Handbook Of Thin Film Technology

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Handbook Of Thin Film Technology
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Author : Leon I. Maissel
language : en
Publisher: McGraw-Hill Companies
Release Date : 1970
Handbook Of Thin Film Technology written by Leon I. Maissel and has been published by McGraw-Hill Companies this book supported file pdf, txt, epub, kindle and other format this book has been release on 1970 with Technology & Engineering categories.
Handbook Of Thin Film Technology
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Author : Leon I. Maissel
language : en
Publisher: McGraw-Hill Companies
Release Date : 1970
Handbook Of Thin Film Technology written by Leon I. Maissel and has been published by McGraw-Hill Companies this book supported file pdf, txt, epub, kindle and other format this book has been release on 1970 with Technology & Engineering categories.
Handbook Of Thin Film Deposition Processes And Techniques
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Author : Krishna Seshan
language : en
Publisher:
Release Date : 2002
Handbook Of Thin Film Deposition Processes And Techniques written by Krishna Seshan and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002 with Chemical vapor deposition categories.
The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Handbook Of Sputter Deposition Technology
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Author : Kiyotaka Wasa
language : en
Publisher: William Andrew
Release Date : 2012-12-31
Handbook Of Sputter Deposition Technology written by Kiyotaka Wasa and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-31 with Technology & Engineering categories.
This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. - A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available - All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique - 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere
Handbook Of Thin Film Process Technology
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Author : D Glocker
language : en
Publisher: CRC Press
Release Date : 2018-01-18
Handbook Of Thin Film Process Technology written by D Glocker and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-01-18 with Science categories.
The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume presents additional recipe-type information (i.e. important deposition system details and process parameters) for optical materials.
Introduction To Thin Film Transistors
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Author : S.D. Brotherton
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-04-16
Introduction To Thin Film Transistors written by S.D. Brotherton and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-04-16 with Technology & Engineering categories.
Introduction to Thin Film Transistors reviews the operation, application and technology of the main classes of thin film transistor (TFT) of current interest for large area electronics. The TFT materials covered include hydrogenated amorphous silicon (a-Si:H), poly-crystalline silicon (poly-Si), transparent amorphous oxide semiconductors (AOS), and organic semiconductors. The large scale manufacturing of a-Si:H TFTs forms the basis of the active matrix flat panel display industry. Poly-Si TFTs facilitate the integration of electronic circuits into portable active matrix liquid crystal displays, and are increasingly used in active matrix organic light emitting diode (AMOLED) displays for smart phones. The recently developed AOS TFTs are seen as an alternative option to poly-Si and a-Si:H for AMOLED TV and large AMLCD TV applications, respectively. The organic TFTs are regarded as a cost effective route into flexible electronics. As well as treating the highly divergent preparation and properties of these materials, the physics of the devices fabricated from them is also covered, with emphasis on performance features such as carrier mobility limitations, leakage currents and instability mechanisms. The thin film transistors implemented with these materials are the conventional, insulated gate field effect transistors, and a further chapter describes a new thin film transistor structure: the source gated transistor, SGT. The driving force behind much of the development of TFTs has been their application to AMLCDs, and there is a chapter dealing with the operation of these displays, as well as of AMOLED and electrophoretic displays. A discussion of TFT and pixel layout issues is also included. For students and new-comers to the field, introductory chapters deal with basic semiconductor surface physics, and with classical MOSFET operation. These topics are handled analytically, so that the underlying device physics is clearly revealed. These treatments are then used as a reference point, from which the impact of additional band-gap states on TFT behaviour can be readily appreciated. This reference book, covering all the major TFT technologies, will be of interest to a wide range of scientists and engineers in the large area electronics industry. It will also be a broad introduction for research students and other scientists entering the field, as well as providing an accessible and comprehensive overview for undergraduate and postgraduate teaching programmes.
Handbook Of Deposition Technologies For Films And Coatings
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Author : Peter M. Martin
language : en
Publisher: William Andrew Pub
Release Date : 2009
Handbook Of Deposition Technologies For Films And Coatings written by Peter M. Martin and has been published by William Andrew Pub this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009 with Technology & Engineering categories.
Recent years have seen a rapid expansion in the applications of advanced thin film coatings in areas including photovoltaics, energy conversion, energy efficiency, biomedical engineering, telecommunications, pharmaceuticals and flat panel displays. In a tough economic climate, surface engineering remains a growth industry, because surface engineered products improve performance, increase energy efficiency, add functionality and reduce costs. This fully updated edition of Handbook of Deposition Technologies for Films and Coatings explores these new applications, and the major advances in deposition processes and technologies that have made them possible. The aim of this handbook is to provide scientists and engineers with detailed and practical information on: Deposition processes for thin film coatings Surface engineering Advanced thin film applications and structures Relationships between deposition process parameters and thin film microstructure Nucleation and thin film growth processes Sculpted thin films Characterization of composition, bonding, and microstructure The role of plasmas in thin film growth In this third edition, extensive new material has been added throughout the book, especially in the areas concerned with plasma assisted vapor deposition processes and metallurgical coating applications. Peter M. Martin gained his PhD in Solid State Physics from Ohio State University and was a Post Doctoral Fellow at Carnegie-Mellon University. Dr Martin has been instrumental in developing patterned optical coatings for optical filtering, microwave shielding, and non-linear optical applications. - Explains in depth the many recent improvements in deposition technologies and applications - Thoroughly explains deposition technologies and their current applications - Discusses the numerous 'frontier areas' for the applications of the products of deposition technology
Handbook Of Physical Vapor Deposition Pvd Processing
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Author : Donald M. Mattox
language : en
Publisher: William Andrew
Release Date : 2010-04-29
Handbook Of Physical Vapor Deposition Pvd Processing written by Donald M. Mattox and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-04-29 with Technology & Engineering categories.
This updated version of the popular handbook further explains all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the new edition remains on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications, with additional information to support the original material. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called "war stories", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language. - Fully revised and updated to include the latest developments in PVD process technology - 'War stories' drawn from the author's extensive experience emphasize important points in development and manufacturing - Appendices include listings of periodicals and professional societies, terms and acronyms, and material on transferring technology between R&D and manufacturing
Handbook Of Sol Gel Science And Technology
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Author : Lisa Klein
language : en
Publisher: Springer Nature
Release Date : 2018-05-31
Handbook Of Sol Gel Science And Technology written by Lisa Klein and has been published by Springer Nature this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-05-31 with Technology & Engineering categories.
This completely updated and expanded second edition stands as a comprehensive knowledgebase on both the fundamentals and applications of this important materials processing method. The diverse, international team of contributing authors of this reference clarify in extensive detail properties and applications of sol-gel science and technology as it pertains to the production of substances, active and non-active, including optical, electronic, chemical, sensor, bio- and structural materials. Essential to a wide range of manufacturing industries, the compilation divides into the three complementary sections: Sol-Gel Processing, devoted to general aspects of processing and recently developed materials such as organic-inorganic hybrids, photonic crystals, ferroelectric coatings, and photocatalysts; Characterization of Sol-Gel Materials and Products, presenting contributions that highlight the notion that useful materials are only produced when characterization is tied to processing, such as determination of structure by NMR, in-situ characterization of the sol-gel reaction process, determination of microstructure of oxide gels, characterization of porous structure of gels by the surface measurements, and characterization of organic-inorganic hybrid; and Applications of Sol-Gel Technology, covering applications such as the sol-gel method used in processing of bulk silica glasses, bulk porous gels prepared by sol-gel method, application of sol-gel method to fabrication of glass and ceramic fibers, reflective and antireflective coating films, application of sol-gel method to formation of photocatalytic coating films, and application of sol-gel method to bioactive coating films. The comprehensive scope and integrated treatment of topics make this reference volume ideal for R&D scientists and engineers across a wide range of disciplines and professional interests.
Chemical Physics Of Thin Film Deposition Processes For Micro And Nano Technologies
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Author : Y. Pauleau
language : en
Publisher: Springer Science & Business Media
Release Date : 2002-04-30
Chemical Physics Of Thin Film Deposition Processes For Micro And Nano Technologies written by Y. Pauleau and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002-04-30 with Science categories.
Proceedings of the NATO Advanced Study Institute, held in Kaunas, Lithuania, from 3-14 September 2001