Image Formation In Low Voltage Scanning Electron Microscopy
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Image Formation In Low Voltage Scanning Electron Microscopy
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Author : Ludwig Reimer
language : en
Publisher: SPIE Press
Release Date : 1993
Image Formation In Low Voltage Scanning Electron Microscopy written by Ludwig Reimer and has been published by SPIE Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1993 with Science categories.
While most textbooks about scanning electron microscopy (SEM) cover the high-voltage range from 5-50 keV, this volume considers the special problems in low-voltage SEM and summarizes the differences between LVSEM and conventional SEM. Chapters cover the influence of lens aberrations and design on electron-probe formation; the effect of elastic and inelastic scattering processes on electron diffusion and electron range; charging and radiation damage effects; the dependence of SE yield and the backscattering coefficient on electron energy, surface tilt, and material as well as the angular and energy distributions; and types of image contrast and the differences between LVSEM and conventional SEM modes due to the influence of electron-specimen interactions.
Scanning Electron Microscopy
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Author : Ludwig Reimer
language : en
Publisher: Springer
Release Date : 2013-11-11
Scanning Electron Microscopy written by Ludwig Reimer and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-11 with Science categories.
Scanning Electron Microscopy provides a description of the physics of electron-probe formation and of electron-specimen interactions. The different imaging and analytical modes using secondary and backscattered electrons, electron-beam-induced currents, X-ray and Auger electrons, electron channelling effects, and cathodoluminescence are discussed to evaluate specific contrasts and to obtain quantitative information.
Low Voltage Electron Microscopy
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Author : David C. Bell
language : en
Publisher: John Wiley & Sons
Release Date : 2013-02-11
Low Voltage Electron Microscopy written by David C. Bell and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-02-11 with Science categories.
Part of the Wiley-Royal Microscopical Society Series, this book discusses the rapidly developing cutting-edge field of low-voltage microscopy, a field that has only recently emerged due to the rapid developments in the electron optics design and image processing. It serves as a guide for current and new microscopists and materials scientists who are active in the field of nanotechnology, and presents applications in nanotechnology and research of surface-related phenomena, allowing researches to observe materials as never before.
Field Emission Scanning Electron Microscopy
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Author : Nicolas Brodusch
language : en
Publisher: Springer
Release Date : 2017-09-25
Field Emission Scanning Electron Microscopy written by Nicolas Brodusch and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-09-25 with Technology & Engineering categories.
This book highlights what is now achievable in terms of materials characterization with the new generation of cold-field emission scanning electron microscopes applied to real materials at high spatial resolution. It discusses advanced scanning electron microscopes/scanning- transmission electron microscopes (SEM/STEM), simulation and post-processing techniques at high spatial resolution in the fields of nanomaterials, metallurgy, geology, and more. These microscopes now offer improved performance at very low landing voltage and high -beam probe current stability, combined with a routine transmission mode capability that can compete with the (scanning-) transmission electron microscopes (STEM/-TEM) historically run at higher beam accelerating voltage
Biological Low Voltage Scanning Electron Microscopy
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Author : James Pawley
language : en
Publisher: Springer Science & Business Media
Release Date : 2007-12-03
Biological Low Voltage Scanning Electron Microscopy written by James Pawley and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2007-12-03 with Science categories.
Major improvements in instrumentation and specimen preparation have brought SEM to the fore as a biological imaging technique. Although this imaging technique has undergone tremendous developments, it is still poorly represented in the literature, limited to journal articles and chapters in books. This comprehensive volume is dedicated to the theory and practical applications of FESEM in biological samples. It provides a comprehensive explanation of instrumentation, applications, and protocols, and is intended to teach the reader how to operate such microscopes to obtain the best quality images.
Impact Of Electron And Scanning Probe Microscopy On Materials Research
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Author : David G. Rickerby
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Impact Of Electron And Scanning Probe Microscopy On Materials Research written by David G. Rickerby and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
The Advanced Study Institute provided an opportunity for researchers in universities, industry and National and International Laboratories, from the disciplines ofmaterials science, physics, chemistry and engineering to meet together in an assessment of the impact of electron and scanning probe microscopy on advanced material research. Since these researchers have traditionally relied upon different approaches, due to their different scientific background, to advanced materials problem solving, presentations and discussion within the Institute sessions were initially devoted to developing a set ofmutually understood basic concepts, inherently related to different techniques ofcharacterization by microscopy and spectroscopy. Particular importance was placed on Electron Energy Loss Spectroscopy (EELS), Scanning Probe Microscopy (SPM), High Resolution Transmission and Scanning Electron Microscopy (HRTEM, HRSTEM) and Environmental Scanning Electron Microscopy (ESEM). It was recognized that the electronic structure derived directly from EELS analysis as well as from atomic positions in HRTEM or High Angle Annular Dark Field STEM can be used to understand the macroscopic behaviour of materials. The emphasis, however, was upon the analysis of the electronic band structure of grain boundaries, fundamental for the understanding of macroscopic quantities such as strength, cohesion, plasticity, etc.
Microscopy Methods In Nanomaterials Characterization
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Author : Sabu Thomas
language : en
Publisher: Elsevier
Release Date : 2017-05-17
Microscopy Methods In Nanomaterials Characterization written by Sabu Thomas and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017-05-17 with Technology & Engineering categories.
Microscopy Methods in Nanomaterials Characterization fills an important gap in the literature with a detailed look at microscopic and X-ray based characterization of nanomaterials. These microscopic techniques are used for the determination of surface morphology and the dispersion characteristics of nanomaterials. This book deals with the detailed discussion of these aspects, and will provide the reader with a fundamental understanding of morphological tools, such as instrumentation, sample preparation and different kinds of analyses, etc. In addition, it covers the latest developments and trends morphological characterization using a variety of microscopes. Materials scientists, materials engineers and scientists in related disciplines, including chemistry and physics, will find this to be a detailed, method-orientated guide to microscopy methods of nanocharacterization. - Takes a method-orientated approach that includes case studies that illustrate how to carry out each characterization technique - Discusses the advantages and disadvantages of each microscopy characterization technique, giving the reader greater understanding of conditions for different techniques - Presents an in-depth discussion of each technique, allowing the reader to gain a detailed understanding of each
Compendium Of Surface And Interface Analysis
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Author : The Surface Science Society of Japan
language : en
Publisher: Springer
Release Date : 2018-02-19
Compendium Of Surface And Interface Analysis written by The Surface Science Society of Japan and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-02-19 with Technology & Engineering categories.
This book concisely illustrates the techniques of major surface analysis and their applications to a few key examples. Surfaces play crucial roles in various interfacial processes, and their electronic/geometric structures rule the physical/chemical properties. In the last several decades, various techniques for surface analysis have been developed in conjunction with advances in optics, electronics, and quantum beams. This book provides a useful resource for a wide range of scientists and engineers from students to professionals in understanding the main points of each technique, such as principles, capabilities and requirements, at a glance. It is a contemporary encyclopedia for selecting the appropriate method depending on the reader's purpose.
Handbook Of Vlsi Microlithography 2nd Edition
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Author : John N. Helbert
language : en
Publisher: Cambridge University Press
Release Date : 2001-04
Handbook Of Vlsi Microlithography 2nd Edition written by John N. Helbert and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-04 with Technology & Engineering categories.
This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Handbook Of Vlsi Microlithography
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Author : John N. Helbert
language : en
Publisher: William Andrew
Release Date : 2001-04-01
Handbook Of Vlsi Microlithography written by John N. Helbert and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-04-01 with Technology & Engineering categories.
This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.