Physics And Technology Of High K Gate Dielectrics 5
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Physics And Technology Of High K Gate Dielectrics 5
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Author : Samares Kar
language : en
Publisher: The Electrochemical Society
Release Date : 2007
Physics And Technology Of High K Gate Dielectrics 5 written by Samares Kar and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007 with Technology & Engineering categories.
This issue covers in detail all aspects of the physics and the technology of high dielectric constant gate stacks, including high mobility substrates, high dielectric constant materials, processing, metals for gate electrodes, interfaces, physical, chemical, and electrical characterization, gate stack reliability, and DRAM and non-volatile memories.
High Permittivity Gate Dielectric Materials
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Author : Samares Kar
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-06-25
High Permittivity Gate Dielectric Materials written by Samares Kar and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-06-25 with Technology & Engineering categories.
"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects." .
Semiconductors Dielectrics And Metals For Nanoelectronics 15 In Memory Of Samares Kar
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Author : D. Misra
language : en
Publisher: The Electrochemical Society
Release Date :
Semiconductors Dielectrics And Metals For Nanoelectronics 15 In Memory Of Samares Kar written by D. Misra and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on with categories.
Semiconductors Dielectrics And Metals For Nanoelectronics 12
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Author : S. Kar
language : en
Publisher: The Electrochemical Society
Release Date : 2014
Semiconductors Dielectrics And Metals For Nanoelectronics 12 written by S. Kar and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014 with categories.
High K Gate Dielectrics For Cmos Technology
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Author : Gang He
language : en
Publisher: John Wiley & Sons
Release Date : 2012-08-10
High K Gate Dielectrics For Cmos Technology written by Gang He and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-08-10 with Technology & Engineering categories.
A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.
The Elements
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Author :
language : en
Publisher: PediaPress
Release Date :
The Elements written by and has been published by PediaPress this book supported file pdf, txt, epub, kindle and other format this book has been release on with categories.
High Dielectric Constant Materials
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Author : Howard Huff
language : en
Publisher: Springer Science & Business Media
Release Date : 2005-11-02
High Dielectric Constant Materials written by Howard Huff and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005-11-02 with Technology & Engineering categories.
Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.
Metal Oxide Based High K Dielectrics
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Author : Srikanta Moharana
language : en
Publisher: CRC Press
Release Date : 2025-05-26
Metal Oxide Based High K Dielectrics written by Srikanta Moharana and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2025-05-26 with Technology & Engineering categories.
This book provides chronological advancement of metal oxide high-K dielectrics up to contemporary scenarios, synthesis with suitability and challenges, and diverse properties with emerging technological applications. It helps readers select metal oxide-based high-K dielectrics with large band-gap, cost-effective, and highly efficient material properties for plausible applications. It provides up-to-date research findings on established synthesis techniques, easy processing, characterization, properties, and prospective practical applicability, including hybrid materials. Features: Exhaustively covers synthesis, physical properties, and the applications of the high-K dielectrics Focuses on synthetic routes of preparation, properties, and their various practical applications from bench to field Discusses functionalization of novel metal oxides and flexible polymeric composite materials for superior dielectric and electrical performance Explores facile synthesis techniques for high-K dielectrics and their hybrid composites, properties, and technological applications Includes future perspectives and possible challenges for applying high–K dielectric materials This book is aimed at researchers and graduate students in materials science and engineering, physics, and electrical engineering.
Characterization Integration And Reliability Of Hfo2 And Laluo3 High Metal Gate Stacks For Cmos Applications
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Author : Alexander Nichau
language : en
Publisher: Forschungszentrum Jülich
Release Date : 2014-04-03
Characterization Integration And Reliability Of Hfo2 And Laluo3 High Metal Gate Stacks For Cmos Applications written by Alexander Nichau and has been published by Forschungszentrum Jülich this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-04-03 with categories.
Micro And Nanoelectronics
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Author : Tomasz Brozek
language : en
Publisher: CRC Press
Release Date : 2017-12-19
Micro And Nanoelectronics written by Tomasz Brozek and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-12-19 with Technology & Engineering categories.
Micro- and Nanoelectronics: Emerging Device Challenges and Solutions presents a comprehensive overview of the current state of the art of micro- and nanoelectronics, covering the field from fundamental science and material properties to novel ways of making nanodevices. Containing contributions from experts in both industry and academia, this cutting-edge text: Discusses emerging silicon devices for CMOS technologies, fully depleted device architectures, characteristics, and scaling Explains the specifics of silicon compound devices (SiGe, SiC) and their unique properties Explores various options for post-CMOS nanoelectronics, such as spintronic devices and nanoionic switches Describes the latest developments in carbon nanotubes, iii-v devices structures, and more Micro- and Nanoelectronics: Emerging Device Challenges and Solutions provides an excellent representation of a complex engineering field, examining emerging materials and device architecture alternatives with the potential to shape the future of nanotechnology.