High K Gate Dielectrics For Cmos Technology
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High K Gate Dielectrics For Cmos Technology
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Author : Gang He
language : en
Publisher: John Wiley & Sons
Release Date : 2012-08-10
High K Gate Dielectrics For Cmos Technology written by Gang He and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-08-10 with Technology & Engineering categories.
A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.
Thin Films On Silicon
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Author : Vijay Narayanan
language : en
Publisher:
Release Date : 2016
Thin Films On Silicon written by Vijay Narayanan and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016 with Electronic books categories.
"This volume provides a broad overview of the fundamental materials science of thin films that use silicon as an active substrate or passive template, with an emphasis on opportunities and challenges for practical applications in electronics and photonics. It covers three materials classes on silicon: Semiconductors such as undoped and doped Si and SiGe, SiC, GaN, and III-V arsenides and phosphides; dielectrics including silicon nitride and high-k, low-k, and electro-optically active oxides; and metals, in particular silicide alloys. The impact of film growth and integration on physical, electrical, and optical properties, and ultimately device performance, is highlighted."--Publisher's website.
Physics And Technology Of High K Gate Dielectrics 6
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Author : S. Kar
language : en
Publisher: The Electrochemical Society
Release Date : 2008-10
Physics And Technology Of High K Gate Dielectrics 6 written by S. Kar and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-10 with Science categories.
The issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, novel and still higher permittivity dielectric materials, CMOS processing with high-K layers, metals for gate electrodes, interface issues, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
High K Gate Dielectrics
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Author : Michel Houssa
language : en
Publisher: CRC Press
Release Date : 2003-12-01
High K Gate Dielectrics written by Michel Houssa and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-12-01 with Science categories.
The drive toward smaller and smaller electronic componentry has huge implications for the materials currently being used. As quantum mechanical effects begin to dominate, conventional materials will be unable to function at scales much smaller than those in current use. For this reason, new materials with higher electrical permittivity will be requ
High K Gate Dielectrics For Cmos Technology
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Author : Gang He
language : en
Publisher: Wiley-VCH
Release Date : 2012-08-10
High K Gate Dielectrics For Cmos Technology written by Gang He and has been published by Wiley-VCH this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-08-10 with Technology & Engineering categories.
A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.
High Permittivity Gate Dielectric Materials
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Author : Samares Kar
language : en
Publisher: Springer
Release Date : 2016-08-23
High Permittivity Gate Dielectric Materials written by Samares Kar and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2016-08-23 with Technology & Engineering categories.
"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects." .
Physics And Technology Of High K Gate Dielectrics 5
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Author : Samares Kar
language : en
Publisher: The Electrochemical Society
Release Date : 2007
Physics And Technology Of High K Gate Dielectrics 5 written by Samares Kar and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with Technology & Engineering categories.
This issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
Metal Oxide Based High K Dielectrics
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Author : Srikanta Moharana
language : en
Publisher: CRC Press
Release Date : 2025-05-26
Metal Oxide Based High K Dielectrics written by Srikanta Moharana and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2025-05-26 with Technology & Engineering categories.
This book provides chronological advancement of metal oxide high-K dielectrics up to contemporary scenarios, synthesis with suitability and challenges, and diverse properties with emerging technological applications. It helps readers select metal oxide-based high-K dielectrics with large band-gap, cost-effective, and highly efficient material properties for plausible applications. It provides up-to-date research findings on established synthesis techniques, easy processing, characterization, properties, and prospective practical applicability, including hybrid materials. Features: Exhaustively covers synthesis, physical properties, and the applications of the high-K dielectrics Focuses on synthetic routes of preparation, properties, and their various practical applications from bench to field Discusses functionalization of novel metal oxides and flexible polymeric composite materials for superior dielectric and electrical performance Explores facile synthesis techniques for high-K dielectrics and their hybrid composites, properties, and technological applications Includes future perspectives and possible challenges for applying high–K dielectric materials This book is aimed at researchers and graduate students in materials science and engineering, physics, and electrical engineering.
Interlayer Dielectrics For Semiconductor Technologies
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Author : Shyam P Muraka
language : en
Publisher: Elsevier
Release Date : 2003-10-13
Interlayer Dielectrics For Semiconductor Technologies written by Shyam P Muraka and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003-10-13 with Science categories.
Semiconductor technologies are moving at such a fast pace that new materials are needed in all types of application. Manipulating the materials and their properties at atomic dimensions has become a must. This book presents the case of interlayer dielectrics materials whilst considering these challenges. Interlayer Dielectrics for Semiconductor Technologies cover the science, properties and applications of dielectrics, their preparation, patterning, reliability and characterisation, followed by the discussion of different materials including those with high dielctric constants and those useful for waveguide applications in optical communications on the chip and the package.* Brings together for the FIRST time the science and technology of interlayer deilectrics materials, in one volume* written by renowned experts in the field* Provides an up-to-date starting point in this young research field.
Nano Cmos Gate Dielectric Engineering
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Author : Hei Wong
language : en
Publisher: CRC Press
Release Date : 2017-12-19
Nano Cmos Gate Dielectric Engineering written by Hei Wong and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Technology & Engineering categories.
According to Moore’s Law, not only does the number of transistors in an integrated circuit double every two years, but transistor size also decreases at a predictable rate. At the rate we are going, the downsizing of CMOS transistors will reach the deca-nanometer scale by 2020. Accordingly, the gate dielectric thickness will be shrunk to less than half-nanometer oxide equivalent thickness (EOT) to maintain proper operation of the transistors, leaving high-k materials as the only viable solution for such small-scale EOT. This comprehensive, up-to-date text covering the physics, materials, devices, and fabrication processes for high-k gate dielectric materials, Nano-CMOS Gate Dielectric Engineering systematically describes how the fundamental electronic structures and other material properties of the transition metals and rare earth metals affect the electrical properties of the dielectric films, the dielectric/silicon and the dielectric/metal gate interfaces, and the resulting device properties. Specific topics include the problems and solutions encountered with high-k material thermal stability, defect density, and poor initial interface with silicon substrate. The text also addresses the essence of thin film deposition, etching, and process integration of high-k materials in an actual CMOS process. Fascinating in both content and approach, Nano-CMOS Gate Dielectric Engineering explains all of the necessary physics in a highly readable manner and supplements this with numerous intuitive illustrations and tables. Covering almost every aspect of high-k gate dielectric engineering for nano-CMOS technology, this is a perfect reference book for graduate students needing a better understanding of developing technology as well as researchers and engineers needing to get ahead in microelectronic engineering and materials science.