Physics And Technology Of High K Gate Dielectrics 5

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Physics And Technology Of High K Gate Dielectrics 5

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Author : Samares Kar
language : en
Publisher: The Electrochemical Society
Release Date : 2007

Physics And Technology Of High K Gate Dielectrics 5 written by Samares Kar and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with Technology & Engineering categories.

This issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.

Semiconductors Dielectrics And Metals For Nanoelectronics 12

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Author : S. Kar
language : en
Publisher: The Electrochemical Society
Release Date : 2014

Semiconductors Dielectrics And Metals For Nanoelectronics 12 written by S. Kar and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014 with categories.

Semiconductors Dielectrics And Metals For Nanoelectronics 15 In Memory Of Samares Kar

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Author : D. Misra
language : en
Publisher: The Electrochemical Society
Release Date :

Semiconductors Dielectrics And Metals For Nanoelectronics 15 In Memory Of Samares Kar written by D. Misra and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on with categories.

High K Gate Dielectrics For Cmos Technology

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Author : Gang He
language : en
Publisher: John Wiley & Sons
Release Date : 2012-08-10

High K Gate Dielectrics For Cmos Technology written by Gang He and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-08-10 with Technology & Engineering categories.

A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.

High Dielectric Constant Materials

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Author : Howard Huff
language : en
Publisher: Springer Science & Business Media
Release Date : 2005-11-02

High Dielectric Constant Materials written by Howard Huff and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-11-02 with Technology & Engineering categories.

Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.

The Elements

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Author :
language : en
Publisher: PediaPress
Release Date :

The Elements written by and has been published by PediaPress this book supported file pdf, txt, epub, kindle and other format this book has been release on with categories.

Nano Cmos Gate Dielectric Engineering

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Author : Hei Wong
language : en
Publisher: CRC Press
Release Date : 2017-12-19

Nano Cmos Gate Dielectric Engineering written by Hei Wong and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Technology & Engineering categories.

According to Moore’s Law, not only does the number of transistors in an integrated circuit double every two years, but transistor size also decreases at a predictable rate. At the rate we are going, the downsizing of CMOS transistors will reach the deca-nanometer scale by 2020. Accordingly, the gate dielectric thickness will be shrunk to less than half-nanometer oxide equivalent thickness (EOT) to maintain proper operation of the transistors, leaving high-k materials as the only viable solution for such small-scale EOT. This comprehensive, up-to-date text covering the physics, materials, devices, and fabrication processes for high-k gate dielectric materials, Nano-CMOS Gate Dielectric Engineering systematically describes how the fundamental electronic structures and other material properties of the transition metals and rare earth metals affect the electrical properties of the dielectric films, the dielectric/silicon and the dielectric/metal gate interfaces, and the resulting device properties. Specific topics include the problems and solutions encountered with high-k material thermal stability, defect density, and poor initial interface with silicon substrate. The text also addresses the essence of thin film deposition, etching, and process integration of high-k materials in an actual CMOS process. Fascinating in both content and approach, Nano-CMOS Gate Dielectric Engineering explains all of the necessary physics in a highly readable manner and supplements this with numerous intuitive illustrations and tables. Covering almost every aspect of high-k gate dielectric engineering for nano-CMOS technology, this is a perfect reference book for graduate students needing a better understanding of developing technology as well as researchers and engineers needing to get ahead in microelectronic engineering and materials science.

Handbook Of Graphene Volume 3

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Author : Mei Zhang
language : en
Publisher: John Wiley & Sons
Release Date : 2019-06-11

Handbook Of Graphene Volume 3 written by Mei Zhang and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019-06-11 with Technology & Engineering categories.

The third volume in a series of handbooks on graphene research and applications Graphene is a valuable nanomaterial used in technology. This handbook is focused on Graphene-Like 2D Materials. The Handbook of Graphene, Volume 3 covers topics that include planar graphene superlattices; magnetic and optical properties of graphene materials with porous defects; and nanoelectronic application of graphyne and its structural derivatives.

Characterization Integration And Reliability Of Hfo2 And Laluo3 High Metal Gate Stacks For Cmos Applications

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Author : Alexander Nichau
language : en
Publisher: Forschungszentrum Jülich
Release Date : 2014-04-03

Characterization Integration And Reliability Of Hfo2 And Laluo3 High Metal Gate Stacks For Cmos Applications written by Alexander Nichau and has been published by Forschungszentrum Jülich this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-04-03 with categories.

Micro And Nanoelectronics

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Author : Tomasz Brozek
language : en
Publisher: CRC Press
Release Date : 2017-12-19

Micro And Nanoelectronics written by Tomasz Brozek and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Technology & Engineering categories.

Micro- and Nanoelectronics: Emerging Device Challenges and Solutions presents a comprehensive overview of the current state of the art of micro- and nanoelectronics, covering the field from fundamental science and material properties to novel ways of making nanodevices. Containing contributions from experts in both industry and academia, this cutting-edge text: Discusses emerging silicon devices for CMOS technologies, fully depleted device architectures, characteristics, and scaling Explains the specifics of silicon compound devices (SiGe, SiC) and their unique properties Explores various options for post-CMOS nanoelectronics, such as spintronic devices and nanoionic switches Describes the latest developments in carbon nanotubes, iii-v devices structures, and more Micro- and Nanoelectronics: Emerging Device Challenges and Solutions provides an excellent representation of a complex engineering field, examining emerging materials and device architecture alternatives with the potential to shape the future of nanotechnology.