Flash Lamp Annealing
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Flash Lamp Annealing
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Author : Lars Rebohle
language : en
Publisher: Springer
Release Date : 2019-07-27
Flash Lamp Annealing written by Lars Rebohle and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019-07-27 with Technology & Engineering categories.
This book provides a comprehensive survey of the technology of flash lamp annealing (FLA) for thermal processing of semiconductors. It gives a detailed introduction to the FLA technology and its physical background. Advantages, drawbacks and process issues are addressed in detail and allow the reader to properly plan and perform their own thermal processing. Moreover, this books gives a broad overview of the applications of flash lamp annealing, including a comprehensive literature survey. Several case studies of simulated temperature profiles in real material systems give the reader the necessary insight into the underlying physics and simulations. This book is a valuable reference work for both novice and advanced users.
Temperature Measurement During Millisecond Annealing
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Author : Denise Reichel
language : en
Publisher: Springer
Release Date : 2016-01-07
Temperature Measurement During Millisecond Annealing written by Denise Reichel and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-01-07 with Science categories.
Denise Reichel studies the delicate subject of temperature measurement during lamp-based annealing of semiconductors, in particular during flash lamp annealing. The approach of background-correction using amplitude-modulated light to obtain the sample reflectivity is reinvented from rapid thermal annealing to apply to millisecond annealing. The author presents a new method independent of the lamp operation to obtain this amplitude modulation and derives a formula to describe the process. Further, she investigates the variables of the formula in depth to validate the method’s suitability for background-corrected temperature measurement. The experimental results finally proof its power for elevated temperatures.
Subsecond Annealing Of Advanced Materials
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Author : Wolfgang Skorupa
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-12-16
Subsecond Annealing Of Advanced Materials written by Wolfgang Skorupa and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-12-16 with Technology & Engineering categories.
The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.
Advanced Strategies In Thin Film Engineering By Magnetron Sputtering
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Author : Alberto Palmero
language : en
Publisher: MDPI
Release Date : 2020-12-10
Advanced Strategies In Thin Film Engineering By Magnetron Sputtering written by Alberto Palmero and has been published by MDPI this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-12-10 with Science categories.
Recent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: • Nanostructure-related properties; • Atomistic processes during film growth; • Process control, process stability, and in situ diagnostics; • Fundamentals and applications of HiPIMS; • Thin film nanostructuration phenomena; • Tribological, anticorrosion, and mechanical properties; • Combined procedures based on the magnetron sputtering technique; • Industrial applications; • Devices.
Process Technology For Silicon Carbide Devices
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Author : Carl-Mikael Zetterling
language : en
Publisher: IET
Release Date : 2002
Process Technology For Silicon Carbide Devices written by Carl-Mikael Zetterling and has been published by IET this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Technology & Engineering categories.
This book explains why SiC is so useful in electronics, gives clear guidance on the various processing steps (growth, doping, etching, contact formation, dielectrics etc) and describes how these are integrated in device manufacture.
Advanced Short Time Thermal Processing For Si Based Cmos Devices 2
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Author : Mehmet C. Öztürk
language : en
Publisher: The Electrochemical Society
Release Date : 2004
Advanced Short Time Thermal Processing For Si Based Cmos Devices 2 written by Mehmet C. Öztürk and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2004 with Technology & Engineering categories.
Advanced Short Time Thermal Processing For Si Based Cmos Devices
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Author : Fred Roozeboom
language : en
Publisher: The Electrochemical Society
Release Date : 2003
Advanced Short Time Thermal Processing For Si Based Cmos Devices written by Fred Roozeboom and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with Computers categories.
Advanced Gate Stack Source Drain And Channel Engineering For Si Based Cmos
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Author :
language : en
Publisher:
Release Date : 2005
Advanced Gate Stack Source Drain And Channel Engineering For Si Based Cmos written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with Technology & Engineering categories.
High Purity And High Mobility Semiconductors 13
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Author : E. Simoen
language : en
Publisher: The Electrochemical Society
Release Date : 2014
High Purity And High Mobility Semiconductors 13 written by E. Simoen and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014 with Semiconductors categories.
Crystal Growth Of Silicon For Solar Cells
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Author : Kazuo Nakajima
language : en
Publisher: Springer Science & Business Media
Release Date : 2010-03-12
Crystal Growth Of Silicon For Solar Cells written by Kazuo Nakajima and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-03-12 with Technology & Engineering categories.
This book, a continuation of the series “Advances in Materials Research,” is intended to provide the general basis of the science and technology of crystal growth of silicon for solar cells. In the face of the destruction of the global environment,the degradationofworld-widenaturalresourcesandtheexha- tion of energy sources in the twenty-?rst century, we all have a sincere desire for a better/safer world in the future. In these days, we strongly believe that it is important for us to rapidly developanewenvironment-friendlycleanenergyconversionsystemusingsolar energyastheultimatenaturalenergysource. Forinstance,mostofournatural resources and energy sources will be exhausted within the next 100 years. Speci?cally, the consumption of oil, natural gas, and uranium is a serious problem. Solar energy is the only ultimate natural energy source. Although 30% of total solar energy is re?ected at the earth’s surface, 70% of total solar energy can be available for us to utilize. The available solar energy amounts to severalthousand times larger than the world’s energy consumption in 2000 of about 9,000 Mtoe (M ton oil equivalent). To manage 10% of the world’s energy consumption at 2050 by solar energy, we must manufacture 40 GW solar cells per year continuously for 40 years. The required silicon feedstock is about 400,000 ton per year. We believe that this is an attainable target, since it can be realized by increasing the world production of silicon feedstock by 12times asmuchasthe presentproductionat2005.