapter I is concerned with amorphous network structures, electronic metastability, defects, and photoluminescence. Chapter II focuses on thin-film transistors and imager arrays. Chapter III covers solar cells. Chapter IV addresses growth mechanisms, hot-filament CVD, and nc-Si:H growth. Chapter V contains all remaining topics in film growth, especially those related to devices. Finally, Chapter VI focuses on crystallized film.
Cmos Front End Materials And Process Technology Volume 765
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Author : Materials Research Society. Meeting
language : en
Publisher:
Release Date : 2003-09-12
Cmos Front End Materials And Process Technology Volume 765 written by Materials Research Society. Meeting and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-09-12 with Computers categories.
In the future, because fundamental materials and process limits are being approached, continued transistor scaling will not be as straightforward. Future complementary metal-oxide semiconductor (MOS) transistors will require high-permittivity (high-k) gate dielectrics and metal gate electrodes, as well as low-resistance ultrashallow junctions, in order to meet the stringent specifications of the International Technology Roadmap for Semiconductors. Techniques to improve transconductance and drive current may also be required. Process integration issues must be solved, and reliability must be assured, before any new material or processing technique can be used in IC manufacture. A further complication is that the key challenges will differ according to application. This book reports research results from industry, government labs and academia covering a wide scope of front-end process issues for future CMOS technologies. Topics include: advanced materials and structures; high-k dielectrics; advanced gate stack materials; heterogeneous integration and strained Si technologies; ultrashallow junction technology; strained Si and source/drain technology; and laser annealing and silicide processes.
Three Dimensional Nanoengineered Assemblies Volume 739
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Author : T. M. Orlando
language : en
Publisher:
Release Date : 2003-06-13
Three Dimensional Nanoengineered Assemblies Volume 739 written by T. M. Orlando and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-06-13 with Technology & Engineering categories.
Advances in nanoscale materials processing are taking place at a rapid pace via myriad paths, including lithography, production of nanoparticle assemblies, surface manipulation and many others. Several of the techniques create structures that are three-dimensional or quasi three-dimensional. Even smaller structures intended to be two-dimensional have a 'more' three-dimensional geometry as their two-dimensional feature size and layer thickness become similar. The properties of these denser assemblies are driving different applications in electronics (single-electron devices), optics (photonic crystals and switches) and elsewhere. This 2003 book provides a venue for a productive scientific and technical exchange. The result is a compilation of papers which address fundamental studies, technological advances and novel approaches to developing and processing three-dimensional nanoscale assemblies. Topics include: nanofabrication via lithographic techniques; unconventional fabrication methods of nano-structures; physics, chemistry and modeling of nanostructures; fabrication and properties of 1D nanostructures; fabrication and properties of 3D nanostructures; applications of nanostructures and devices.