Integrated Circuit Metrology Inspection And Process Control V
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Integrated Circuit Metrology Inspection And Process Control V
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Author : William H. Arnold
language : en
Publisher: SPIE-International Society for Optical Engineering
Release Date : 1991
Integrated Circuit Metrology Inspection And Process Control V written by William H. Arnold and has been published by SPIE-International Society for Optical Engineering this book supported file pdf, txt, epub, kindle and other format this book has been release on 1991 with Technology & Engineering categories.
Integrated Circuit Metrology Inspection And Process Control
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Author :
language : en
Publisher:
Release Date : 1994
Integrated Circuit Metrology Inspection And Process Control written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1994 with Electronic circuit design categories.
Integrated Circuit Metrology Inspection And Process Control Vi
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Author : Michael T. Postek
language : en
Publisher: SPIE-International Society for Optical Engineering
Release Date : 1992
Integrated Circuit Metrology Inspection And Process Control Vi written by Michael T. Postek and has been published by SPIE-International Society for Optical Engineering this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992 with Technology & Engineering categories.
Confocal Scanning Optical Microscopy And Related Imaging Systems
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Author : Gordon S. Kino
language : en
Publisher: Academic Press
Release Date : 1996-09-18
Confocal Scanning Optical Microscopy And Related Imaging Systems written by Gordon S. Kino and has been published by Academic Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 1996-09-18 with Science categories.
This book provides a comprehensive introduction to the field of scanning optical microscopy for scientists and engineers. The book concentrates mainly on two instruments: the Confocal Scanning Optical Microscope (CSOM), and the Optical Interference Microscope (OIM). A comprehensive discussion of the theory and design of the Near-Field Scanning Optical Microscope (NSOM) is also given. The text discusses the practical aspects of building a confocal scanning optical microscope or optical interference microscope, and the applications of these microscopes to phase imaging, biological imaging, and semiconductor inspection and metrology.A comprehensive theoretical discussion of the depth and transverse resolution is given with emphasis placed on the practical results of the theoretical calculations and how these can be used to help understand the operation of these microscopes. - Provides a comprehensive introduction to the field of scanning optical microscopy for scientists and engineers - Explains many practical applications of scanning optical and interference microscopy in such diverse fields as biology and semiconductor metrology - Discusses in theoretical terms the origin of the improved depth and transverse resolution of scanning optical and interference microscopes with emphasis on the practical results of the theoretical calculations - Considers the practical aspects of building a confocal scanning or interference microscope and explores some of the design tradeoffs made for microscopes used in various applications - Discusses the theory and design of near-field optical microscopes - Explains phase imaging in the scanning optical and interference microscopes
Integrated Circuit Metrology Inspection And Process Control Iii
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Author : Kevin M. Monahan
language : en
Publisher:
Release Date : 1989
Integrated Circuit Metrology Inspection And Process Control Iii written by Kevin M. Monahan and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1989 with Technology & Engineering categories.
Handbook Of Vlsi Microlithography
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Author : John N. Helbert
language : en
Publisher: William Andrew
Release Date : 2001-04-01
Handbook Of Vlsi Microlithography written by John N. Helbert and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-04-01 with Technology & Engineering categories.
This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
National Semiconductor Metrology Program
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Author : National Semiconductor Metrology Program (U.S.)
language : en
Publisher:
Release Date : 1999
National Semiconductor Metrology Program written by National Semiconductor Metrology Program (U.S.) and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with Semiconductors categories.
Handbook Of Vlsi Microlithography 2nd Edition
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Author : John N. Helbert
language : en
Publisher: Cambridge University Press
Release Date : 2001-04
Handbook Of Vlsi Microlithography 2nd Edition written by John N. Helbert and has been published by Cambridge University Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2001-04 with Technology & Engineering categories.
This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
National Semiconductor Metrology Program
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Author : National Institute of Standards and Technology (U.S.)
language : en
Publisher:
Release Date : 2000
National Semiconductor Metrology Program written by National Institute of Standards and Technology (U.S.) and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2000 with Semiconductors categories.
National Semiconductor Metrology Program Semiconductor Electronics Division Nist List Of Publications Lp 103 March 1999
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Author :
language : en
Publisher:
Release Date : 1999
National Semiconductor Metrology Program Semiconductor Electronics Division Nist List Of Publications Lp 103 March 1999 written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1999 with categories.