Evolution Of Surface And Thin Film Microstructure

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Evolution Of Surface And Thin Film Microstructure Volume 280
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Author : Harry A. Atwater
language : en
Publisher:
Release Date : 1993-10-27
Evolution Of Surface And Thin Film Microstructure Volume 280 written by Harry A. Atwater and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1993-10-27 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Evolution Of Thin Film And Surface Microstructure Volume 202
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Author : C. V. Thompson
language : en
Publisher:
Release Date : 1991-05-31
Evolution Of Thin Film And Surface Microstructure Volume 202 written by C. V. Thompson and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1991-05-31 with Technology & Engineering categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Growth Evolution And Properties Of Surfaces Thin Films And Self Organized Structure Volume 648
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Author : Steven C. Moss
language : en
Publisher:
Release Date : 2001-09-20
Growth Evolution And Properties Of Surfaces Thin Films And Self Organized Structure Volume 648 written by Steven C. Moss and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-09-20 with Science categories.
A significant portion of these papers from a winter 2000 symposium examine materials and devices at the nano-scale, with work on self- organized structures as well as nano-patterned thin-film structures. Materials research in three-, two-, one-, and zero-dimensional objects is addressed. Other major themes include pattern formation on surfaces, magnetism in films, thin film nucleation and alloy formation, and diffusion and morphological evolution of surfaces and thin films. Quantum dots and quantum size effects, metal/silicon and germanium/silicon epitaxy, metal on semiconductor and semiconductor thin films, and semiconductor epitaxy are also discussed. Annotation copyrighted by Book News Inc., Portland, OR.
Handbook Of Deposition Technologies For Films And Coatings
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Author : Peter M. Martin
language : en
Publisher: William Andrew
Release Date : 2009-12-01
Handbook Of Deposition Technologies For Films And Coatings written by Peter M. Martin and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009-12-01 with Technology & Engineering categories.
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Correlation Between Microstructure And Surface Structure Evolution In Polycrystalline Films
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Author : Adriana Eleni Lita
language : en
Publisher:
Release Date : 2000
Correlation Between Microstructure And Surface Structure Evolution In Polycrystalline Films written by Adriana Eleni Lita and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with categories.
Mechanisms Of Surface And Microstructure Evolution In Deposited Films And Film Structures Volume 672
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Author : Jacques G. Amar
language : en
Publisher:
Release Date : 2001-11-12
Mechanisms Of Surface And Microstructure Evolution In Deposited Films And Film Structures Volume 672 written by Jacques G. Amar and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-11-12 with Science categories.
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book, first published in 2001, focuses on the interactions between different mechanisms of microstructure evolution and film-growth conditions.
Handbook Of Thin Film Deposition Techniques Principles Methods Equipment And Applications Second Editon
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Author : Krishna Seshan
language : en
Publisher: CRC Press
Release Date : 2002-02-01
Handbook Of Thin Film Deposition Techniques Principles Methods Equipment And Applications Second Editon written by Krishna Seshan and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002-02-01 with Science categories.
The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec
Microstructure And Morphology Evolution During The Growth Of Facetted Thin Films
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Author : Fnu Paritosh
language : en
Publisher:
Release Date : 2001
Microstructure And Morphology Evolution During The Growth Of Facetted Thin Films written by Fnu Paritosh and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001 with categories.
Nanostructured Surfaces And Thin Films Synthesis By Physical Vapor Deposition
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Author : Rafael Alvarez
language : en
Publisher: MDPI
Release Date : 2021-04-22
Nanostructured Surfaces And Thin Films Synthesis By Physical Vapor Deposition written by Rafael Alvarez and has been published by MDPI this book supported file pdf, txt, epub, kindle and other format this book has been release on 2021-04-22 with Science categories.
This Special Issue deals with the synthesis of nanostructured surfaces and thin films by means of physical vapor deposition techniques such as pulsed laser deposition, magnetron sputtering, HiPIMS, or e-beam evaporation, among others. The nanostructuration of the surface modifies the way a material interacts with the environment, changing its optical, mechanical, electrical, tribological, or chemical properties. This can be applied in the development of photovoltaic cells, tribological coatings, optofluidic sensors, or biotechnology to name a few. This issue includes research presenting novel or improved applications of nanostructured thin films, such as photovoltaic solar cells, thin-film transistors, antibacterial coatings or chemical and biological sensors, while also studying the nanostructuration mechanisms, from a fundamental point of view, that produce rods, columns, helixes or hexagonal grids at the nanoscale.
Defect Engineered Ti Al N Thin Films
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Author : Isabella Citlalli Schramm Benítez
language : en
Publisher: Linköping University Electronic Press
Release Date : 2017-10-23
Defect Engineered Ti Al N Thin Films written by Isabella Citlalli Schramm Benítez and has been published by Linköping University Electronic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-10-23 with categories.
This thesis investigates the effect of point defects (nitrogen vacancies and interstitials) and multilayering ((Ti,Al)N/TiN) on the phase transformations in cathodic arc-evaporated cubic (Ti,Al)N thin films at elevated temperatures. Special attention is paid to the evolution of the beneficial spinodal decomposition into c-TiN and c-AlN, the detrimental formation of wurtzite AlN and the potential application as hard coating in cutting tools. c-(Ti1-xAlx)Ny thin films with varying Al fractions and N content (y = 0.93 to 0.75) show a delay in the spinodal decomposition when increasing the amount of N vacancies. This results in a 300 °C upshift in the age hardening and a delay in the w-AlN formation, while additions of self-interstitials enhance phase separation. High temperature interaction between hard metal substrates and thin films is more pronounced when increasing N deficiency through diffusion of substrate elements into the film. Low N content films (y = 0.58 to 0.40) showed formation of additional phases such as Ti4AlN3, Ti2AlN, Al5Ti2 and Al3Ti during annealing and a transformation from Ti2AlN to Ti4AlN3 via intercalation. The multilayer structure of TiN/TiAlN results in surfacedirected spinodal decomposition that affects the decomposition behavior. Careful use of these effects appears as a promising method to improve cutting tool performance. Diese Arbeit untersucht den Effekt von Punktdefekten (Stickstoffleerstellen und Zwischengitteratome) und Multilagen ((Ti,Al)N/TiN) auf die Phasenumwandlung in lichtbogenverdampften kubischen (Ti,Al)N-Dünnschichten bei erhöhten Temperaturen. Besonderes Augenmerk liegt auf der Entwicklung der vorteilhaften spinodalen Entmischung in c-TiN und c-AlN und der nachteiligen Bildung von Wurtzit-AlN, sowie der möglichen Anwendung als Hartstoffbeschichtung von Schneidwerkzeugen. c-(Ti1-xAlx)Ny mit unterschiedlichem Al-Anteil und N-Gehalten von y = 0,93 bis 0,75 zeigt mit zunehmenden Stickstoffleerstellen eine Verzögerung der spinodalen Entmischung. Dadurch verschiebt sich die Ausscheidungshärtung um 300 °C zu höheren Temperaturen und die w-AlN-Bildung wird verzögert, während der Einbau von Eigenzwischengitteratomen die Entmischung beschleunigt. Die Hochtemperaturwechselwirkung zwischen Hartmetallsubstrat und Dünnschicht durch Diffusion von Substratelementen in die Schicht nimmt mit steigendem Stickstoffdefizit zu. Stickstoffarme Schichten (y = 0,58 bis 0,40) zeigen während der Wärmebehandlung zusätzliche Phasen wie Ti4AlN3, Ti2AlN, Al5Ti2 und Al3Ti und eine Umwandlung von Ti2AlN in Ti4AlN3 durch Interkalation. Die Multischichtstruktur von TiN/TiAlN führt zu einer oberflächengerichteten spinodalen Entmischung, die das Entmischungsverhalten beeinflusst. Ein gezielter Einsatz dieser Effekte erscheint als ein vielsprechender Weg, um die Leistungsfähigkeit von Schneidwerkzeugen zu verbessern. I denna avhandling behandlas inverkan av punktdefekter (kvävevakanser och interstitialer) och multilagring ((Ti,Al)N/TiN) på högtemperaturfasomvandlingar i tunna arcförångade skikt av kubiska (Ti,Al)N. Störst vikt har lagts på utvecklingen av det fördelaktiga spinodala sönderfallet till c-TiN och c-AlN, den ofördelaktiga omvandlingen till w-AlN och potentialen som hårda skikt i verktygstillämpningar. Tunna c-(Ti1-xAlx)Ny skikt med olika Al-andel och en N-halt mellan (y = 0.93 och 0.75) uppvisar ökad undertryckning av det spinodala sönderfallet med ökat kvävevakanshalt. Detta resulterar i bildandet av w-AlN skiftas upp i temperatur vilket gör att åldershärdningen höjs med 300 °C. Däremot medför närvaron av självinterstitialer ett snabbare sönderfall. Växelverkan mellan hårdmetallsubstraten och de tunna skikten vid hög temperatur ökar med minskad kvävehalt i skiten genom diffusion av atomer från substratet in i filmen. Filmer med låg kvävehalt (y = 0.58 till 0.40) bildar även andra faser så som Ti4AlN3, Ti2AlN, Al5Ti2 och Al3Ti under värmebehandling och fasomvandlingen från Ti2AlN till Ti4AlN3 sker via en mekanism kallad intercalation. Multilagring av TiN/TiAlN resulterar i ett ytriktad spinodalt sönderfall vilket påverkar det totala sönderfallsförloppet. Nyttjande av dessa resultat syns som lovande vägar till förbättrade verktygsegenskaper.