Magnetrons Reactive Gases And Sputtering

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Magnetrons Reactive Gases And Sputtering

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Author : Diederik Depla
language : en
Publisher:
Release Date : 2017

Magnetrons Reactive Gases And Sputtering written by Diederik Depla and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2017 with categories.

This handbook covers the fundamental aspects of reactive magnetron sputter deposition. This physical vapor deposition technique is used to grow compound thin films. The books starts with an explanation of the four title words. Using a simple model several aspects of the deposition technique are introduced. In the following chapters the book introduces a more complete mode to address some specific features of reactive sputter deposition. Some important points related to thin film growth are introduced and illustrated. The reader is challenged by some questions, and can rely on a large database of material/reactive gas combinations.

Reactive Sputter Deposition

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Author : Diederik Depla
language : en
Publisher: Springer Science & Business Media
Release Date : 2008-06-24

Reactive Sputter Deposition written by Diederik Depla and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008-06-24 with Technology & Engineering categories.

The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin ?lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti?c and technical papers is published each year on this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the ?rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in?uence of di?erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge.

High Power Impulse Magnetron Sputtering

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Author : Daniel Lundin
language : en
Publisher: Elsevier
Release Date : 2019-08-30

High Power Impulse Magnetron Sputtering written by Daniel Lundin and has been published by Elsevier this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019-08-30 with Technology & Engineering categories.

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.

Handbook Of Sputter Deposition Technology

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Author : Kiyotaka Wasa
language : en
Publisher: William Andrew
Release Date : 2012-12-31

Handbook Of Sputter Deposition Technology written by Kiyotaka Wasa and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-31 with Technology & Engineering categories.

This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. - A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available - All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique - 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere

Cathodic Arcs

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Author : André Anders
language : en
Publisher: Springer Science & Business Media
Release Date : 2009-07-30

Cathodic Arcs written by André Anders and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2009-07-30 with Science categories.

Cathodic arcs are among the longest studied yet least understood objects in science. Plasma-generating, tiny spots appear on the cathode; they are highly dynamic and hard to control. With an approach emphasizing the fractal character of cathode spots, strongly fluctuating plasma properties are described such as the presence of multiply charged ions that move with supersonic velocity. Richly illustrated, the book also deals with practical issues, such as arc source construction, macroparticle removal, and the synthesis of dense, well adherent coatings. The book spans a bridge from plasma physics to coatings technology based on energetic condensation, appealing to scientists, practitioners and graduate students alike.

Sputtering Materials For Vlsi And Thin Film Devices

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Author : Jaydeep Sarkar
language : en
Publisher: William Andrew
Release Date : 2010-12-13

Sputtering Materials For Vlsi And Thin Film Devices written by Jaydeep Sarkar and has been published by William Andrew this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-12-13 with Technology & Engineering categories.

An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . - Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements - Practical information on technology trends, role of sputtering and major OEMs - Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. - Practical case-studies on target performance and troubleshooting - Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry

Cold Plasma In Nano Matter Synthesis

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Author : A. Subrahmanyam
language : en
Publisher: Springer Nature
Release Date : 2024-12-05

Cold Plasma In Nano Matter Synthesis written by A. Subrahmanyam and has been published by Springer Nature this book supported file pdf, txt, epub, kindle and other format this book has been release on 2024-12-05 with Science categories.

This book describes the basic principles and techniques of cold plasma to synthesize nanomaterials, emphasizing the fundamentals. Nanotechnology has matured enough to make inroads into the industry. “Quantum size effects” is the basis of the exotic properties of nanomaterials. The shapes and the size distribution dictate the properties of the nano-matter. The demands of the synthesis technique are to produce nano-matter with uniform size, repeatable shapes, uniform size distribution, stability of the nanostructures (reaching thermodynamic equilibrium), reproducibility of the particle sizes, and reliability of the process. These demands can be met when the synthesis technique has precise control over the process parameters. Cold plasma techniques possess all the requirements of the needs of nanomaterial synthesis. The cold plasma, an evolving field, has been established to be the most powerful tool not only for micro-electronics (both in the deposition and etching) but in many areas like health care, medicine, agriculture, food processing, etc. The book’s primary emphasis is to explain the basic principles and concepts of cold plasma in nanomaterial synthesis. The target audience is undergraduate and graduate students learning nanomaterial synthesis and plasma technology. It is hoped that this book also is a good source of reference for practicing scientists and engineers involved in synthesizing nanomaterials and nanostructures in the industry.

The Foundations Of Vacuum Coating Technology

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Author : D. M. Mattox
language : en
Publisher: Springer Science & Business Media
Release Date : 2003

The Foundations Of Vacuum Coating Technology written by D. M. Mattox and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with Science categories.

Annotation applications of this technology. With its many references, this book provides a starting point for more in-depth surveys on what has been done as well as more recent work. The author draws comparisons and places the information in the proper context, which is particularly helpful for the patent literature where the terminology used is often not that used by the technical community. A "must" for materials scientists and engineers working with vacuum coating in the invention of new applications and researching patents, plus of special interest to those in the semiconductors field.

Chemical Physics Of Thin Film Deposition Processes For Micro And Nano Technologies

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Author : Y. Pauleau
language : en
Publisher: Springer Science & Business Media
Release Date : 2002-04-30

Chemical Physics Of Thin Film Deposition Processes For Micro And Nano Technologies written by Y. Pauleau and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2002-04-30 with Science categories.

Proceedings of the NATO Advanced Study Institute, held in Kaunas, Lithuania, from 3-14 September 2001

Handbook Of Manufacturing Engineering And Technology

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Author : Andrew Y. C. Nee
language : en
Publisher: Springer
Release Date : 2014-10-31

Handbook Of Manufacturing Engineering And Technology written by Andrew Y. C. Nee and has been published by Springer this book supported file pdf, txt, epub, kindle and other format this book has been release on 2014-10-31 with Technology & Engineering categories.

The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.