Materials Issues In Silicon Integrated Circuit Processing
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Materials Issues In Silicon Integrated Circuit Processing
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Author : Marc Wittmer
language : en
Publisher:
Release Date : 1986
Materials Issues In Silicon Integrated Circuit Processing written by Marc Wittmer and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1986 with Science categories.
Materials Issues In Silicon Integrated Circuit Processing
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Author :
language : en
Publisher:
Release Date : 1986
Materials Issues In Silicon Integrated Circuit Processing written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1986 with categories.
Crucial Issues In Semiconductor Materials And Processing Technologies
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Author : S. Coffa
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Crucial Issues In Semiconductor Materials And Processing Technologies written by S. Coffa and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
Semiconductors lie at the heart of some of the most important industries and technologies of the twentieth century. The complexity of silicon integrated circuits is increasing considerably because of the continuous dimensional shrinkage to improve efficiency and functionality. This evolution in design rules poses real challenges for the materials scientists and processing engineers. Materials, defects and processing now have to be understood in their totality. World experts discuss, in this volume, the crucial issues facing lithography, ion implication and plasma processing, metallization and insulating layer quality, and crystal growth. Particular emphasis is placed upon silicon, but compound semiconductors and photonic materials are also highlighted. The fundamental concepts of phase stability, interfaces and defects play a key role in understanding these crucial issues. These concepts are reviewed in a crucial fashion.
Ulsi Process Integration Iii
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Author : Electrochemical Society. Meeting
language : en
Publisher: The Electrochemical Society
Release Date : 2003
Ulsi Process Integration Iii written by Electrochemical Society. Meeting and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2003 with Technology & Engineering categories.
Laser Induced Damage In Optical Materials
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Author :
language : en
Publisher:
Release Date : 1992
Laser Induced Damage In Optical Materials written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1992 with Laser beams categories.
Proceedings Of The Second International Symposium On Process Physics And Modeling In Semiconductor Technology
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Author : G. R. Srinivasan
language : en
Publisher:
Release Date : 1991
Proceedings Of The Second International Symposium On Process Physics And Modeling In Semiconductor Technology written by G. R. Srinivasan and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1991 with Semiconductors categories.
Ion Beams In Materials Processing And Analysis
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Author : Bernd Schmidt
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-13
Ion Beams In Materials Processing And Analysis written by Bernd Schmidt and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-13 with Technology & Engineering categories.
A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.
Material Characterization Techniques For Integrated Circuit Processing
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Author :
language : en
Publisher:
Release Date : 1984
Material Characterization Techniques For Integrated Circuit Processing written by and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 1984 with Electron spectroscopy categories.
Ion Implantation Basics To Device Fabrication
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Author : Emanuele Rimini
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-11-27
Ion Implantation Basics To Device Fabrication written by Emanuele Rimini and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-11-27 with Technology & Engineering categories.
Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics of devices together with a brief description of the main trends in the field. The second chapter is devoted to ion im planters, including also high energy apparatus and a description of wafer charging and contaminants. Yield is a quite relevant is sue in the industrial surrounding and must be also discussed in the academic ambient. The slowing down of ions is treated in the third chapter both analytically and by numerical simulation meth ods. Channeling implants are described in some details in view of their relevance at the zero degree implants and of the available industrial parallel beam systems. Damage and its annealing are the key processes in ion implantation. Chapter four and five are dedicated to this extremely important subject.
Microelectronics Manufacturing Diagnostics Handbook
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Author : Abraham Landzberg
language : en
Publisher: Springer Science & Business Media
Release Date : 2012-12-06
Microelectronics Manufacturing Diagnostics Handbook written by Abraham Landzberg and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2012-12-06 with Technology & Engineering categories.
The world of microelectronics is filled with cusses measurement systems, manufacturing many success stories. From the use of semi control techniques, test, diagnostics, and fail ure analysis. It discusses methods for modeling conductors for powerful desktop computers to their use in maintaining optimum engine per and reducing defects, and for preventing de formance in modem automobiles, they have fects in the first place. The approach described, clearly improved our daily lives. The broad while geared to the microelectronics world, has useability of the technology is enabled, how applicability to any manufacturing process of similar complexity. The authors comprise some ever, only by the progress made in reducing their cost and improving their reliability. De of the best scientific minds in the world, and fect reduction receives a significant focus in our are practitioners of the art. The information modem manufacturing world, and high-quality captured here is world class. I know you will diagnostics is the key step in that process. find the material to be an excellent reference in of product failures enables step func Analysis your application. tion improvements in yield and reliability. which works to reduce cost and open up new Dr. Paul R. Low applications and technologies. IBM Vice President and This book describes the process ofdefect re of Technology Products General Manager duction in the microelectronics world.