Nanoimprint Lithography
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Nanoimprint Lithography An Enabling Process For Nanofabrication
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Author : Weimin Zhou
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-01-04
Nanoimprint Lithography An Enabling Process For Nanofabrication written by Weimin Zhou and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-01-04 with Technology & Engineering categories.
Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.
Nanoimprint Lithography
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Author : Hongbo Lan
language : en
Publisher: Nova Science Publishers
Release Date : 2011
Nanoimprint Lithography written by Hongbo Lan and has been published by Nova Science Publishers this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011 with Microlithography categories.
Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the challenge of improving and extending the incumbent optical projection lithography technology while simultaneously developing alternative, next generation lithography (NGL) technologies to be used when optical projection lithography is no longer more economical than the alternatives. Furthermore, NIL is also one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures as this highly technical book will give new insight to.
Nanoimprinting And Its Applications
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Author : Akihiro Miyauchi
language : en
Publisher: CRC Press
Release Date : 2019-06-14
Nanoimprinting And Its Applications written by Akihiro Miyauchi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019-06-14 with Science categories.
Nanoimprinting has grown rapidly since it was proposed in 1995 by Prof. Chou. Now machines, resins, and molds for nanoimprinting are commercially available worldwide. The application fields of nanoimprinting are expanding to not only electronics but also optics, biology, and energy because nanoimprinting is a simple and convenient method for nanofabrication, and some devices are now being mass-produced. In the near future, the application of nanoimprinting in display and semiconductor fields is expected. This book explains the fundamentals of nanoimprinting in terms of materials, processes, and machines. It also describes the applications of nanoimprinting in optics, biology, energy, and electronics. In addition, it includes as many practical examples of nanoimprinting as possible. The fundamentals will help advanced undergraduate and graduate students understand nanoimprinting. The examples will be useful for both researchers working in nanoimprinting for the first time and engineers involved in research and development of various devices using nanostructures.
Development Of Nanoimprint Lithography And Its Applications In Device Fabrication
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Author : Xing Cheng
language : en
Publisher:
Release Date : 2005
Development Of Nanoimprint Lithography And Its Applications In Device Fabrication written by Xing Cheng and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with categories.
Modeling Innovations In Euv And Nanoimprint Lithography
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Author : Yunfei Deng
language : en
Publisher:
Release Date : 2005
Modeling Innovations In Euv And Nanoimprint Lithography written by Yunfei Deng and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with categories.
High Resolution 3d Nanoimprint Technology
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Author : Xiaolin Wang
language : en
Publisher: kassel university press GmbH
Release Date : 2011
High Resolution 3d Nanoimprint Technology written by Xiaolin Wang and has been published by kassel university press GmbH this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011 with Fabry-Perot interferometers categories.
Nano Lithography
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Author : Stefan Landis
language : en
Publisher: John Wiley & Sons
Release Date : 2013-03-04
Nano Lithography written by Stefan Landis and has been published by John Wiley & Sons this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-03-04 with Technology & Engineering categories.
Lithography is an extremely complex tool – based on the concept of “imprinting” an original template version onto mass output – originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams – in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics, chemistry, mechanics and fluidics, and are now developing the nanoworld with new tools and technologies. Beyond the scientific challenges that are endemic in this miniaturization race, next generation lithography techniques are essential for creating new devices, new functionalities and exploring new application fields. Nanolithography is the branch of nanotechnology concerned with the study and application of fabricating nanometer-scale structures − meaning the creation of patterns with at least one lateral dimension between the size of an individual atom and approximately 100 nm. It is used in the fabrication of leading-edge semiconductor integrated circuits (nanocircuitry) or nanoelectromechanical systems (NEMS). This book addresses physical principles as well as the scientific and technical challenges of nanolithography, covering X-ray and NanoImprint lithography, as well as techniques using scanning probe microscopy and the optical properties of metal nanostructures, patterning with block copolymers, and metrology for lithography. It is written for engineers or researchers new to the field, and will help readers to expand their knowledge of technologies that are constantly evolving.
Microlithography
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Author : Bruce W. Smith
language : en
Publisher: CRC Press
Release Date : 2020-05-01
Microlithography written by Bruce W. Smith and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020-05-01 with Technology & Engineering categories.
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Micro Nanolithography
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Author : Jagannathan Thirumalai
language : en
Publisher: BoD – Books on Demand
Release Date : 2018-05-02
Micro Nanolithography written by Jagannathan Thirumalai and has been published by BoD – Books on Demand this book supported file pdf, txt, epub, kindle and other format this book has been release on 2018-05-02 with Technology & Engineering categories.
The main objective of this book is to give proficient people a comprehensive review of up-to-date global improvements in hypothetical and experimental evidences, perspectives and prospects of some newsworthy instrumentation and its numerous technological applications for a wide range of lithographic fabrication techniques. The present theme of this book is concomitant with the lithographic ways and means of deposition, optimization parameters and their wide technological applications. This book consists of six chapters comprehending with eminence of lithography, fabrication and reproduction of periodic nanopyramid structures using UV nanoimprint lithography for solar cell applications, large-area nanoimprint lithography and applications, micro-/nanopatterning on polymers, OPC under immersion lithography associated to novel luminescence applications, achromatic Talbot lithography (ATL) and the soft X-ray interference lithography. Individual chapters provide a base for a wide range of readers from different fiels, students and researchers, who may be doing research pertinent to the topics discussed in this book and find basic as well as advanced principles of designated subjects related to these phenomena explained plainly. The book contains six chapters by experts in different fields of lithographic fabrication and technology from over 15 research institutes across the globe.
Lithography
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Author : Michael Wang
language : en
Publisher: BoD – Books on Demand
Release Date : 2010-02-01
Lithography written by Michael Wang and has been published by BoD – Books on Demand this book supported file pdf, txt, epub, kindle and other format this book has been release on 2010-02-01 with Science categories.
Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits. This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field. We hope readers will enjoy reading the book as much as we have enjoyed bringing it together. We would like to thank all contributors and authors of this book.