Nanoimprinting And Its Applications
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Nanoimprinting And Its Applications
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Author : Akihiro Miyauchi
language : en
Publisher: CRC Press
Release Date : 2019-06-14
Nanoimprinting And Its Applications written by Akihiro Miyauchi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019-06-14 with Science categories.
Nanoimprinting has grown rapidly since it was proposed in 1995 by Prof. Chou. Now machines, resins, and molds for nanoimprinting are commercially available worldwide. The application fields of nanoimprinting are expanding to not only electronics but also optics, biology, and energy because nanoimprinting is a simple and convenient method for nanofabrication, and some devices are now being mass-produced. In the near future, the application of nanoimprinting in display and semiconductor fields is expected. This book explains the fundamentals of nanoimprinting in terms of materials, processes, and machines. It also describes the applications of nanoimprinting in optics, biology, energy, and electronics. In addition, it includes as many practical examples of nanoimprinting as possible. The fundamentals will help advanced undergraduate and graduate students understand nanoimprinting. The examples will be useful for both researchers working in nanoimprinting for the first time and engineers involved in research and development of various devices using nanostructures.
Nanoimprinting And Its Applications
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Author : Akihiro Miyauchi
language : en
Publisher: CRC Press
Release Date : 2019-06-14
Nanoimprinting And Its Applications written by Akihiro Miyauchi and has been published by CRC Press this book supported file pdf, txt, epub, kindle and other format this book has been release on 2019-06-14 with Science categories.
Nanoimprinting has grown rapidly since it was proposed in 1995 by Prof. Chou. Now machines, resins, and molds for nanoimprinting are commercially available worldwide. The application fields of nanoimprinting are expanding to not only electronics but also optics, biology, and energy because nanoimprinting is a simple and convenient method for nanofabrication, and some devices are now being mass-produced. In the near future, the application of nanoimprinting in display and semiconductor fields is expected. This book explains the fundamentals of nanoimprinting in terms of materials, processes, and machines. It also describes the applications of nanoimprinting in optics, biology, energy, and electronics. In addition, it includes as many practical examples of nanoimprinting as possible. The fundamentals will help advanced undergraduate and graduate students understand nanoimprinting. The examples will be useful for both researchers working in nanoimprinting for the first time and engineers involved in research and development of various devices using nanostructures.
Development Of Nanoimprint Lithography And Its Applications In Device Fabrication
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Author : Xing Cheng
language : en
Publisher:
Release Date : 2005
Development Of Nanoimprint Lithography And Its Applications In Device Fabrication written by Xing Cheng and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2005 with categories.
Nanoimprint Lithography
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Author : Hongbo Lan
language : en
Publisher: Nova Science Publishers
Release Date : 2011
Nanoimprint Lithography written by Hongbo Lan and has been published by Nova Science Publishers this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011 with Microlithography categories.
Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nanofabrication technologies and manufacturing of Integrated Circuits (IC). Traditional optical lithography including contact and project photolithography has contributed significantly to the semiconductor device advancements. Currently, maintaining the rapid pace of half-pitch reduction requires overcoming the challenge of improving and extending the incumbent optical projection lithography technology while simultaneously developing alternative, next generation lithography (NGL) technologies to be used when optical projection lithography is no longer more economical than the alternatives. Furthermore, NIL is also one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures as this highly technical book will give new insight to.
Nanoimprint Lithography An Enabling Process For Nanofabrication
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Author : Weimin Zhou
language : en
Publisher: Springer Science & Business Media
Release Date : 2013-01-04
Nanoimprint Lithography An Enabling Process For Nanofabrication written by Weimin Zhou and has been published by Springer Science & Business Media this book supported file pdf, txt, epub, kindle and other format this book has been release on 2013-01-04 with Technology & Engineering categories.
Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.
Nanofabrication
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Author : José María de Teresa
language : en
Publisher:
Release Date : 2020
Nanofabrication written by José María de Teresa and has been published by this book supported file pdf, txt, epub, kindle and other format this book has been release on 2020 with Nanolithography categories.
A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.
Recent Advances In Nanofabrication Techniques And Applications
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Author : Bo Cui
language : en
Publisher: BoD – Books on Demand
Release Date : 2011-12-02
Recent Advances In Nanofabrication Techniques And Applications written by Bo Cui and has been published by BoD – Books on Demand this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-12-02 with Science categories.
Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Nanofabrication
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Author : Ampere A. Tseng
language : en
Publisher: World Scientific
Release Date : 2008
Nanofabrication written by Ampere A. Tseng and has been published by World Scientific this book supported file pdf, txt, epub, kindle and other format this book has been release on 2008 with Science categories.
Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students.Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices.
High Resolution 3d Nanoimprint Technology
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Author : Xiaolin Wang
language : en
Publisher: kassel university press GmbH
Release Date : 2011
High Resolution 3d Nanoimprint Technology written by Xiaolin Wang and has been published by kassel university press GmbH this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011 with Fabry-Perot interferometers categories.
Pits And Pores 4 New Materials And Applications In Memory Of Ulrich G Sele
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Author : D. J. Lockwood
language : en
Publisher: The Electrochemical Society
Release Date : 2011-03
Pits And Pores 4 New Materials And Applications In Memory Of Ulrich G Sele written by D. J. Lockwood and has been published by The Electrochemical Society this book supported file pdf, txt, epub, kindle and other format this book has been release on 2011-03 with Science categories.
This issue of ECS Transactions contains 24 refereed manuscripts from the 46 papers presented over three days at the International Symposium on Pits and Pores IV: New Materials and Applications held in Las Vegas, NV as part of the 218th Meeting of the Electrochemical Society, October 10-15, 2010. The Symposium was held in memory of Ulrich Gösele, one of the founders and a key scientist in the field of porous semiconductors who recently passed away. These proceedings are anticipated to be beneficial not only for the tailored preparation of porous materials for various applications but also as a source of insights with respect to the origin and nature of localized dissolution processes in metals and semiconductors.